Inventor · disambiguated record
Tai-Peng Lee
Also filed as: LEE TAI-PENG
7 granted patents·2 pending applications·99 citations·filing 2001–2007
85Inventor score
Files withPROMOS TECHNOLOGIES INC3PROMOS TECHNOLOGIES PTE LTD2DONG ZHONG1MOSEL VITEL INC1MOSEL VITELIC INC1
Top patents by PatentIndex Score
9 records- 0187US6933218B1Low temperature nitridation of amorphous high-K metal-oxide in inter-gates insulator stackMOSEL VITELIC INC·Filed 2004·Granted Aug 23, 2005·44 cites·36 claims
- 0277US6924241B2Method of making a silicon nitride film that is transmissive to ultraviolet lightPROMOS TECHNOLOGIES INC·Filed 2003·Granted Aug 2, 2005·23 cites·10 claims
- 0367US7265015B2Use of chlorine to fabricate trench dielectric in integrated circuitsPROMOS TECHNOLOGIES INC·Filed 2005·Granted Sep 4, 2007·3 cites·20 claims
- 0466US7371695B2Use of TEOS oxides in integrated circuit fabrication processesPROMOS TECHNOLOGIES PTE LTD·Filed 2006·Granted May 13, 2008·2 cites·12 claims
- 0564US6881668B2Control of air gap position in a dielectric layerMOSEL VITEL INC·Filed 2003·Granted Apr 19, 2005·15 cites·31 claims
- 0659US7087998B2Control of air gap position in a dielectric layerPROMOS TECHNOLOGY INC·Filed 2004·Granted Aug 8, 2006·9 cites·19 claims
- 0750US7026172B2Reduced thickness variation in a material layer deposited in narrow and wide integrated circuit trenchesPROMOS TECHNOLOGIES INC·Filed 2001·Granted Apr 11, 2006·3 cites·53 claims
- 0850US2007290292A1Use of teos oxides in integrated circuit fabrication processesPROMOS TECHNOLOGIES PTE LTD·Filed 2007·Application pending·0 cites
- 0942US2007128800A1Use of chlorine to fabricate trench dielectric in integrated circuitsDONG ZHONG·Filed 2007·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Tai-Peng Lee files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →