Inventor · disambiguated record
Sivakumar Dhandapani
Also filed as: DHANDAPANI SIVAKUMAR
30 granted patents·5 pending applications·99 citations·filing 2007–2025
95Inventor score
Top patents by PatentIndex Score
35 records- 0197US11919121B2Control of processing parameters during substrate polishing using constrained cost functionAPPLIED MATERIALS INC·Filed 2022·Granted Mar 5, 2024·3 cites·20 claims
- 0296US11969854B2Control of processing parameters during substrate polishing using expected future parameter changesAPPLIED MATERIALS INC·Filed 2022·Granted Apr 30, 2024·3 cites·19 claims
- 0395US11847776B2System using film thickness estimation from machine learning based processing of substrate imagesAPPLIED MATERIALS INC·Filed 2021·Granted Dec 19, 2023·4 cites·18 claims
- 0495US9138860B2Closed-loop control for improved polishing pad profilesDHANDAPANI SIVAKUMAR·Filed 2011·Granted Sep 22, 2015·23 cites·20 claims
- 0594US9490186B2Limiting adjustment of polishing rates during substrate polishingAPPLIED MATERIALS INC·Filed 2013·Granted Nov 8, 2016·15 cites·18 claims
- 0693US8190285B2Feedback for polishing rate correction in chemical mechanical polishingQIAN JUN·Filed 2010·Granted May 29, 2012·10 cites·20 claims
- 0792US11836913B2Film thickness estimation from machine learning based processing of substrate imagesAPPLIED MATERIALS INC·Filed 2021·Granted Dec 5, 2023·2 cites·20 claims
- 0891US8535115B2Gathering spectra from multiple optical headsDAVID JEFFREY DRUE·Filed 2011·Granted Sep 17, 2013·8 cites·25 claims
- 0989US9242337B2Dynamic residue clearing control with in-situ profile control (ISPC)APPLIED MATERIALS INC·Filed 2014·Granted Jan 26, 2016·8 cites·20 claims
- 1088US9375824B2Adjustment of polishing rates during substrate polishing with predictive filtersAPPLIED MATERIALS INC·Filed 2013·Granted Jun 28, 2016·7 cites·19 claims
- 1183US12502748B2Control substrate polishing using constrained cost functionAPPLIED MATERIALS INC·Filed 2023·Granted Dec 23, 2025·0 cites·14 claims
- 1283US11679466B2Filtering during in-situ monitoring of polishingAPPLIED MATERIALS INC·Filed 2022·Granted Jun 20, 2023·0 cites·21 claims
- 1382US12169925B2System using film thickness estimation from machine learning based processing of substrate imagesAPPLIED MATERIALS INC·Filed 2023·Granted Dec 17, 2024·0 cites·18 claims
- 1481US12272047B2Residue measurement from machine learning based processing of substrate imagesAPPLIED MATERIALS INC·Filed 2023·Granted Apr 8, 2025·0 cites·16 claims
- 1581US11577362B2Pad conditioner cut rate monitoringAPPLIED MATERIALS INC·Filed 2019·Granted Feb 14, 2023·1 cites·18 claims
- 1681US11504821B2Predictive filter for polishing pad wear rate monitoringAPPLIED MATERIALS INC·Filed 2018·Granted Nov 22, 2022·1 cites·20 claims
- 1779US8954186B2Selecting reference libraries for monitoring of multiple zones on a substrateQIAN JUN·Filed 2010·Granted Feb 10, 2015·4 cites·19 claims
- 1877US12420373B2Control of processing parameters during substrate polishing using cost functionAPPLIED MATERIALS INC·Filed 2022·Granted Sep 23, 2025·0 cites·20 claims
- 1977US11969855B2Filtering during in-situ monitoring of polishingAPPLIED MATERIALS INC·Filed 2023·Granted Apr 30, 2024·0 cites·21 claims
- 2071US11446783B2Filtering during in-situ monitoring of polishingAPPLIED MATERIALS INC·Filed 2019·Granted Sep 20, 2022·0 cites·12 claims
- 2171US8758085B2Method for compensation of variability in chemical mechanical polishing consumablesDHANDAPANI SIVAKUMAR·Filed 2011·Granted Jun 24, 2014·3 cites·13 claims
- 2270US9221147B2Endpointing with selective spectral monitoringQIAN JUN·Filed 2012·Granted Dec 29, 2015·2 cites·24 claims
- 2370US8337279B2Closed-loop control for effective pad conditioningDHANDAPANI SIVAKUMAR·Filed 2009·Granted Dec 25, 2012·4 cites·20 claims
- 2467US8467896B2Feedback for polishing rate correction in chemical mechanical polishingQIAN JUN·Filed 2012·Granted Jun 18, 2013·1 cites·21 claims
- 2567US2025370353A1Enhanced run-to-run process control modeling platformAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2666US12384003B2Methods of modeling and controlling pad wearAPPLIED MATERIALS INC·Filed 2022·Granted Aug 12, 2025·0 cites·22 claims
- 2758US8932107B2Gathering spectra from multiple optical headsAPPLIED MATERIALS INC·Filed 2013·Granted Jan 13, 2015·0 cites·13 claims
- 2858US8755927B2Feedback for polishing rate correction in chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2013·Granted Jun 17, 2014·0 cites·20 claims
- 2950US9607910B2Limiting adjustment of polishing rates during substrate polishingAPPLIED MATERIALS INC·Filed 2016·Granted Mar 28, 2017·0 cites·16 claims
- 3048US2009275265A1Endpoint detection in chemical mechanical polishing using multiple spectraAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 3147US2014242881A1Feed forward parameter values for use in theoretically generating spectraAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 3246US2008138988A1Detection of clearance of polysilicon residueDAVID JEFFREY DRUE·Filed 2007·Application pending·0 cites
- 3344US11989492B2Preston matrix generatorAPPLIED MATERIALS INC·Filed 2019·Granted May 21, 2024·0 cites·20 claims
- 3443US12451380B2Semiconductor fabrication using process control parameter matrixAPPLIED MATERIALS INC·Filed 2018·Granted Oct 21, 2025·0 cites·16 claims
- 3530US2012009847A1Closed-loop control of cmp slurry flowMENK GREGORY E·Filed 2010·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Sivakumar Dhandapani files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →