Inventor · disambiguated record
Yasufumi Nishii
Also filed as: NISHII YASUFUMI
21 granted patents·12 pending applications·144 citations·filing 2004–2017
94Inventor score
Top patents by PatentIndex Score
33 records- 0197US9013675B2Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating methodNISHII YASUFUMI·Filed 2012·Granted Apr 21, 2015·32 cites·18 claims
- 0297US8134685B2Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating methodNISHII YASUFUMI·Filed 2008·Granted Mar 13, 2012·43 cites·67 claims
- 0394US8477283B2Exposure apparatus and device manufacturing methodNISHII YASUFUMI·Filed 2007·Granted Jul 2, 2013·26 cites·42 claims
- 0491US8233139B2Immersion system, exposure apparatus, exposing method, and device fabricating methodNISHII YASUFUMI·Filed 2009·Granted Jul 31, 2012·13 cites·27 claims
- 0587US7804576B2Maintenance method, maintenance device, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2005·Granted Sep 28, 2010·7 cites·38 claims
- 0685US9019467B2Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2013·Granted Apr 28, 2015·2 cites·35 claims
- 0781US7982857B2Stage apparatus, exposure apparatus, and exposure method with recovery device having lyophilic portionNIKON CORP·Filed 2004·Granted Jul 19, 2011·15 cites·23 claims
- 0878US9798245B2Exposure apparatus, and exposure method, with recovery device to recover liquid leaked from between substrate and memberNISHII YASUFUMI·Filed 2010·Granted Oct 24, 2017·2 cites·32 claims
- 0969US9182684B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2014·Granted Nov 10, 2015·0 cites·44 claims
- 1068US9766555B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2016·Granted Sep 19, 2017·0 cites·84 claims
- 1168US8035800B2Exposure apparatus, maintenance method, exposure method, and method for producing deviceNIKON CORP·Filed 2007·Granted Oct 11, 2011·2 cites·39 claims
- 1267US8300207B2Exposure apparatus, immersion system, exposing method, and device fabricating methodNISHII YASUFUMI·Filed 2008·Granted Oct 30, 2012·2 cites·43 claims
- 1365US9268237B2Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2013·Granted Feb 23, 2016·0 cites·26 claims
- 1464US9846371B2Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIPPON KOGAKU KK·Filed 2015·Granted Dec 19, 2017·0 cites·17 claims
- 1562US8736809B2Exposure apparatus, exposure method, and method for producing deviceNAGASAKA HIROYUKI·Filed 2010·Granted May 27, 2014·0 cites·94 claims
- 1662US2017329234A1Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2017·Application pending·0 cites
- 1761US8384880B2Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2008·Granted Feb 26, 2013·0 cites·17 claims
- 1861US8208117B2Exposure method, substrate stage, exposure apparatus, and device manufacturing methodOWA SOICHI·Filed 2008·Granted Jun 26, 2012·0 cites·8 claims
- 1960US8891055B2Maintenance method, maintenance device, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2013·Granted Nov 18, 2014·0 cites·20 claims
- 2058US2018004096A1Stage apparatus, exposure apparatus, and exposure methodNIPPON KOGAKU KK·Filed 2017·Application pending·0 cites
- 2155US9599907B2Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2013·Granted Mar 21, 2017·0 cites·36 claims
- 2253US8456608B2Maintenance method, maintenance device, exposure apparatus, and device manufacturing methodFUJIWARA TOMOHARU·Filed 2010·Granted Jun 4, 2013·0 cites·40 claims
- 2353US2006227312A1Exposure method, substrate stage, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2006·Application pending·0 cites
- 2452US2012300181A1Immersion system, exposure apparatus, exposing method, and device fabricating methodNISHII YASUFUMI·Filed 2012·Application pending·0 cites
- 2552US2007222958A1Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2007·Application pending·0 cites
- 2649US8488099B2Exposure apparatus and device manufacturing methodNAGASAKA HIROYUKI·Filed 2005·Granted Jul 16, 2013·0 cites·27 claims
- 2749US2010328637A1Exposure apparatus, exposing method and device fabricating methodNIKON CORP·Filed 2009·Application pending·0 cites
- 2848US2007216889A1Exposure Apparatus, Exposure Method, and Method for Producing DeviceNISHII YASUFUMI·Filed 2005·Application pending·0 cites
- 2946US2009122282A1Exposure apparatus, liquid immersion system, exposing method, and device fabricating methodNIKON CORP·Filed 2008·Application pending·0 cites
- 3046US2008231823A1Apparatus and methods for reducing the escape of immersion liquid from immersion lithography apparatusNIKON CORP·Filed 2008·Application pending·0 cites
- 3142US2013169944A1Exposure apparatus, exposure method, device manufacturing method, program, and recording mediumNIKON CORP·Filed 2012·Application pending·0 cites
- 3242US2007103661A1Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2006·Application pending·0 cites
- 3342US2006250593A1Exposure apparatus and device fabricating methodNIKON CORP·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →