Inventor · disambiguated record
Susumu Komoriya
Also filed as: KOMORIYA SUSUMU
21 granted patents·3 pending applications·362 citations·filing 1978–2012
96Inventor score
Top patents by PatentIndex Score
24 records- 0190US8016585B2Nanoimprint resin stamperHITACHI HIGH TECH CORP·Filed 2008·Granted Sep 13, 2011·16 cites·12 claims
- 0290US5025284AExposure method and exposure apparatusHITACHI LTD·Filed 1990·Granted Jun 18, 1991·53 cites·20 claims
- 0390US4699505AExposure method and exposure apparatusHITACHI LTD·Filed 1985·Granted Oct 13, 1987·46 cites·33 claims
- 0484US8109751B2Imprint device and microstructure transfer methodANDO TAKASHI·Filed 2007·Granted Feb 7, 2012·6 cites·24 claims
- 0582US4298273AProjection aligner and method of positioning a waferHITACHI LTD·Filed 1979·Granted Nov 3, 1981·34 cites·29 claims
- 0680US8092209B2Imprinting deviceANDO TAKASHI·Filed 2009·Granted Jan 10, 2012·4 cites·12 claims
- 0776US8491291B2Pattern transfer method and imprint deviceANDO TAKASHI·Filed 2012·Granted Jul 23, 2013·2 cites·6 claims
- 0876US8133418B2Pattern transfer method and imprint deviceANDO TAKASHI·Filed 2007·Granted Mar 13, 2012·3 cites·12 claims
- 0976US5409538AControlling method of forming thin film, system for said controlling method, exposure method and system for said exposure methodHITACHI LTD·Filed 1993·Granted Apr 25, 1995·26 cites·26 claims
- 1076US4974018AExposure method and exposure apparatusHITACHI LTD·Filed 1988·Granted Nov 27, 1990·20 cites·9 claims
- 1174US8096802B2Nanoimprint stamper and a fine-structure transfer apparatus using the stamperMORI KYOICHI·Filed 2009·Granted Jan 17, 2012·5 cites·14 claims
- 1273US5747201AControlling method of forming thin film, system for said controlling method, exposure method and system for said exposure methodHITACHI LTD·Filed 1995·Granted May 5, 1998·28 cites·13 claims
- 1369US5094539AMethod of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in sameHITACHI LTD·Filed 1989·Granted Mar 10, 1992·22 cites·18 claims
- 1465US8268209B2Pattern forming method and its moldOGINO MASAHIKO·Filed 2007·Granted Sep 18, 2012·3 cites·7 claims
- 1561US4783225AWafer and method of working the sameHITACHI LTD·Filed 1986·Granted Nov 8, 1988·27 cites·13 claims
- 1656US4218136AMethod of and apparatus for aligning photomaskHITACHI LTD·Filed 1978·Granted Aug 19, 1980·12 cites·10 claims
- 1753US5432608AMethod of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in sameHITACHI LTD·Filed 1993·Granted Jul 11, 1995·11 cites·51 claims
- 1852US2012074615A1Imprint device and microstructure transfer methodANDO TAKASHI·Filed 2011·Application pending·0 cites
- 1951US5230747AWafer having chamfered bend portions in the joint regions between the contour of the wafer and the cut-away portion of the waferHITACHI LTD·Filed 1991·Granted Jul 27, 1993·17 cites·3 claims
- 2049US5279992AMethod of producing a wafer having a curved notchHITACHI LTD·Filed 1992·Granted Jan 18, 1994·18 cites·4 claims
- 2146US5260771AMethod of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in sameHITACHI LTD·Filed 1991·Granted Nov 9, 1993·8 cites·16 claims
- 2244USRE40139EWafer having chamfered bend portions in the joint regions between the contour of the cut-away portion of the waferRENESAS TECH CORP·Filed 2000·Granted Mar 4, 2008·1 cites·12 claims
- 2344US2006286193A1Imprint device and microstructure transfer methodANDO TAKASHI·Filed 2006·Application pending·0 cites
- 2438US2013011632A1Microfine structure, method for producing microfine structure, and polymerizable resin composition for producing the sameOGINO MASAHIKO·Filed 2010·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Susumu Komoriya files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →