Inventor · disambiguated record
Shinya Nishimoto
Also filed as: NISHIMOTO SHINYA
17 granted patents·5 pending applications·309 citations·filing 2002–2018
94Inventor score
Top patents by PatentIndex Score
22 records- 0195US6837966B2Method and apparatus for an improved baffle plate in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Jan 4, 2005·84 cites·16 claims
- 0293US7163585B2Method and apparatus for an improved optical window deposition shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2004·Granted Jan 16, 2007·56 cites·24 claims
- 0393US7147749B2Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Dec 12, 2006·42 cites·78 claims
- 0491US7811428B2Method and apparatus for an improved optical window deposition shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2007·Granted Oct 12, 2010·14 cites·24 claims
- 0591US6798519B2Method and apparatus for an improved optical window deposition shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Sep 28, 2004·44 cites·40 claims
- 0689US8057600B2Method and apparatus for an improved baffle plate in a plasma processing systemNISHIMOTO SHINYA·Filed 2007·Granted Nov 15, 2011·12 cites·26 claims
- 0783US8968512B2Temperature adjusting mechanism and semiconductor manufacturing apparatus using temperature adjusting mechanismNISHIMOTO SHINYA·Filed 2009·Granted Mar 3, 2015·9 cites·17 claims
- 0881US8485127B2Processing apparatusNISHIMOTO SHINYA·Filed 2006·Granted Jul 16, 2013·8 cites·20 claims
- 0981US7566379B2Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2006·Granted Jul 28, 2009·5 cites·33 claims
- 1080US7282112B2Method and apparatus for an improved baffle plate in a plasma processing systemTOKYO ELECTRON LTD·Filed 2004·Granted Oct 16, 2007·18 cites·21 claims
- 1170US8242405B2Microwave plasma processing apparatus and method for producing cooling jacketNISHIMOTO SHINYA·Filed 2009·Granted Aug 14, 2012·2 cites·8 claims
- 1270US8171880B2Microwave plasma processing apparatus and method of supplying microwaves using the apparatusNISHIMOTO SHINYA·Filed 2009·Granted May 8, 2012·2 cites·13 claims
- 1368US7663860B2Electrostatic chuckTOKYO ELECTRON LTD·Filed 2004·Granted Feb 16, 2010·11 cites·16 claims
- 1464US8974628B2Plasma treatment device and optical monitor deviceNOZAWA TOSHIHISA·Filed 2011·Granted Mar 10, 2015·2 cites·10 claims
- 1558US2011011341A1Shower plate and plasma processing device using the sameTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1654US8327795B2Microwave plasma processing apparatus and method of supplying microwaves using the apparatusNISHIMOTO SHINYA·Filed 2009·Granted Dec 11, 2012·0 cites·9 claims
- 1753US2009301656A1Microwave plasma processing apparatusTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1853US2011168673A1Plasma processing apparatus, plasma processing method, and mechanism for regulating temperature of dielectric windowTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1947US2009194238A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2042US11427909B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Aug 30, 2022·0 cites·10 claims
- 2138US8267040B2Plasma processing apparatus and plasma processing methodISHIBASHI KIYOTAKA·Filed 2005·Granted Sep 18, 2012·0 cites·2 claims
- 2238US2005042881A1Processing apparatusTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →