Inventor · disambiguated record
Timo Laufer
Also filed as: LAUFER TIMO
20 granted patents·42 citations·filing 2003–2022
92Inventor score
Top patents by PatentIndex Score
20 records- 0193US11372341B2Method for temperature control of a componentZEISS CARL SMT GMBH·Filed 2021·Granted Jun 28, 2022·3 cites·20 claims
- 0291US9316929B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2013·Granted Apr 19, 2016·10 cites·22 claims
- 0390US10031423B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2017·Granted Jul 24, 2018·4 cites·20 claims
- 0484US12140877B2Method for avoiding a degradation of an optical element, projection system, illumination system and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2022·Granted Nov 12, 2024·1 cites·22 claims
- 0582US11187989B2Method for determining properties of an EUV sourceZEISS CARL SMT GMBH·Filed 2020·Granted Nov 30, 2021·1 cites·20 claims
- 0679US11022903B2Method for temperature control of a componentZEISS CARL SMT GMBH·Filed 2020·Granted Jun 1, 2021·1 cites·20 claims
- 0778US8698999B2Protection module for EUV lithography apparatus, and EUV lithography apparatusEHM DIRK HEINRICH·Filed 2011·Granted Apr 15, 2014·3 cites·30 claims
- 0873US8339569B2Temperature-control device for an optical assemblySCHOEPPACH ARMIN·Filed 2011·Granted Dec 25, 2012·2 cites·15 claims
- 0968US10684551B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2019·Granted Jun 16, 2020·0 cites·9 claims
- 1068US9383328B2Lithography apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Jul 5, 2016·1 cites·20 claims
- 1167US7557902B2Projection objectiveZEISS CARL SMT AG·Filed 2003·Granted Jul 7, 2009·10 cites·25 claims
- 1265US12321106B2Device for detecting a temperature, installation for producing an optical element and method for producing an optical elementZEISS CARL SMT GMBH·Filed 2022·Granted Jun 3, 2025·0 cites·30 claims
- 1363US10317802B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2018·Granted Jun 11, 2019·0 cites·21 claims
- 1458US12321105B2Projection exposure apparatus for semiconductor lithographyZEISS CARL SMT GMBH·Filed 2022·Granted Jun 3, 2025·0 cites·20 claims
- 1558US9746778B2EUV exposure apparatus with reflective elements having reduced influence of temperature variationZEISS CARL SMT GMBH·Filed 2016·Granted Aug 29, 2017·0 cites·14 claims
- 1656US9134504B2Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatusLAUFER TIMO·Filed 2012·Granted Sep 15, 2015·1 cites·23 claims
- 1753US7524072B2Optical component, comprising a material with a predetermined homogeneity of thermal expansionZEISS CARL SMT AG·Filed 2004·Granted Apr 28, 2009·4 cites·34 claims
- 1853US7428037B2Optical component that includes a material having a thermal longitudinal expansion with a zero crossingZEISS CARL SMT AG·Filed 2005·Granted Sep 23, 2008·1 cites·28 claims
- 1950US9639007B2Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted May 2, 2017·0 cites·24 claims
- 2038US10466598B2Projection exposure apparatus for semiconductor lithography with increased thermal robustnessZEISS CARL SMT GMBH·Filed 2019·Granted Nov 5, 2019·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →