Inventor · disambiguated record
Shih Chung Chen
Also filed as: CHEN SHIH C · CHEN SHIH CHUNG
51 granted patents·22 pending applications·314 citations·filing 1981–2025
98Inventor score
Files withAPPLIED MATERIALS INC36TAIWAN SEMICONDUCTOR MFG CO LTD12CHEN SHIH CHUNG8GANGULI SESHADRI2GREEN HYDROTEC INC2
Top patents by PatentIndex Score
73 records- 0196US11289579B2P-type dipole for p-FETAPPLIED MATERIALS INC·Filed 2020·Granted Mar 29, 2022·4 cites·10 claims
- 0296US10790287B2Reducing gate induced drain leakage in DRAM wordlineAPPLIED MATERIALS INC·Filed 2018·Granted Sep 29, 2020·12 cites·10 claims
- 0396US9914999B2Oxidized showerhead and process kit parts and methods of using sameAPPLIED MATERIALS INC·Filed 2015·Granted Mar 13, 2018·10 cites·18 claims
- 0495US11658218B2P-type dipole for p-FETAPPLIED MATERIALS INC·Filed 2022·Granted May 23, 2023·2 cites·19 claims
- 0594US10014185B1Selective etch of metal nitride filmsAPPLIED MATERIALS INC·Filed 2017·Granted Jul 3, 2018·22 cites·14 claims
- 0691US11552082B2Reducing gate induced drain leakage in DRAM wordlineAPPLIED MATERIALS INC·Filed 2020·Granted Jan 10, 2023·2 cites·10 claims
- 0789US10872763B2Treatments to enhance material structuresAPPLIED MATERIALS INC·Filed 2019·Granted Dec 22, 2020·5 cites·16 claims
- 0888US11245022B2Integrated dipole flow for transistorAPPLIED MATERIALS INC·Filed 2020·Granted Feb 8, 2022·2 cites·7 claims
- 0987US2025353142A1Polishing pad conditioning apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1086US9748354B2Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereofAPPLIED MATERIALS INC·Filed 2016·Granted Aug 29, 2017·5 cites·20 claims
- 1186US9252610B2Power charging socketCHEN SHIH CHUNG·Filed 2014·Granted Feb 2, 2016·12 cites·8 claims
- 1286US9145612B2Deposition of N-metal films comprising aluminum alloysAPPLIED MATERIALS INC·Filed 2013·Granted Sep 29, 2015·3 cites·18 claims
- 1385US9300151B2Wireless charging deviceCHEN SHIH CHUNG·Filed 2014·Granted Mar 29, 2016·12 cites·19 claims
- 1485US6876062B2Seal ring and die corner stress relief pattern design to protect against moisture and metallic impuritiesTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Apr 5, 2005·51 cites·8 claims
- 1585US5239687AWireless intercom having a transceiver in which a bias current for the condenser microphone and the driving current for the speaker are used to charge a battery during transmission and reception, respectivelyCHEN SHIH CHUNG·Filed 1991·Granted Aug 24, 1993·88 cites·1 claims
- 1685US2025114905A1System and method for chemical mechanical polishing pad replacementTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1784US12427622B2Polishing pad conditioning apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 30, 2025·0 cites·20 claims
- 1882US12311498B2Monolithic platenTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted May 27, 2025·0 cites·20 claims
- 1982US2024383095A1Multi-layered windows for use in chemical-mechanical planarization systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2080US11996455B2P-type dipole for P-FETAPPLIED MATERIALS INC·Filed 2023·Granted May 28, 2024·0 cites·16 claims
- 2180US11020837B2Monolithic platenTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 1, 2021·2 cites·20 claims
- 2279US8987080B2Methods for manufacturing metal gatesAPPLIED MATERIALS INC·Filed 2013·Granted Mar 24, 2015·4 cites·20 claims
- 2378US11975421B2Single bodied platen housing a detection module for CMP systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted May 7, 2024·0 cites·20 claims
- 2478US11571782B2Single bodied platen housing a detection module for CMP systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Feb 7, 2023·1 cites·17 claims
- 2577US10608097B2Low thickness dependent work-function nMOS integration for metal gateAPPLIED MATERIALS INC·Filed 2018·Granted Mar 31, 2020·2 cites·17 claims
- 2677US9092055B2Platform and method for BCI controlCHEN SHIH-CHUNG·Filed 2012·Granted Jul 28, 2015·11 cites·5 claims
- 2776US12202094B2System and method for chemical mechanical polishing pad replacementTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 21, 2025·0 cites·20 claims
- 2874US11618126B2Polishing pad conditioning apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 4, 2023·0 cites·20 claims
- 2974US11062900B2Method of reducing effective oxide thickness in a semiconductor structureAPPLIED MATERIALS INC·Filed 2019·Granted Jul 13, 2021·1 cites·19 claims
- 3073US11075276B2Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursorsAPPLIED MATERIALS INC·Filed 2019·Granted Jul 27, 2021·1 cites·16 claims
- 3172US12328872B2Liner for V-NAND word line stackAPPLIED MATERIALS INC·Filed 2022·Granted Jun 10, 2025·0 cites·7 claims
- 3270US11919126B2Monolithic platenTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 5, 2024·0 cites·20 claims
- 3370US5676075APresser foot coupler for sewing machinesFiled 1996·Granted Oct 14, 1997·11 cites·5 claims
- 3468US11888045B2Integrated dipole flow for transistorAPPLIED MATERIALS INC·Filed 2021·Granted Jan 30, 2024·0 cites·16 claims
- 3566US12138735B2Multi-layered windows for use in chemical-mechanical planarization systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Nov 12, 2024·0 cites·20 claims
- 3663US12062545B2Fluorine-free tungsten ALD for dielectric selectivity improvementAPPLIED MATERIALS INC·Filed 2021·Granted Aug 13, 2024·0 cites·13 claims
- 3762US11476267B2Liner for V-NAND word line stackAPPLIED MATERIALS INC·Filed 2020·Granted Oct 18, 2022·0 cites·8 claims
- 3859US9683287B2Deposition of films comprising aluminum alloys with high aluminum contentAPPLIED MATERIALS INC·Filed 2013·Granted Jun 20, 2017·0 cites·15 claims
- 3959US2023193463A1Gas Distribution ApparatusesAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4059US2021384035A1Fluorine-Free Tungsten ALD And Tungsten Selective CVD For DielectricsAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 4158US5255418AAutomatically locking slider for concealed zipperCHEN SHIH CHUNG·Filed 1992·Granted Oct 26, 1993·19 cites·4 claims
- 4257US2023313378A1Methods of preventing metal contamination by ceramic heaterAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4356US2025118563A1Titanium nitride gapfill processes for semiconductor structuresAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4456US2020071825A1Methods Of Depositing Metal Carbide FilmsAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 4555US11171047B2Fluorine-doped nitride films for improved high-k reliabilityAPPLIED MATERIALS INC·Filed 2020·Granted Nov 9, 2021·0 cites·18 claims
- 4655US2024038833A1Carbon mold for dram capacitorAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4754US11776980B2Methods for reflector film growthAPPLIED MATERIALS INC·Filed 2020·Granted Oct 3, 2023·0 cites·17 claims
- 4854US2025081593A1Methods of improving pmos transistor performanceAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4953US12305278B2Method of reducing titanium nitride etching during tungsten film formationAPPLIED MATERIALS INC·Filed 2020·Granted May 20, 2025·0 cites·3 claims
- 5053US2025046600A1Titanium nitride gapfill processes for semiconductor devicesAPPLIED MATERLALS INC·Filed 2023·Application pending·0 cites
Showing the top 50 of 73 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →