Inventor · disambiguated record
Tamaki Yuasa
Also filed as: YUASA TAMAKI
6 granted patents·8 pending applications·15 citations·filing 2002–2016
76Inventor score
Top patents by PatentIndex Score
14 records- 0181US8485127B2Processing apparatusNISHIMOTO SHINYA·Filed 2006·Granted Jul 16, 2013·8 cites·20 claims
- 0270US8052887B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2010·Granted Nov 8, 2011·2 cites·5 claims
- 0366US8173928B2Processing deviceNOZAWA TOSHIHISA·Filed 2007·Granted May 8, 2012·2 cites·9 claims
- 0449US8785809B2Processing deviceNOZAWA TOSHIHISA·Filed 2012·Granted Jul 22, 2014·0 cites·20 claims
- 0543US2007221130A1Substrate Processing ApparatusTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 0643US2004168768A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 0742US2009266487A1Microwave introduction deviceTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 0840US2007240979A1Shield Body and Vacuum Processing ApparatusTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 0940US2007137575A1Plasma processing apparatusTADAHIRO OHMI·Filed 2004·Application pending·0 cites
- 1039US2007163502A1Substrate processing apparatusNOZAWA TOSHIHISA·Filed 2004·Application pending·0 cites
- 1138US8267040B2Plasma processing apparatus and plasma processing methodISHIBASHI KIYOTAKA·Filed 2005·Granted Sep 18, 2012·0 cites·2 claims
- 1236USD563950SMicrowave introducing antenna for a plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Mar 11, 2008·3 cites·1 claims
- 1334US2018130681A1Processing systemTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 1434US2004250771A1Microwave plasma substrate processing deviceFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →