Inventor · disambiguated record
Stefan Xalter
Also filed as: XALTER STEFAN
34 granted patents·10 pending applications·337 citations·filing 2000–2024
97Inventor score
Top patents by PatentIndex Score
44 records- 0196US9013684B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2012·Granted Apr 21, 2015·17 cites·18 claims
- 0292US6504597B2Optical arrangementZEISS STIFTUNG·Filed 2001·Granted Jan 7, 2003·54 cites·15 claims
- 0389US6781668B2Optical arrangementZEISS STIFTUNG·Filed 2000·Granted Aug 24, 2004·36 cites·14 claims
- 0488US6521877B1Optical arrangement having improved temperature distribution within an optical elementZEISS STIFTUNG·Filed 2000·Granted Feb 18, 2003·37 cites·17 claims
- 0587US6522392B1Optical systems and methods of compensating rotationally non-symmetrical image defects in an optical systemZEISS STIFTUNG·Filed 2000·Granted Feb 18, 2003·34 cites·5 claims
- 0686US6844994B2Optical element deformation systemZEISS CARL SMT AG·Filed 2001·Granted Jan 18, 2005·34 cites·45 claims
- 0785US8339577B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2009·Granted Dec 25, 2012·9 cites·31 claims
- 0884US7760327B2Reflecting optical element with eccentric optical passagewayZEISS CARL SMT AG·Filed 2006·Granted Jul 20, 2010·8 cites·55 claims
- 0981US6583850B2Optical systemZEISS STIFTUNG·Filed 2001·Granted Jun 24, 2003·21 cites·24 claims
- 1080US9897925B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 20, 2018·1 cites·18 claims
- 1180US7929227B2Optical assemblyZEISS CARL SMT GMBH·Filed 2010·Granted Apr 19, 2011·4 cites·29 claims
- 1280US6466382B2Optical arrangementZEISS STIFTUNG·Filed 2000·Granted Oct 15, 2002·26 cites·10 claims
- 1379US6897599B2System for damping oscillationsZEISS CARL SMT AG·Filed 2002·Granted May 24, 2005·20 cites·31 claims
- 1476US7791826B2Optical assemblyZEISS CARL SMT AG·Filed 2006·Granted Sep 7, 2010·6 cites·63 claims
- 1575US6700715B2Oscillation damping systemZEISS CARL SMT AG·Filed 2001·Granted Mar 2, 2004·16 cites·23 claims
- 1673US9239229B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Jan 19, 2016·1 cites·13 claims
- 1770US8089707B2Diaphragm changing deviceBIEG HERMANN·Filed 2010·Granted Jan 3, 2012·1 cites·23 claims
- 1870US7589921B2Actuator deviceZEISS CARL SMT AG·Filed 2007·Granted Sep 15, 2009·5 cites·38 claims
- 1966US9001309B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 7, 2015·0 cites·30 claims
- 2065US8659745B2Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrationsZEISS CARL SMT GMBH·Filed 2013·Granted Feb 25, 2014·1 cites·32 claims
- 2165US2023350307A1Optical element for reflecting radiation, and optical assemblyZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 2265US2018246415A1Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 2362US2024329285A1Method and apparatus for producing at least one hollow structure, mirror, euv lithography system, fluid feed apparatus and method for feeding a fluidZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2460US11281114B2Projection exposure apparatus for semiconductor lithographyZEISS CARL SMT GMBH·Filed 2020·Granted Mar 22, 2022·0 cites·29 claims
- 2560US9019475B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 28, 2015·0 cites·26 claims
- 2658US12222655B2Stop, optical system and lithography apparatusZEISS CARL SMT GMBH·Filed 2021·Granted Feb 11, 2025·0 cites·20 claims
- 2758US7684125B2Diaphragm changing deviceZEISS CARL SMT AG·Filed 2003·Granted Mar 23, 2010·4 cites·26 claims
- 2856US8269947B2Optical system for semiconductor lithographyMELZER FRANK·Filed 2009·Granted Sep 18, 2012·1 cites·21 claims
- 2956US2015168853A1Lithography apparatus with restricted movement relative to floor and related methodZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 3053US9383544B2Optical system for semiconductor lithographyMELZER FRANK·Filed 2012·Granted Jul 5, 2016·0 cites·16 claims
- 3153US2014021324A1Lithography apparatus and methodZEISS CARL SMT GMBH·Filed 2013·Application pending·0 cites
- 3252US2009135395A1Optical system for semiconductor lithographyZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 3351US10139733B2Diaphragm changing deviceZEISS CARL SMT GMBH·Filed 2016·Granted Nov 27, 2018·0 cites·30 claims
- 3450US8570676B2Optical assemblyBIEG HERMANN·Filed 2011·Granted Oct 29, 2013·0 cites·29 claims
- 3550US2012075611A1Diaphragm changing deviceBIEG HERMANN·Filed 2011·Application pending·0 cites
- 3648US10571813B2Connection arrangement for a force-fit connection between ceramic componentsZEISS CARL SMT GMBH·Filed 2017·Granted Feb 25, 2020·0 cites·20 claims
- 3745US8542346B2Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrationsLIMBACH GUIDO·Filed 2009·Granted Sep 24, 2013·0 cites·33 claims
- 3844US2011216428A1Housing structureZEISS CARL SMT GMBH·Filed 2011·Application pending·0 cites
- 3943US2009185148A1Support for an optical elementZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 4041US9316930B2Low-contamination optical arrangementKWAN YIM-BUN PATRICK·Filed 2011·Granted Apr 19, 2016·0 cites·40 claims
- 4140US9804500B2Optical imaging arrangement with simplified manufactureZEISS CARL SMT GMBH·Filed 2016·Granted Oct 31, 2017·0 cites·20 claims
- 4238US8018664B2Housing structureZEISS CARL SMT GMBH·Filed 2004·Granted Sep 13, 2011·1 cites·14 claims
- 4335US9298111B2Optical arrangement in a projection exposure apparatus for EUV lithographyKULITZKI VIKTOR·Filed 2012·Granted Mar 29, 2016·0 cites·27 claims
- 4435US2008193201A1Optical Assembly Structure Comprising a Connecting Body with Thermal Expansion Compensations MeansZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →