Inventor · disambiguated record
Steven George Hansen
Also filed as: HANSEN STEVEN · HANSEN STEVEN G · HANSEN STEVEN GEORGE
32 granted patents·12 pending applications·469 citations·filing 1985–2022
97Inventor score
Files withASML NETHERLANDS BV35HANSEN STEVEN GEORGE5CELLA JAMES J1HANSEN STEVEN G1MULDER HEINE MELLE1
Top patents by PatentIndex Score
44 records- 0198US11126090B2Model for calculating a stochastic variation in an arbitrary patternASML NETHERLANDS BV·Filed 2020·Granted Sep 21, 2021·9 cites·21 claims
- 0297US10545411B2Model for calculating a stochastic variation in an arbitrary patternASML NETHERLANDS BV·Filed 2015·Granted Jan 28, 2020·8 cites·20 claims
- 0397US9934346B2Source mask optimization to reduce stochastic effectsASML NETHERLANDS BV·Filed 2015·Granted Apr 3, 2018·14 cites·28 claims
- 0497US8786824B2Source-mask optimization in lithographic apparatusHANSEN STEVEN GEORGE·Filed 2010·Granted Jul 22, 2014·38 cites·20 claims
- 0597US7245356B2Lithographic apparatus and method for optimizing illumination using a photolithographic simulationASML NETHERLANDS BV·Filed 2005·Granted Jul 17, 2007·72 cites·30 claims
- 0696US9213783B2Source mask optimization to reduce stochastic effectsHANSEN STEVEN GEORGE·Filed 2012·Granted Dec 15, 2015·22 cites·27 claims
- 0796US7030966B2Lithographic apparatus and method for optimizing an illumination source using photolithographic simulationsASML NETHERLANDS BV·Filed 2004·Granted Apr 18, 2006·100 cites·59 claims
- 0892US7016017B2Lithographic apparatus and method for optimizing an illumination source using isofocal compensationASML NETHERLANDS BV·Filed 2003·Granted Mar 21, 2006·41 cites·25 claims
- 0992US6839125B2Method for optimizing an illumination source using full resist simulation and process window response metricASML NETHERLANDS BV·Filed 2003·Granted Jan 4, 2005·43 cites·13 claims
- 1090US7781149B2Reduced pitch multiple exposure processASML NETHERLANDS BV·Filed 2006·Granted Aug 24, 2010·16 cites·33 claims
- 1189US7684013B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 23, 2010·12 cites·15 claims
- 1288US10795267B2Model for estimating stochastic variationASML NETHERLANDS BV·Filed 2017·Granted Oct 6, 2020·3 cites·20 claims
- 1387US7180576B2Exposure with intensity balancing to mimic complex illuminator shapeASML NETHERLANDS BV·Filed 2004·Granted Feb 20, 2007·29 cites·35 claims
- 1485US11354484B2Failure model for predicting failure due to resist layerASML NETHERLANDS BV·Filed 2019·Granted Jun 7, 2022·2 cites·20 claims
- 1585US9116439B2Illumination system and lithographic apparatusMULDER HEINE MELLE·Filed 2011·Granted Aug 25, 2015·4 cites·20 claims
- 1680US7906270B2Reduced pitch multiple exposure processASML NETHERLANDS BV·Filed 2005·Granted Mar 15, 2011·6 cites·31 claims
- 1778US11835862B2Model for calculating a stochastic variation in an arbitrary patternASML NETHERLANDS BV·Filed 2021·Granted Dec 5, 2023·0 cites·20 claims
- 1877US7471375B2Correction of optical proximity effects by intensity modulation of an illumination arrangementASML NETHERLANDS BV·Filed 2006·Granted Dec 30, 2008·5 cites·25 claims
- 1976US7256873B2Enhanced lithographic resolution through double exposureASML NETHERLANDS BV·Filed 2004·Granted Aug 14, 2007·12 cites·11 claims
- 2075US8043797B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Oct 25, 2011·4 cites·30 claims
- 2173US7528934B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted May 5, 2009·3 cites·24 claims
- 2267US8982324B2Polarization designs for lithographic apparatusHANSEN STEVEN GEORGE·Filed 2010·Granted Mar 17, 2015·1 cites·20 claims
- 2364US7898644B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2008·Granted Mar 1, 2011·1 cites·22 claims
- 2463US7421677B2Illuminator controlled tone reversal printingASML NETHERLANDS BV·Filed 2004·Granted Sep 2, 2008·6 cites·12 claims
- 2561US8074947B2Method of using long-handed garden tools, each provided with a reconfigurable garden tool caddy deviceCELLA JAMES J·Filed 2007·Granted Dec 13, 2011·10 cites·2 claims
- 2661US2025028255A1Systems and methods for optimizing lithographic design variables using image-based failure rate modelASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2759US8576377B2Lithographic apparatus and device manufacturing methodHANSEN STEVEN GEORGE·Filed 2007·Granted Nov 5, 2013·1 cites·29 claims
- 2853US9651875B2Illumination system and lithographic apparatusASML NETHERLANDS BV·Filed 2015·Granted May 16, 2017·0 cites·21 claims
- 2952US2007258073A1Enhanced lithographic resolution through double exposureASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 3052US2008030708A1Device manufacturing methodASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 3149US7496882B2Optimization to avoid sidelobe printingASML NETHERLANDS BV·Filed 2004·Granted Feb 24, 2009·3 cites·43 claims
- 3248US2011244401A1Reduced pitch multiple exposure processASML NETHERLANDS BV·Filed 2011·Application pending·0 cites
- 3347US7981595B2Reduced pitch multiple exposure processASML NETHERLANDS BV·Filed 2005·Granted Jul 19, 2011·0 cites·32 claims
- 3445US2008093318A1Reconfigurable garden tool caddy device for conveniently supporting and transporting one or more garden tools to remote garden locations, and enabling the self-standing of long-handled garden tools in the garden when not in useHANSEN STEVEN G·Filed 2006·Application pending·0 cites
- 3544US2008158529A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 3641US2005007573A1Device manufacturing methodASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
- 3740US2007121090A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 3840US2004207829A1Illuminator controlled tone reversal printingASML NETHERLANDS BV·Filed 2003·Application pending·0 cites
- 3939US2006146307A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
- 4039US2006256311A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 4138US11029594B2Optimization of a lithography apparatus or patterning process based on selected aberrationASML NETHERLANDS BV·Filed 2017·Granted Jun 8, 2021·0 cites·21 claims
- 4238US9563135B2Process tuning with polarizationHANSEN STEVEN GEORGE·Filed 2011·Granted Feb 7, 2017·0 cites·19 claims
- 4336US4596643ACis-trans isomerization of olefinic compounds by photoinduced catalysisOLIN CORP·Filed 1985·Granted Jun 24, 1986·4 cites·26 claims
- 4436US2013044302A1Lithographic Apparatus and MethodASML NETHERLANDS BV·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →