Inventor · disambiguated record
Xinliang Lu
Also filed as: LU XINLIANG
62 granted patents·16 pending applications·1,754 citations·filing 2000–2022
99Inventor score
Top patents by PatentIndex Score
78 records- 0198US7939422B2Methods of thin film processAPPLIED MATERIALS INC·Filed 2007·Granted May 10, 2011·240 cites·25 claims
- 0298US7520957B2Lid assembly for front end of line fabricationAPPLIED MATERIALS INC·Filed 2005·Granted Apr 21, 2009·162 cites·8 claims
- 0398US7494545B2Epitaxial deposition process and apparatusAPPLIED MATERIALS INC·Filed 2006·Granted Feb 24, 2009·246 cites·10 claims
- 0498US7396480B2Method for front end of line fabricationAPPLIED MATERIALS INC·Filed 2005·Granted Jul 8, 2008·285 cites·20 claims
- 0597US11495437B2Surface pretreatment process to improve quality of oxide films produced by remote plasmaMATTSON TECH INC·Filed 2020·Granted Nov 8, 2022·4 cites·20 claims
- 0697US11257680B2Methods for processing a workpiece using fluorine radicalsMATTSON TECH INC·Filed 2020·Granted Feb 22, 2022·4 cites·20 claims
- 0797US10269574B1Surface treatment of carbon containing films using organic radicalsMATTSON TECH INC·Filed 2018·Granted Apr 23, 2019·12 cites·25 claims
- 0897US8846163B2Method for removing oxidesKAO CHIEN-TEH·Filed 2012·Granted Sep 30, 2014·190 cites·19 claims
- 0997US7871926B2Methods and systems for forming at least one dielectric layerAPPLIED MATERIALS INC·Filed 2007·Granted Jan 18, 2011·77 cites·17 claims
- 1097US7465665B2Method for depositing tungsten-containing layers by vapor deposition techniquesAPPLIED MATERIALS INC·Filed 2007·Granted Dec 16, 2008·43 cites·20 claims
- 1197US7211144B2Pulsed nucleation deposition of tungsten layersAPPLIED MATERIALS INC·Filed 2002·Granted May 1, 2007·161 cites·25 claims
- 1296US11043393B2Ozone treatment for selective silicon nitride etch over siliconMATTSON TECH INC·Filed 2020·Granted Jun 22, 2021·5 cites·20 claims
- 1396US7709385B2Method for depositing tungsten-containing layers by vapor deposition techniquesAPPLIED MATERIALS INC·Filed 2008·Granted May 4, 2010·33 cites·20 claims
- 1496US7695563B2Pulsed deposition process for tungsten nucleationAPPLIED MATERIALS INC·Filed 2007·Granted Apr 13, 2010·38 cites·30 claims
- 1596US7220673B2Method for depositing tungsten-containing layers by vapor deposition techniquesAPPLIED MATERIALS INC·Filed 2006·Granted May 22, 2007·29 cites·38 claims
- 1695US7767024B2Method for front end of line fabricationAPPPLIED MATERIALS INC·Filed 2008·Granted Aug 3, 2010·28 cites·28 claims
- 1794US10804109B2Surface treatment of silicon and carbon containing films by remote plasma with organic precursorsMATTSON TECH INC·Filed 2018·Granted Oct 13, 2020·6 cites·27 claims
- 1894US9048183B2NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursorsAPPLIED MATERIALS INC·Filed 2014·Granted Jun 2, 2015·14 cites·18 claims
- 1994US7101795B1Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layerAPPLIED MATERIALS INC·Filed 2000·Granted Sep 5, 2006·50 cites·14 claims
- 2093US11062910B2Surface treatment of silicon or silicon germanium surfaces using organic radicalsMATTSON TECH INC·Filed 2019·Granted Jul 13, 2021·4 cites·18 claims
- 2193US10403492B1Integration of materials removal and surface treatment in semiconductor device fabricationMATTSON TECH INC·Filed 2018·Granted Sep 3, 2019·8 cites·19 claims
- 2292US10950416B2Chamber seasoning to improve etch uniformity by reducing chemistryMATTSON TECH INC·Filed 2019·Granted Mar 16, 2021·5 cites·18 claims
- 2392US10354883B2Surface treatment of silicon or silicon germanium surfaces using organic radicalsMATTSON TECH INC·Filed 2018·Granted Jul 16, 2019·4 cites·24 claims
- 2491US7780793B2Passivation layer formation by plasma clean process to reduce native oxide growthAPPLIED MATERIALS INC·Filed 2007·Granted Aug 24, 2010·19 cites·24 claims
- 2589US11387111B2Processing of workpieces with reactive species generated using alkyl halideMATTSON TECH INC·Filed 2019·Granted Jul 12, 2022·4 cites·18 claims
- 2689US8642468B2NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursorsGANGULI SESHADRI·Filed 2011·Granted Feb 4, 2014·9 cites·17 claims
- 2788US11164725B2Generation of hydrogen reactive species for processing of workpiecesMATTSON TECH INC·Filed 2019·Granted Nov 2, 2021·3 cites·13 claims
- 2888US10950428B1Method for processing a workpieceMATTSON TECH INC·Filed 2019·Granted Mar 16, 2021·4 cites·18 claims
- 2988US7550381B2Contact clean by remote plasma and repair of silicide surfaceAPPLIED MATERIALS INC·Filed 2005·Granted Jun 23, 2009·12 cites·14 claims
- 3086US9145612B2Deposition of N-metal films comprising aluminum alloysAPPLIED MATERIALS INC·Filed 2013·Granted Sep 29, 2015·3 cites·18 claims
- 3185US8927059B2Deposition of metal films using alane-based precursorsAPPLIED MATERIALS INC·Filed 2012·Granted Jan 6, 2015·6 cites·19 claims
- 3284US8268684B2Method and apparatus for trench and via profile modificationCHANG MEI·Filed 2011·Granted Sep 18, 2012·5 cites·20 claims
- 3384US7994002B2Method and apparatus for trench and via profile modificationAPPLIED MATERIALS INC·Filed 2009·Granted Aug 9, 2011·7 cites·21 claims
- 3484US7867789B2Contact clean by remote plasma and repair of silicide surfaceAPPLIED MATERIALS INC·Filed 2009·Granted Jan 11, 2011·7 cites·20 claims
- 3583US7955510B2Oxide etch with NH4-NF3 chemistryAPPLIED MATERIALS INC·Filed 2009·Granted Jun 7, 2011·6 cites·20 claims
- 3682US11164742B2Selective deposition using methylation treatmentMATTSON TECH INC·Filed 2020·Granted Nov 2, 2021·1 cites·19 claims
- 3782US10692730B1Silicon oxide selective dry etch processMATTSON TECH INC·Filed 2019·Granted Jun 23, 2020·2 cites·17 claims
- 3879US10854511B2Methods of lowering wordline resistanceAPPLIED MATERIALS INC·Filed 2018·Granted Dec 1, 2020·2 cites·14 claims
- 3979US8987080B2Methods for manufacturing metal gatesAPPLIED MATERIALS INC·Filed 2013·Granted Mar 24, 2015·4 cites·20 claims
- 4076US11039527B2Air leak detection in plasma processing apparatus with separation gridMATTSON TECH INC·Filed 2019·Granted Jun 15, 2021·1 cites·17 claims
- 4175US8252696B2Selective etching of silicon nitrideLU XINLIANG·Filed 2008·Granted Aug 28, 2012·5 cites·16 claims
- 4274US10964528B2Integration of materials removal and surface treatment in semiconductor device fabricationMATTSON TECH INC·Filed 2019·Granted Mar 30, 2021·1 cites·15 claims
- 4374US9881787B2Deposition methods for uniform and conformal hybrid titanium oxide filmsAPPLIED MATERIALS INC·Filed 2016·Granted Jan 30, 2018·2 cites·12 claims
- 4472US11289374B2Nucleation-free gap fill ALD processAPPLIED MATERIALS INC·Filed 2017·Granted Mar 29, 2022·1 cites·4 claims
- 4569US12394670B2Nucleation-free gap fill ALD processAPPLIED MATERIALS INC·Filed 2022·Granted Aug 19, 2025·0 cites·16 claims
- 4668US9530627B2Method for cleaning titanium alloy depositionAPPLIED MATERIALS INC·Filed 2014·Granted Dec 27, 2016·0 cites·20 claims
- 4768US2021307151A1Air Leak Detection In Plasma Processing Apparatus With Separation GridMATTSON TECH INC·Filed 2021·Application pending·0 cites
- 4867US11626269B2Chamber seasoning to improve etch uniformity by reducing chemistryMATTSON TECH INC·Filed 2021·Granted Apr 11, 2023·0 cites·15 claims
- 4966US10910228B2Surface treatment of carbon containing films using organic radicalsMATTSON TECH INC·Filed 2019·Granted Feb 2, 2021·0 cites·17 claims
- 5065US2022059321A1Generation of Hydrogen Reactive Species For Processing of WorkpiecesMATTSON TECH INC·Filed 2021·Application pending·0 cites
Showing the top 50 of 78 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →