Inventor · disambiguated record
Shun Wu
Also filed as: WU SHUN · WU SHUN JACKSON
11 granted patents·4 pending applications·405 citations·filing 1996–2013
92Inventor score
Top patents by PatentIndex Score
15 records- 0196US6776873B1Yttrium oxide based surface coating for semiconductor IC processing vacuum chambersFiled 2002·Granted Aug 17, 2004·153 cites·6 claims
- 0295US6565984B1Clean aluminum alloy for semiconductor processing equipmentAPPLIED MATERIALS INC·Filed 2002·Granted May 20, 2003·70 cites·24 claims
- 0388US6713188B2Clean aluminum alloy for semiconductor processing equipmentAPPLIED MATERIALS INC·Filed 2003·Granted Mar 30, 2004·27 cites·33 claims
- 0486US6659331B2Plasma-resistant, welded aluminum structures for use in semiconductor apparatusAPPLIED MATERIALS INC·Filed 2002·Granted Dec 9, 2003·30 cites·36 claims
- 0583US7048814B2Halogen-resistant, anodized aluminum for use in semiconductor processing apparatusAPPLIED MATERIALS INC·Filed 2002·Granted May 23, 2006·16 cites·4 claims
- 0682US7578889B2Methodology for cleaning of surface metal contamination from electrode assembliesLAM RES CORP·Filed 2007·Granted Aug 25, 2009·9 cites·18 claims
- 0772US6199927B1Robot blade for handling of semiconductor substratesAPPLIED MATERIALS INC·Filed 1999·Granted Mar 13, 2001·37 cites·30 claims
- 0868US6024393ARobot blade for handling of semiconductor substrateAPPLIED MATERIALS INC·Filed 1996·Granted Feb 15, 2000·33 cites·8 claims
- 0963US2014076354A1Removing residues from substrate processing componentsQUANTUM GLOBAL TECH LLC·Filed 2013·Application pending·0 cites
- 1062US7033447B2Halogen-resistant, anodized aluminum for use in semiconductor processing apparatusAPPLIED MATERIALS INC·Filed 2002·Granted Apr 25, 2006·8 cites·2 claims
- 1160US6175485B1Electrostatic chuck and method for fabricating the sameAPPLIED MATERIALS INC·Filed 1996·Granted Jan 16, 2001·18 cites·45 claims
- 1258US2012107520A1Removing Residues from Substrate Processing ComponentsWEST BRIAN T·Filed 2012·Application pending·0 cites
- 1358US2008092806A1Removing residues from substrate processing componentsAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 1454US7055732B2Semiconductor processing apparatus including plasma-resistant, welded aluminum structuresAPPLIED MATERIALS INC·Filed 2003·Granted Jun 6, 2006·4 cites·23 claims
- 1554US2008213496A1Method of coating semiconductor processing apparatus with protective yttrium-containing coatingsAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →