Inventor · disambiguated record
Walter Franken
Also filed as: FRANKEN WALTER
6 granted patents·10 pending applications·28 citations·filing 1979–2015
77Inventor score
Top patents by PatentIndex Score
16 records- 0178US9045818B2Shadow mask held magnetically on a substrate supportGERSDORFF MARKUS·Filed 2009·Granted Jun 2, 2015·12 cites·11 claims
- 0271US8308867B2Device for the temperature control of the surface temperatures of substrates in a CVD reactorFRANKEN WALTER·Filed 2008·Granted Nov 13, 2012·3 cites·12 claims
- 0358US7056388B2Reaction chamber with at least one HF feedthroughAIXTRON AG·Filed 2002·Granted Jun 6, 2006·4 cites·9 claims
- 0451US2009110805A1Apparatus and Method for Controlling the Surface Temperature of a Substrate in a Process ChamberAIXTRON INC·Filed 2007·Application pending·0 cites
- 0550US2007074661A1CVD reactor with stabilized process chamber heightAIXTRON AG·Filed 2006·Application pending·0 cites
- 0646US2009183682A1Source container of a vpe reactorFRANKEN WALTER·Filed 2007·Application pending·0 cites
- 0745US2008251020A1Cvd-Reactor with Slidingly Mounted Susceptor HolderFRANKEN WALTER·Filed 2006·Application pending·0 cites
- 0844US2013040054A1Coating device and method for operating a coating device having a shielding plateAIXTRON SE·Filed 2011·Application pending·0 cites
- 0942US10822701B2CVD or PVD reactor for coating large-area substratesAIXTRON SE·Filed 2015·Granted Nov 3, 2020·0 cites·12 claims
- 1042US4253963AAsymmetrical ultrafiltration membrane on the basis of cellulose triacetateSARTORIUS GMBH·Filed 1979·Granted Mar 3, 1981·9 cites·11 claims
- 1141US2005092246A1Device for depositing thin layers with a wireless detection of process parametersFiled 2004·Application pending·0 cites
- 1240US9847241B2Transport module for a semiconductor fabrication device or coupling deviceAIXTRON SE·Filed 2014·Granted Dec 19, 2017·0 cites·12 claims
- 1338US2005000441A1Process and device for depositing in particular crystalline layers on in particular crystalline substratesFiled 2004·Application pending·0 cites
- 1438US2004231599A1Process chamber with a base with sectionally different rotational drive and layer deposition method in such a process chamberFiled 2004·Application pending·0 cites
- 1534US2006124055A1Mask-retaining deviceFRANKEN WALTER·Filed 2005·Application pending·0 cites
- 1630US2012003389A1Mocvd reactor having a ceiling panel coupled locally differently to a heat dissipation memberBRIEN DANIEL·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →