Inventor · disambiguated record
Seiji Nagahara
Also filed as: NAGAHARA SEIJI
34 granted patents·10 pending applications·137 citations·filing 2002–2025
96Inventor score
Top patents by PatentIndex Score
44 records- 0197US9519227B2Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR)TOKYO ELECTRON LTD·Filed 2015·Granted Dec 13, 2016·12 cites·20 claims
- 0294US9618848B2Methods and techniques to use with photosensitized chemically amplified resist chemicals and processesTOKYO ELECTRON LTD·Filed 2015·Granted Apr 11, 2017·12 cites·10 claims
- 0390US10025187B2Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprintingTOKYO ELECTRON LTD·Filed 2015·Granted Jul 17, 2018·8 cites·41 claims
- 0486US11163236B2Method and process for stochastic driven detectivity healingTOKYO ELECTRON LTD·Filed 2020·Granted Nov 2, 2021·2 cites·24 claims
- 0585US10429745B2Photo-sensitized chemically amplified resist (PS-CAR) simulationTOKYO ELECTRON LTD·Filed 2016·Granted Oct 1, 2019·3 cites·24 claims
- 0681US10951004B2Light source deviceNICHIA CORP·Filed 2019·Granted Mar 16, 2021·2 cites·17 claims
- 0779US11029591B2Light source device and optical engineNICHIA CORP·Filed 2020·Granted Jun 8, 2021·1 cites·17 claims
- 0879US10073349B2Chemically amplified resist material, pattern-forming method, compound, and production method of compoundUNIV OSAKA·Filed 2016·Granted Sep 11, 2018·2 cites·19 claims
- 0979US7217654B2Semiconductor device and method of manufacturing the sameNEC ELECTRONICS CORP·Filed 2004·Granted May 15, 2007·18 cites·5 claims
- 1079US6800551B2Chemical amplification type photoresist composition, method for producing a semiconductor device using the composition, and semiconductor substrateNEC ELECTRONICS CORP·Filed 2002·Granted Oct 5, 2004·24 cites·16 claims
- 1178US8397182B2Pattern verifying method, pattern verifying device, program, and manufacturing method of semiconductor deviceNAGAHARA SEIJI·Filed 2009·Granted Mar 12, 2013·9 cites·14 claims
- 1276US7479361B2Chemically amplified resist composition, process for manufacturing semiconductor device and patterning processNEC ELECTRONICS CORP·Filed 2004·Granted Jan 20, 2009·19 cites·7 claims
- 1374US7396633B2Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist compositionNEC ELECTRONICS CORP·Filed 2004·Granted Jul 8, 2008·11 cites·23 claims
- 1471US2025383604A1Substrate treatment method and substrate treatment apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1570US9459520B2Light source unit and optical engineNICHIA CORP·Filed 2014·Granted Oct 4, 2016·2 cites·20 claims
- 1669US10025190B2Substrate treatment systemTOKYO ELECTRON LTD·Filed 2014·Granted Jul 17, 2018·2 cites·12 claims
- 1766US2021247678A1Light source device and optical engineNICHIA CORP·Filed 2021·Application pending·0 cites
- 1865US10274843B2Exposure apparatus, exposure method and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Apr 30, 2019·1 cites·7 claims
- 1964US10133163B2Light source unit and optical engineNICHIA CORP·Filed 2014·Granted Nov 20, 2018·1 cites·12 claims
- 2063US7534554B2Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist compositionNEC ELECTRONICS CORP·Filed 2008·Granted May 19, 2009·6 cites·24 claims
- 2163US2025092514A1Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2259US2024126175A1Method for forming resist pattern, method for producing semiconductor device, substrate processing device, and storage mediumTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2352US2007096331A1Semiconductor device and method of manufacturing the sameNEC ELECTRONICS CORP·Filed 2006·Application pending·0 cites
- 2451US10534266B2Methods and techniques to use with photosensitized chemically amplified resist chemicals and processesTOKYO ELECTRON LTD·Filed 2017·Granted Jan 14, 2020·0 cites·22 claims
- 2551US9500936B2Light source device, and optical engine in which light source device is usedNICHIA CORP·Filed 2014·Granted Nov 22, 2016·0 cites·14 claims
- 2651US2009075482A1Process for forming a pattern including on a semiconductor deviceNEC ELECTRONICS CORP·Filed 2008·Application pending·0 cites
- 2750US12398152B2Thioxanthone derivatives, composition comprising the same and pattern forming method comprising said compositionLINTFIELD LTD·Filed 2019·Granted Aug 26, 2025·0 cites·16 claims
- 2848US11061332B2Methods for sensitizing photoresist using flood exposuresTOKYO ELECTRON LTD·Filed 2018·Granted Jul 13, 2021·0 cites·22 claims
- 2948US6774028B2Method of forming wiring structure by using photo resist having optimum development rateNEC ELECTRONICS CORP·Filed 2002·Granted Aug 10, 2004·2 cites·20 claims
- 3048US2023078946A1Hybrid Development of EUV ResistsTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 3147US11353793B2Method of simulating resist pattern, resist material and method of optimizing formulation thereof, apparatus and recording mediumTOKYO ELECTRON LTD·Filed 2019·Granted Jun 7, 2022·0 cites·9 claims
- 3247US9709882B2Light source apparatus and projector having light source apparatusNICHIA CORP·Filed 2015·Granted Jul 18, 2017·0 cites·19 claims
- 3347US2024288768A1Photoresist composition, method for forming resist pattern, method for manufacturing semiconductor device, and substrate processing deviceTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 3446US7440077B2Exposure apparatusNEC ELECTRONICS CORP·Filed 2006·Granted Oct 21, 2008·0 cites·12 claims
- 3541US10101669B2Exposure apparatus, resist pattern forming method, and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Oct 16, 2018·0 cites·22 claims
- 3640US2020201176A1Resist Composition and Resist Pattern Forming MethodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 3740US2003170993A1Semiconductor device and method of manufacturing the sameFiled 2002·Application pending·0 cites
- 3839US10215362B2Light source apparatus with lens arrayNICHIA CORP·Filed 2015·Granted Feb 26, 2019·0 cites·14 claims
- 3938US10527948B2Optical processing apparatus, coating/development apparatus, optical processing method, and non-transitory computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Jan 7, 2020·0 cites·18 claims
- 4038US10396262B2Light emitting device and substrateNICHIA CORP·Filed 2017·Granted Aug 27, 2019·0 cites·20 claims
- 4137US9971247B2Pattern-forming methodUNIV OSAKA·Filed 2016·Granted May 15, 2018·0 cites·5 claims
- 4236US10558125B2Exposure apparatus, exposure apparatus adjustment method and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Feb 11, 2020·0 cites·20 claims
- 4336US10073348B2Resist-pattern-forming method and chemically amplified resist materialUNIV OSAKA·Filed 2016·Granted Sep 11, 2018·0 cites·20 claims
- 4435US10747121B2Optical processing apparatus and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Aug 18, 2020·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →