Inventor · disambiguated record
Vikram Singh
Also filed as: SINGH VIKRAM · SINGH VIKRAM PAL
49 granted patents·38 pending applications·2,037 citations·filing 1997–2025
98Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT35VARIAN SEMICONDUCTOR EQUIPMENT ASS INC9NOVELLUS SYSTEMS INC7GODET LUDOVIC5LAM RES CORP5
Top patents by PatentIndex Score
87 records- 0198US6846745B1High-density plasma process for filling high aspect ratio structuresNOVELLUS SYSTEMS INC·Filed 2002·Granted Jan 25, 2005·311 cites·28 claims
- 0298US6596654B1Gap fill for high aspect ratio structuresNOVELLUS SYSTEMS INC·Filed 2001·Granted Jul 22, 2003·425 cites·26 claims
- 0398US5968275AMethods and apparatus for passivating a substrate in a plasma reactorLAM RES CORP·Filed 1997·Granted Oct 19, 1999·593 cites·26 claims
- 0497US8926850B2Plasma processing with enhanced charge neutralization and process controlVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2012·Granted Jan 6, 2015·59 cites·20 claims
- 0597US8101510B2Plasma processing apparatusGODET LUDOVIC·Filed 2009·Granted Jan 24, 2012·50 cites·19 claims
- 0696US6042687AMethod and apparatus for improving etch and deposition uniformity in plasma semiconductor processingLAM RES CORP·Filed 1997·Granted Mar 28, 2000·185 cites·29 claims
- 0795US9123509B2Techniques for plasma processing a substratePAPASOULIOTIS GEORGE D·Filed 2011·Granted Sep 1, 2015·39 cites·19 claims
- 0895US8312738B2Integrated controlled freeze zone (CFZ) tower and dividing wall (DWC) for enhanced hydrocarbon recoverySINGH VIKRAM·Filed 2007·Granted Nov 20, 2012·30 cites·24 claims
- 0994US9706634B2Apparatus and techniques to treat substrates using directional plasma and reactive gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Jul 11, 2017·12 cites·14 claims
- 1094US8664098B2Plasma processing apparatusGODET LUDOVIC·Filed 2012·Granted Mar 4, 2014·7 cites·17 claims
- 1193US8188445B2Ion sourceGODET LUDOVIC·Filed 2010·Granted May 29, 2012·15 cites·19 claims
- 1293US7453059B2Technique for monitoring and controlling a plasma processVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Nov 18, 2008·21 cites·31 claims
- 1392US7397048B2Technique for boron implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2005·Granted Jul 8, 2008·23 cites·16 claims
- 1491US7524743B2Conformal doping apparatus and methodVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2005·Granted Apr 28, 2009·22 cites·21 claims
- 1589US10004133B2Apparatus and techniques to treat substrates using directional plasma and reactive gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Jun 19, 2018·5 cites·18 claims
- 1689US8603591B2Enhanced etch and deposition profile control using plasma sheath engineeringGODET LUDOVIC·Filed 2009·Granted Dec 10, 2013·8 cites·13 claims
- 1788US9514912B2Control of ion angular distribution of ion beams with hidden deflection electrodeVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2014·Granted Dec 6, 2016·9 cites·20 claims
- 1888US7863194B2Implantation of multiple species to address copper reliabilityVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2010·Granted Jan 4, 2011·9 cites·8 claims
- 1986US6468384B1Predictive wafer temperature control system and methodNOVELLUS SYSTEMS INC·Filed 2000·Granted Oct 22, 2002·50 cites·33 claims
- 2085US8202792B2Method of processing a substrate having a non-planar surfacePAPASOULIOTIS GEORGE D·Filed 2010·Granted Jun 19, 2012·7 cites·4 claims
- 2185US7476849B2Technique for monitoring and controlling a plasma processVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted Jan 13, 2009·10 cites·21 claims
- 2284US8937004B2Apparatus and method for controllably implanting workpiecesVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Jan 20, 2015·5 cites·13 claims
- 2383US8858816B2Enhanced etch and deposition profile control using plasma sheath engineeringVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Oct 14, 2014·4 cites·9 claims
- 2483US8664561B2System and method for selectively controlling ion composition of ion sourcesHADIDI KAMAL·Filed 2009·Granted Mar 4, 2014·7 cites·22 claims
- 2582US6787483B1Gap fill for high aspect ratio structuresNOVELLUS SYSTEMS INC·Filed 2003·Granted Sep 7, 2004·21 cites·24 claims
- 2681US10224181B2Radio frequency extraction system for charge neutralized ion beamVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Mar 5, 2019·3 cites·13 claims
- 2781US7001854B1Hydrogen-based phosphosilicate glass process for gap fill of high aspect ratio structuresNOVELLUS SYSTEMS INC·Filed 2002·Granted Feb 21, 2006·35 cites·54 claims
- 2881US2025232957A1Systems and methods for multi-level pulsing in rf plasma toolsLAM RES CORP·Filed 2025·Application pending·0 cites
- 2980US7528389B2Profile adjustment in plasma ion implanterVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted May 5, 2009·8 cites·25 claims
- 3080US2025226182A1Systems and methods for multi-level pulsing in rf plasma toolsLAM RES CORP·Filed 2025·Application pending·0 cites
- 3178US8450193B2Techniques for temperature-controlled ion implantationENGLAND JONATHAN GERALD·Filed 2007·Granted May 28, 2013·9 cites·1 claims
- 3278US7820533B2Multi-step plasma doping with improved dose controlVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Oct 26, 2010·6 cites·23 claims
- 3378US7067440B1Gap fill for high aspect ratio structuresNOVELLUS SYSTEMS INC·Filed 2004·Granted Jun 27, 2006·17 cites·7 claims
- 3477US7687787B2Profile adjustment in plasma ion implanterVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted Mar 30, 2010·6 cites·17 claims
- 3574US8461030B2Apparatus and method for controllably implanting workpiecesRENAU ANTHONY·Filed 2010·Granted Jun 11, 2013·3 cites·19 claims
- 3674US7737013B2Implantation of multiple species to address copper reliabilityVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted Jun 15, 2010·5 cites·10 claims
- 3773US8679960B2Technique for processing a substrate having a non-planar surfacePAPASOULIOTIS GEORGE D·Filed 2010·Granted Mar 25, 2014·3 cites·21 claims
- 3872US8778603B2Method and system for modifying substrate relief features using ion implantationGODET LUDOVIC·Filed 2011·Granted Jul 15, 2014·2 cites·10 claims
- 3971US12283463B2Systems and methods for multi-level pulsing in RF plasma toolsLAM RES CORP·Filed 2020·Granted Apr 22, 2025·0 cites·20 claims
- 4070US8507372B2Method for processing a substrate having a non-planar substrate surfacePAPASOULIOTIS GEORGE D·Filed 2012·Granted Aug 13, 2013·2 cites·17 claims
- 4167US10128082B2Apparatus and techniques to treat substrates using directional plasma and point of use chemistryVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Nov 13, 2018·1 cites·11 claims
- 4266US2024243327A1Naphthalene diimide compound and redox flow battery containing the sameKOREA ADVANCED INST SCI & TECH·Filed 2023·Application pending·0 cites
- 4365US2025019241A1Microwave apparatus and method for production of carbon materials6K INC·Filed 2024·Application pending·0 cites
- 4460US10600616B2Apparatus and techniques to treat substrates using directional plasma and point of use chemistryVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Mar 24, 2020·0 cites·15 claims
- 4560US7122485B1Deposition profile modification through process chemistryNOVELLUS SYSTEMS INC·Filed 2002·Granted Oct 17, 2006·8 cites·46 claims
- 4660US2023404467A1Head mounted camera and eye track system for animalsUNIV CALIFORNIA·Filed 2023·Application pending·0 cites
- 4759US2009283670A1Technique for Monitoring and Controlling A PLasma ProcessVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Application pending·0 cites
- 4858US10209405B2Mobile electronic device cover plate comprising a thin sapphire layerGTAT CORP·Filed 2014·Granted Feb 19, 2019·0 cites·32 claims
- 4957US11905266B2Covalent organic framework and method of preparing the sameKOREA ADVANCED INST SCI & TECH·Filed 2021·Granted Feb 20, 2024·0 cites·8 claims
- 5057US9767987B2Method and system for modifying substrate relief features using ion implantationVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2014·Granted Sep 19, 2017·0 cites·20 claims
Showing the top 50 of 87 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →