Inventor · disambiguated record
Shahid Rauf
Also filed as: RAUF SHAHID · RAUF SHAHID D
90 granted patents·56 pending applications·1,402 citations·filing 1989–2024
99Inventor score
Files withAPPLIED MATERIALS INC94COLLINS KENNETH S9FREESCALE SEMICONDUCTOR INC9BERA KALLOL7DORF LEONID4
Top patents by PatentIndex Score
146 records- 0198US11587766B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2021·Granted Feb 21, 2023·4 cites·15 claims
- 0298US10580620B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Mar 3, 2020·38 cites·17 claims
- 0398US10546728B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Jan 28, 2020·39 cites·11 claims
- 0498US10535502B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Jan 14, 2020·35 cites·14 claims
- 0598US10453656B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Oct 22, 2019·36 cites·15 claims
- 0698US9741546B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2012·Granted Aug 22, 2017·385 cites·17 claims
- 0798US8512509B2Plasma reactor gas distribution plate with radially distributed path splitting manifoldBERA KALLOL·Filed 2007·Granted Aug 20, 2013·217 cites·14 claims
- 0897US8382999B2Pulsed plasma high aspect ratio dielectric processAPPLIED MATERIALS INC·Filed 2010·Granted Feb 26, 2013·55 cites·9 claims
- 0996US10475626B2Ion-ion plasma atomic layer etch process and reactorAPPLIED MATERIALS INC·Filed 2015·Granted Nov 12, 2019·12 cites·14 claims
- 1096US8962488B2Synchronized radio frequency pulsing for plasma etchingAPPLIED MATERIALS INC·Filed 2013·Granted Feb 24, 2015·30 cites·15 claims
- 1196US8313664B2Efficient and accurate method for real-time prediction of the self-bias voltage of a wafer and feedback control of ESC voltage in plasma processing chamberCHEN ZHIGANG·Filed 2009·Granted Nov 20, 2012·44 cites·8 claims
- 1296US7968469B2Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformityAPPLIED MATERIALS INC·Filed 2007·Granted Jun 28, 2011·46 cites·26 claims
- 1394US9745663B2Symmetrical inductively coupled plasma source with symmetrical flow chamberAPPLIED MATERIALS INC·Filed 2012·Granted Aug 29, 2017·8 cites·18 claims
- 1494US8404598B2Synchronized radio frequency pulsing for plasma etchingLIAO BRYAN·Filed 2010·Granted Mar 26, 2013·77 cites·20 claims
- 1593US11114284B2Plasma reactor with electrode array in ceilingAPPLIED MATERIALS INC·Filed 2017·Granted Sep 7, 2021·4 cites·18 claims
- 1692US8075728B2Gas flow equalizer plate suitable for use in a substrate process chamberBALAKRISHNA AJIT·Filed 2008·Granted Dec 13, 2011·28 cites·9 claims
- 1791US11189502B2Showerhead with interlaced gas feed and removal and methods of useAPPLIED MATERIALS INC·Filed 2019·Granted Nov 30, 2021·5 cites·20 claims
- 1891US10790180B2Electrostatic chuck with variable pixelated magnetic fieldAPPLIED MATERIALS INC·Filed 2019·Granted Sep 29, 2020·5 cites·9 claims
- 1991US10170279B2Multiple coil inductively coupled plasma source with offset frequencies and double-walled shieldingAPPLIED MATERIALS INC·Filed 2014·Granted Jan 1, 2019·11 cites·14 claims
- 2090US10249470B2Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shieldingAPPLIED MATERIALS INC·Filed 2013·Granted Apr 2, 2019·10 cites·13 claims
- 2190US8920597B2Symmetric VHF source for a plasma reactorRAMASWAMY KARTIK·Filed 2011·Granted Dec 30, 2014·9 cites·8 claims
- 2290US7967996B2Process for wafer backside polymer removal and wafer front side photoresist removalAPPLIED MATERIALS INC·Filed 2007·Granted Jun 28, 2011·16 cites·20 claims
- 2390US7879731B2Improving plasma process uniformity across a wafer by apportioning power among plural VHF sourcesAPPLIED MATERIALS INC·Filed 2007·Granted Feb 1, 2011·13 cites·28 claims
- 2489US10510515B2Processing tool with electrically switched electrode assemblyAPPLIED MATERIALS INC·Filed 2018·Granted Dec 17, 2019·5 cites·20 claims
- 2589US7879183B2Apparatus and method for front side protection during backside cleaningAPPLIED MATERIALS INC·Filed 2008·Granted Feb 1, 2011·13 cites·25 claims
- 2688US11043361B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2017·Granted Jun 22, 2021·3 cites·20 claims
- 2788US10811226B2Symmetrical plural-coil plasma source with side RF feeds and RF distribution platesAPPLIED MATERIALS INC·Filed 2018·Granted Oct 20, 2020·4 cites·21 claims
- 2888US9761416B2Apparatus and methods for reducing particles in semiconductor process chambersAPPLIED MATERIALS INC·Filed 2014·Granted Sep 12, 2017·7 cites·2 claims
- 2988US8206552B2RF power delivery system in a semiconductor apparatusCHEN ZHIGANG·Filed 2008·Granted Jun 26, 2012·9 cites·15 claims
- 3088US8076247B2Plasma process uniformity across a wafer by controlling RF phase between opposing electrodesCOLLINS KENNETH S·Filed 2007·Granted Dec 13, 2011·11 cites·20 claims
- 3187US9267742B2Apparatus for controlling the temperature uniformity of a substrateBERA KALLOL·Filed 2010·Granted Feb 23, 2016·5 cites·19 claims
- 3287US8513939B2In-situ VHF voltage sensor for a plasma reactorHANAWA HIROJI·Filed 2011·Granted Aug 20, 2013·6 cites·10 claims
- 3387US7544605B2Method of making a contact on a backside of a dieFREESCALE SEMICONDUCTOR INC·Filed 2006·Granted Jun 9, 2009·15 cites·20 claims
- 3487US7335602B2Charge-free layer by layer etching of dielectricsFREESCALE SEMICONDUCTOR INC·Filed 2006·Granted Feb 26, 2008·12 cites·17 claims
- 3586US10131994B2Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flowAPPLIED MATERIALS INC·Filed 2012·Granted Nov 20, 2018·4 cites·13 claims
- 3686US9928987B2Inductively coupled plasma source with symmetrical RF feedAPPLIED MATERIALS INC·Filed 2013·Granted Mar 27, 2018·5 cites·16 claims
- 3786US9896769B2Inductively coupled plasma source with multiple dielectric windows and window-supporting structureAPPLIED MATERIALS INC·Filed 2012·Granted Feb 20, 2018·4 cites·15 claims
- 3886US9824862B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2014·Granted Nov 21, 2017·4 cites·6 claims
- 3986US9082590B2Symmetrical inductively coupled plasma source with side RF feeds and RF distribution platesAPPLIED MATERIALS INC·Filed 2013·Granted Jul 14, 2015·8 cites·19 claims
- 4086US8329593B2Method and apparatus for removing polymer from the wafer backside and edgeYOUSIF IMAD·Filed 2007·Granted Dec 11, 2012·14 cites·17 claims
- 4186US7988815B2Plasma reactor with reduced electrical skew using electrical bypass elementsAPPLIED MATERIALS INC·Filed 2007·Granted Aug 2, 2011·11 cites·19 claims
- 4286US7579282B2Method for removing metal foot during high-k dielectric/metal gate etchingFREESCALE SEMICONDUCTOR INC·Filed 2006·Granted Aug 25, 2009·11 cites·20 claims
- 4385US11101113B2Ion-ion plasma atomic layer etch processAPPLIED MATERIALS INC·Filed 2019·Granted Aug 24, 2021·2 cites·18 claims
- 4485US9564297B2Electron beam plasma source with remote radical sourceAPPLIED MATERIALS INC·Filed 2014·Granted Feb 7, 2017·6 cites·20 claims
- 4585US9443700B2Electron beam plasma source with segmented suppression electrode for uniform plasma generationAPPLIED MATERIALS INC·Filed 2014·Granted Sep 13, 2016·6 cites·14 claims
- 4685US9161428B2Independent control of RF phases of separate coils of an inductively coupled plasma reactorAPPLIED MATERIALS INC·Filed 2013·Granted Oct 13, 2015·11 cites·17 claims
- 4784US11935724B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2023·Granted Mar 19, 2024·0 cites·15 claims
- 4884US11315760B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2020·Granted Apr 26, 2022·1 cites·20 claims
- 4984US10242847B2Plasma processing apparatus and liner assembly for tuning electrical skewsAPPLIED MATERIALS INC·Filed 2015·Granted Mar 26, 2019·3 cites·12 claims
- 5084US9111722B2Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generatorAPPLIED MATERIALS INC·Filed 2013·Granted Aug 18, 2015·6 cites·20 claims
Showing the top 50 of 146 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →