Inventor · disambiguated record
Shigenori Ozaki
Also filed as: OZAKI SHIGENORI
29 granted patents·22 pending applications·142 citations·filing 2002–2025
96Inventor score
Top patents by PatentIndex Score
51 records- 0191US9932674B2Film deposition apparatus, film deposition method, and computer-readable recording mediumKATO HITOSHI·Filed 2012·Granted Apr 3, 2018·14 cites·20 claims
- 0286US6897149B2Method of producing electronic device materialTOKYO ELECTRON LTD·Filed 2002·Granted May 24, 2005·24 cites·34 claims
- 0385US7429539B2Nitriding method of gate oxide filmTOKYO ELECTRON LTD·Filed 2006·Granted Sep 30, 2008·7 cites·31 claims
- 0485US7217659B2Process for producing materials for electronic deviceTOKYO ELECTRON LTD·Filed 2005·Granted May 15, 2007·5 cites·44 claims
- 0584US7723241B2Plasma processing method and computer storage mediumTOKYO ELECTRON LTD·Filed 2006·Granted May 25, 2010·8 cites·8 claims
- 0681US7897518B2Plasma processing method and computer storage mediumTOKYO ELECTRON LTD·Filed 2010·Granted Mar 1, 2011·4 cites·7 claims
- 0781US7226874B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2004·Granted Jun 5, 2007·24 cites·17 claims
- 0878US8642487B2Film deposition method and film deposition apparatusKATO HITOSHI·Filed 2012·Granted Feb 4, 2014·4 cites·8 claims
- 0978US7887637B2Method for cleaning treatment chamber in substrate treating apparatus and method for detecting endpoint of cleaningTOKYO ELECTRON LTD·Filed 2005·Granted Feb 15, 2011·7 cites·25 claims
- 1074US8021987B2Method of modifying insulating filmTOKYO ELECTRON LTD·Filed 2009·Granted Sep 20, 2011·3 cites·24 claims
- 1174US7662236B2Method for forming insulation filmTOKYO ELECTRON LTD·Filed 2008·Granted Feb 16, 2010·3 cites·8 claims
- 1272US7655574B2Method of modifying insulating filmTOKYO ELECTRON LTD·Filed 2005·Granted Feb 2, 2010·3 cites·14 claims
- 1371US10563159B2Cell-holding container and cell culture method using sameASAHI RUBBER INC·Filed 2016·Granted Feb 18, 2020·1 cites·14 claims
- 1469US7632758B2Process and apparatus for forming oxide film, and electronic device materialTOKYO ELECTRON LTD·Filed 2006·Granted Dec 15, 2009·2 cites·7 claims
- 1568US11118265B2Film deposition method and computer program storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Sep 14, 2021·0 cites·7 claims
- 1668US7446052B2Method for forming insulation filmTOKYO ELECTRON LTD·Filed 2003·Granted Nov 4, 2008·10 cites·18 claims
- 1766US7560396B2Material for electronic device and process for producing the sameTOKYO ELECTRON LTD·Filed 2003·Granted Jul 14, 2009·10 cites·8 claims
- 1866US7232772B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2004·Granted Jun 19, 2007·7 cites·11 claims
- 1965US8961735B2Plasma processing apparatus and microwave introduction deviceFUJINO YUTAKA·Filed 2012·Granted Feb 24, 2015·2 cites·6 claims
- 2063US2007218687A1Process for producing materials for electronic deviceTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 2160US2012052693A1Film deposition apparatus, film deposition method, and computer program storage mediumOZAKI SHIGENORI·Filed 2011·Application pending·0 cites
- 2258US2010096707A1Method for Forming Insulation FilmTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2357US2010048033A1Process And Apparatus For Forming Oxide Film, And Electronic Device MaterialTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2456US8067809B2Semiconductor storage device including a gate insulating film with a favorable nitrogen concentration profile and method for manufacturing the sameKITAGAWA JUNICHI·Filed 2005·Granted Nov 29, 2011·2 cites·6 claims
- 2556US2009035950A1Nitriding method of gate oxide filmTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2652US2007224837A1Method for producing material of electronic deviceTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 2750US12315700B2Plasma processing apparatus and ceiling wallTOKYO ELECTRON LTD·Filed 2020·Granted May 27, 2025·0 cites·15 claims
- 2849US7622402B2Method for forming underlying insulation filmTOKYO ELECTRON LTD·Filed 2003·Granted Nov 24, 2009·2 cites·19 claims
- 2949US2025179630A1Substrate Treatment Device, Fluid Activation Device, Substrate Treatment Method, and Fluid Activation MethodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 3049US2005233599A1Method for producing material of electronic deviceMAKOTO ANDO·Filed 2005·Application pending·0 cites
- 3148US8183165B2Plasma processing methodMATSUYAMA SEIJI·Filed 2011·Granted May 22, 2012·0 cites·9 claims
- 3247US10370632B2Facility for culturing pluripotent stem cellsTOKYO ELECTRON LTD·Filed 2014·Granted Aug 6, 2019·0 cites·9 claims
- 3346US9991097B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jun 5, 2018·0 cites·6 claims
- 3446US2015353884A1Method of subculturing pluripotent stem cellsTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 3546US2015144265A1Plasma processing apparatus and microwave introduction deviceTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 3643US10351811B2Cell culture containerSINFONIA TECH CO LT·Filed 2016·Granted Jul 16, 2019·0 cites·12 claims
- 3743US2005005844A1Process and apparatus for forming oxide film, and electronic device materialTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 3842US2006024864A1Substrate processing methodTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 3941US10704073B2Method for determining undifferentiated state of pluripotent stem cells by culture medium analysisTOKYO ELECTRON LTD·Filed 2015·Granted Jul 7, 2020·0 cites·9 claims
- 4041US2018362910A1Aseptic pods and load portsENTEGRIS INC·Filed 2016·Application pending·0 cites
- 4141US2005205013A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 4240US10636680B2Robot transport deviceSINFONIA TECHNOLOGY CO LTD·Filed 2016·Granted Apr 28, 2020·0 cites·6 claims
- 4340US7713864B2Method of cleaning semiconductor substrate conductive layer surfaceTOKYO ELECTRON LTD·Filed 2004·Granted May 11, 2010·0 cites·17 claims
- 4440US2004142577A1Method for producing material of electronic deviceFiled 2002·Application pending·0 cites
- 4540US2016201022A1Automatic culture system and automatic culture deviceTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 4638US2017121664A1Cell separation device and cell separation methodTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 4736US2005003660A1Semiconductor device and production method thereforFiled 2002·Application pending·0 cites
- 4835US2016264922A1Cell management systemTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 4935US2012180953A1Plasma processing apparatus and wave retardation plate used thereinOZAKI SHIGENORI·Filed 2010·Application pending·0 cites
- 5035US2019119650A1Evaluation method for differentiation state of cellsSHIMADZU CORP·Filed 2016·Application pending·0 cites
Showing the top 50 of 51 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →