Inventor · disambiguated record
Shouyin Zhang
Also filed as: ZHANG SHOUYIN
17 granted patents·5 pending applications·89 citations·filing 2009–2025
91Inventor score
Top patents by PatentIndex Score
22 records- 0195US11810770B2Methods and apparatus for controlling ion fraction in physical vapor deposition processesAPPLIED MATERIALS INC·Filed 2021·Granted Nov 7, 2023·2 cites·20 claims
- 0295US9818584B2Internal split faraday shield for a plasma sourceFEI CO·Filed 2014·Granted Nov 14, 2017·21 cites·17 claims
- 0394US8253118B2Charged particle beam system having multiple user-selectable operating modesZHANG SHOUYIN·Filed 2009·Granted Aug 28, 2012·32 cites·22 claims
- 0488US8445870B2Charged particle beam system having multiple user-selectable operating modesZHANG SHOUYIN·Filed 2011·Granted May 21, 2013·14 cites·14 claims
- 0587US11037768B2Methods and apparatus for controlling ion fraction in physical vapor deposition processesAPPLIED MATERIALS INC·Filed 2017·Granted Jun 15, 2021·4 cites·8 claims
- 0682US12094699B2Methods and apparatus for controlling ion fraction in physical vapor deposition processesAPPLIED MATERIALS INC·Filed 2023·Granted Sep 17, 2024·0 cites·20 claims
- 0781US8124942B2Plasma igniter for an inductively coupled plasma ion sourceGRAUPERA ANTHONY·Filed 2010·Granted Feb 28, 2012·9 cites·21 claims
- 0877US10157733B2Methods for igniting a plasma in a substrate processing chamberAPPLIED MATERIALS INC·Filed 2017·Granted Dec 18, 2018·2 cites·19 claims
- 0974US8736177B2Compact RF antenna for an inductively coupled plasma ion sourceZHANG SHOUYIN·Filed 2010·Granted May 27, 2014·3 cites·21 claims
- 1070US12018361B2Waveform shape factor for pulsed PVD powerAPPLIED MATERIALS INC·Filed 2022·Granted Jun 25, 2024·0 cites·9 claims
- 1170US8723143B2Plasma igniter for an inductively coupled plasma ion sourceGRAUPERA ANTHONY·Filed 2011·Granted May 13, 2014·2 cites·18 claims
- 1268US2021071294A1Methods and apparatus for controlling ion fraction in physical vapor deposition processesAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 1367US2022162746A1Waveform shape factor for pulsed pvd powerAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 1455US9105438B2Imaging and processing for plasma ion sourceFEI CO·Filed 2013·Granted Aug 11, 2015·0 cites·20 claims
- 1553US12281381B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2021·Granted Apr 22, 2025·0 cites·20 claims
- 1653US9053895B2System for attachment of an electrode into a plasma sourceKELLOGG SEAN·Filed 2011·Granted Jun 9, 2015·0 cites·22 claims
- 1752US9691583B2Imaging and processing for plasma ion sourceFEI CO·Filed 2015·Granted Jun 27, 2017·0 cites·18 claims
- 1852US9530625B2Method for attachment of an electrode into an inductively-coupled plasmaFEI CO·Filed 2015·Granted Dec 27, 2016·0 cites·16 claims
- 1951US2025329520A1Delivery of configurable pulsed voltage waveforms for substrate processingAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2050US2013098871A1Internal Split Faraday Shield for an Inductively Coupled Plasma SourceMILLER TOM·Filed 2011·Application pending·0 cites
- 2142US9196451B2Plasma source for charged particle beam systemZHANG SHOUYIN·Filed 2012·Granted Nov 24, 2015·0 cites·12 claims
- 2240US2013250293A1Method and Apparatus for Actively Monitoring an Inductively-Coupled Plasma Ion Source using an Optical SpectrometerUTLAUT MARK W·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →