Inventor · disambiguated record
Shintaro Ueda
Also filed as: UEDA SHINTARO
6 granted patents·1 pending application·3,177 citations·filing 2009–2014
91Inventor score
Top patents by PatentIndex Score
7 records- 0197US9190263B2Method for forming SiOCH film using organoaminosilane annealingASM IP HOLDING BV·Filed 2013·Granted Nov 17, 2015·518 cites·15 claims
- 0297US9117657B2Method for filling recesses using pre-treatment with hydrocarbon-containing gasASM IP HOLDING BV·Filed 2013·Granted Aug 25, 2015·518 cites·17 claims
- 0397US9029272B1Method for treating SiOCH film with hydrogen plasmaASM IP HOLDING BV·Filed 2013·Granted May 12, 2015·526 cites·17 claims
- 0496US7825040B1Method for depositing flowable material using alkoxysilane or aminosilane precursorASM JAPAN·Filed 2009·Granted Nov 2, 2010·545 cites·14 claims
- 0595US8592005B2Atomic layer deposition for controlling vertical film growthUEDA SHINTARO·Filed 2011·Granted Nov 26, 2013·542 cites·12 claims
- 0695US8465811B2Method of depositing film by atomic layer deposition with pulse-time-modulated plasmaUEDA SHINTARO·Filed 2011·Granted Jun 18, 2013·528 cites·20 claims
- 0741US2015361557A1Substrate processing apparatus and substrate processing methodASM IP HOLDING BV·Filed 2014·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →