Inventor · disambiguated record
Takeshi Kinsho
Also filed as: KINSHO TAKESHI
262 granted patents·26 pending applications·2,321 citations·filing 1994–2025
99Inventor score
Top patents by PatentIndex Score
288 records- 0199US6448420B1Acid-decomposable ester compound suitable for use in resist materialSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 10, 2002·160 cites·5 claims
- 0299US6312867B1Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 1999·Granted Nov 6, 2001·209 cites·17 claims
- 0398US7511169B2Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Mar 31, 2009·45 cites·4 claims
- 0498US6280898B1Lactone-containing compounds, polymers, resist compositions, and patterning methodSHINETSU CHEMICAL CO·Filed 1999·Granted Aug 28, 2001·229 cites·21 claims
- 0597US8057985B2Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning processOHASHI MASAKI·Filed 2009·Granted Nov 15, 2011·52 cites·11 claims
- 0697US7084303B2Tertiary amine compounds having an ester structure and processes for preparing sameSHINETSU CHEMICAL CO·Filed 2002·Granted Aug 1, 2006·79 cites·8 claims
- 0797US6147249AEster compounds, polymers, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 1999·Granted Nov 14, 2000·81 cites·20 claims
- 0896US8283104B2Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the sameOHASHI MASAKI·Filed 2010·Granted Oct 9, 2012·14 cites·20 claims
- 0996US8114571B2Photoacid generator, resist composition, and patterning processOHASHI MASAKI·Filed 2009·Granted Feb 14, 2012·29 cites·17 claims
- 1096US8105748B2Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning processOHASHI MASAKI·Filed 2009·Granted Jan 31, 2012·81 cites·11 claims
- 1196US8057982B2Monomer, resist composition, and patterning processHATAKEYAMA JUN·Filed 2009·Granted Nov 15, 2011·33 cites·17 claims
- 1296US8048610B2Sulfonium salt-containing polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2009·Granted Nov 1, 2011·32 cites·11 claims
- 1396US7981589B2Fluorinated monomer, fluorinated polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Jul 19, 2011·22 cites·5 claims
- 1496US7919226B2Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Apr 5, 2011·19 cites·10 claims
- 1596US6830866B2Resist composition and patterning processSHI ETSU CHEMICAL CO LTD·Filed 2002·Granted Dec 14, 2004·77 cites·14 claims
- 1696US6284429B1Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 4, 2001·50 cites·19 claims
- 1795US11661390B2Acetal compounds and processes for preparing thereof, and processes for preparing aldehyde compounds from the acetal compoundsSHINETSU CHEMICAL CO·Filed 2022·Granted May 30, 2023·2 cites·14 claims
- 1895US7670751B2Photoacid generator, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Mar 2, 2010·26 cites·18 claims
- 1995US7531289B2Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted May 12, 2009·16 cites·13 claims
- 2095US6746818B2(Meth)acrylates having lactone structure, polymers, photoresist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Jun 8, 2004·48 cites·20 claims
- 2194US8846846B2Naphthalene derivative, resist bottom layer material, and patterning processKINSHO TAKESHI·Filed 2011·Granted Sep 30, 2014·8 cites·2 claims
- 2294US8835697B2Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning processKORI DAISUKE·Filed 2012·Granted Sep 16, 2014·9 cites·5 claims
- 2394US8114570B2Photoacid generator, resist composition, and patterning processOHSAWA YOUICHI·Filed 2009·Granted Feb 14, 2012·15 cites·16 claims
- 2494US7531290B2Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted May 12, 2009·17 cites·16 claims
- 2593US8597869B2Sulfonium salt, resist composition, and patterning processSAGEHASHI MASAYOSHI·Filed 2011·Granted Dec 3, 2013·10 cites·7 claims
- 2693US8394570B2Sulfonium salt, acid generator, resist composition, photomask blank, and patterning processOHASHI MASAKI·Filed 2009·Granted Mar 12, 2013·12 cites·12 claims
- 2793US8168367B2Resist composition and patterning processWATANABE SATOSHI·Filed 2009·Granted May 1, 2012·13 cites·6 claims
- 2892US8999625B2Silicon-containing antireflective coatings including non-polymeric silsesquioxanesIBM·Filed 2013·Granted Apr 7, 2015·8 cites·17 claims
- 2992US8349533B2Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning processSHINETSU CHEMICAL CO·Filed 2009·Granted Jan 8, 2013·14 cites·8 claims
- 3092USRE41580ELactone-containing compounds, polymers, resist compositions, and patterning methodSHINETSU CHEMICAL CO·Filed 2005·Granted Aug 24, 2010·8 cites·48 claims
- 3192US7611821B2Positive resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Nov 3, 2009·15 cites·2 claims
- 3291US7833694B2Lactone-containing compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2009·Granted Nov 16, 2010·9 cites·8 claims
- 3390US11518729B2Processes for preparing 5,5-dimethyl-2-oxo-3-cyclopentene-1-carboxylate compounds and 3,5,5-trimethyl-2-oxo-3-cyclopentene-1-carboxylate compounds from 3,3-dimethyl-1-butene-1,4-dicarboxylate compounds and 1,3,3-trimethyl-1-butene-1,4-dicarboxylate compounds, and 1,3,3-trimethyl-1-butene-1,4-dicarboxylate compoundsSHINETSU CHEMICAL CO·Filed 2021·Granted Dec 6, 2022·1 cites·5 claims
- 3490US8663898B2Resist underlayer film composition and patterning process using the sameOGIHARA TSUTOMU·Filed 2011·Granted Mar 4, 2014·7 cites·28 claims
- 3590US8431323B2Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning processWATANABE TAKERU·Filed 2009·Granted Apr 30, 2013·7 cites·28 claims
- 3689US12312309B23-acyloxymethyl-3-butenal acetal compoundsSHINETSU CHEMICAL CO·Filed 2023·Granted May 27, 2025·0 cites·1 claims
- 3789US12312310B2Methods of producing 7-methyl-3-methylene-7-octenal acetal compoundsSHINETSU CHEMICAL CO·Filed 2023·Granted May 27, 2025·0 cites·2 claims
- 3889US8609889B2Photoacid generator, resist composition, and patterning processOHASHI MASAKI·Filed 2010·Granted Dec 17, 2013·6 cites·15 claims
- 3989US8329384B2Resist-modifying composition and pattern forming processWATANABE TAKERU·Filed 2010·Granted Dec 11, 2012·10 cites·10 claims
- 4089US8062828B2Positive resist composition and patterning processOHSAWA YOUICHI·Filed 2009·Granted Nov 22, 2011·11 cites·7 claims
- 4189US7871752B2Lactone-containing compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Jan 18, 2011·11 cites·5 claims
- 4288US9372404B2Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymerSHINETSU CHEMICAL CO·Filed 2013·Granted Jun 21, 2016·8 cites·27 claims
- 4388US7868199B2Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning processEUDYNA DEVICES INC·Filed 2007·Granted Jan 11, 2011·7 cites·9 claims
- 4488US7678530B2Lactone-containing compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Mar 16, 2010·9 cites·20 claims
- 4588US7556909B2Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Jul 7, 2009·9 cites·16 claims
- 4687US8853031B2Resist underlayer film composition and patterning process using the sameOGIHARA TSUTOMU·Filed 2011·Granted Oct 7, 2014·5 cites·28 claims
- 4787US8691490B2Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning processOHASHI MASAKI·Filed 2011·Granted Apr 8, 2014·4 cites·2 claims
- 4887US6444396B1Ester compounds, polymers, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 3, 2002·24 cites·19 claims
- 4987US6413695B1Resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Jul 2, 2002·18 cites·15 claims
- 5086US6946233B2Polymer, resist material and patterning methodSHINETSU CHEMICAL CO·Filed 2002·Granted Sep 20, 2005·25 cites·14 claims
Showing the top 50 of 288 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →