Inventor · disambiguated record
Yasuhiro Yoshitake
Also filed as: YOSHITAKE YASUHIRO
61 granted patents·5 pending applications·1,022 citations·filing 1987–2024
99Inventor score
Top patents by PatentIndex Score
66 records- 0195US6841321B2Method and system for processing a semi-conductor deviceHITACHI LTD·Filed 2002·Granted Jan 11, 2005·74 cites·14 claims
- 0294US7449689B2Dimension measuring SEM system, method of evaluating shape of circuit pattern and a system for carrying out the methodHITACHI HIGH TECH CORP·Filed 2005·Granted Nov 11, 2008·23 cites·20 claims
- 0394US5016149AIlluminating method and illuminating apparatus for carrying out the same, and projection exposure method and projection exposure apparatus for carrying out the sameHITACHI LTD·Filed 1989·Granted May 14, 1991·92 cites·23 claims
- 0493US7273685B2Method for controlling semiconductor device production process and a method for producing semiconductor devicesRENESAS TECH CORP·Filed 2005·Granted Sep 25, 2007·17 cites·14 claims
- 0591US6909930B2Method and system for monitoring a semiconductor device manufacturing processHITACHI LTD·Filed 2002·Granted Jun 21, 2005·52 cites·37 claims
- 0691US6456951B1Method and apparatus for processing inspection dataHITACHI LTD·Filed 2000·Granted Sep 24, 2002·58 cites·27 claims
- 0789US8045146B2Method and apparatus for reviewing defectHITACHI HIGH TECH CORP·Filed 2008·Granted Oct 25, 2011·18 cites·9 claims
- 0889US4819033AIllumination apparatus for exposureHITACHI LTD·Filed 1987·Granted Apr 4, 1989·55 cites·8 claims
- 0988US8416402B2Method and apparatus for inspecting defectsSHIBATA YUKIHIRO·Filed 2012·Granted Apr 9, 2013·6 cites·14 claims
- 1088US5684565APattern detecting method, pattern detecting apparatus, projection exposing apparatus using the same and exposure systemHITACHI LTD·Filed 1994·Granted Nov 4, 1997·57 cites·33 claims
- 1187US7599076B2Method for optically detecting height of a specimen and charged particle beam apparatus using the sameHITACHI HIGH TECH CORP·Filed 2006·Granted Oct 6, 2009·9 cites·9 claims
- 1287US7456963B2Method and equipment for detecting pattern defectHITACHI LTD·Filed 2006·Granted Nov 25, 2008·7 cites·6 claims
- 1387US6800859B1Method and equipment for detecting pattern defectHITACHI LTD·Filed 1999·Granted Oct 5, 2004·55 cites·27 claims
- 1487US6542830B1Process control systemHITACHI LTD·Filed 1997·Granted Apr 1, 2003·93 cites·25 claims
- 1586US7881520B2Defect inspection systemHITACHI HIGH TECH CORP·Filed 2006·Granted Feb 1, 2011·9 cites·4 claims
- 1685US7791725B2Method and equipment for detecting pattern defectHITACHI LTD·Filed 2008·Granted Sep 7, 2010·5 cites·10 claims
- 1784US8660336B2Defect inspection systemUENO TAKETO·Filed 2012·Granted Feb 25, 2014·5 cites·16 claims
- 1883US6869807B2Method and its apparatus for manufacturing semiconductor deviceHITACHI LTD·Filed 2002·Granted Mar 22, 2005·21 cites·16 claims
- 1983US6757621B2Process management systemHITACHI LTD·Filed 2003·Granted Jun 29, 2004·35 cites·10 claims
- 2083US6611728B1Inspection system and method for manufacturing electronic devices using the inspection systemHITACHI LTD·Filed 1999·Granted Aug 26, 2003·71 cites·17 claims
- 2182US6686107B2Method for producing a semiconductor deviceHITACHI LTD·Filed 2001·Granted Feb 3, 2004·18 cites·20 claims
- 2279US8203706B2Method and apparatus for inspecting defectsSHIBATA YUKIHIRO·Filed 2009·Granted Jun 19, 2012·5 cites·12 claims
- 2379US7643140B2Method and apparatus for inspecting a semiconductor deviceHITACHI HIGH TECH CORP·Filed 2008·Granted Jan 5, 2010·6 cites·14 claims
- 2478US4922290ASemiconductor exposing system having apparatus for correcting change in wavelength of light sourceHITACHI LTD·Filed 1988·Granted May 1, 1990·27 cites·7 claims
- 2577US6721940B2Exposure processing method and exposure system for the sameHITACHI LTD·Filed 2002·Granted Apr 13, 2004·18 cites·4 claims
- 2675US8411264B2Method and apparatus for inspecting defectsUENO TAKEO·Filed 2009·Granted Apr 2, 2013·6 cites·19 claims
- 2775US6697698B2Overlay inspection apparatus for semiconductor substrate and method thereofHITACHI LTD·Filed 2002·Granted Feb 24, 2004·16 cites·2 claims
- 2874US7612889B2Method and apparatus for measuring displacement of a sampleHITACHI LTD·Filed 2005·Granted Nov 3, 2009·6 cites·9 claims
- 2972US8275189B2Defect inspection systemUENO TAKETO·Filed 2010·Granted Sep 25, 2012·2 cites·8 claims
- 3072US6921905B2Method and equipment for detecting pattern defectHITACHI LTD·Filed 2004·Granted Jul 26, 2005·5 cites·20 claims
- 3171US4862008AMethod and apparatus for optical alignment of semiconductor by using a hologramHITACHI LTD·Filed 1988·Granted Aug 29, 1989·21 cites·40 claims
- 3269US6334097B1Method of determining lethality of defects in circuit pattern inspection method of selecting defects to be reviewed and inspection system of circuit patterns involved with the methodsHITACHI LTD·Filed 1999·Granted Dec 25, 2001·29 cites·38 claims
- 3368US8148705B2Method and apparatus for inspecting defects of patterns formed on a hard disk mediumHIROSE TAKENORI·Filed 2008·Granted Apr 3, 2012·2 cites·18 claims
- 3468US5371570ARefractive/diffractive optical system for broad-band through-the-lens imaging of alignment marks on substrates in stepper machinesUNIV ROCHESTER·Filed 1993·Granted Dec 6, 1994·21 cites·11 claims
- 3566US10853959B2Optical inspection tool and methodSANDISK TECHNOLOGIES LLC·Filed 2019·Granted Dec 1, 2020·1 cites·3 claims
- 3666US6801827B2Overlay inspection apparatus for semiconductor substrate and method thereofHITACHI LTD·Filed 2002·Granted Oct 5, 2004·9 cites·13 claims
- 3764US6667806B2Process and apparatus for manufacturing semiconductor deviceHITACHI LTD·Filed 2001·Granted Dec 23, 2003·9 cites·8 claims
- 3864US6556955B2Method of determining lethality of defects in circuit pattern inspection, method of selecting defects to be reviewed, and inspection system of circuit patterns involved with the methodsHITACHI LTD·Filed 2001·Granted Apr 29, 2003·7 cites·14 claims
- 3961US2025377307A1Optical inspection tool including field aperture system having different transmittance for different radiation wavelengths and method of using thereofSANDISK TECHNOLOGIES LLC·Filed 2024·Application pending·0 cites
- 4058US6653032B2Exposure methodHITACHI LTD·Filed 2001·Granted Nov 25, 2003·5 cites·4 claims
- 4158US4993837AMethod and apparatus for pattern detectionHITACHI LTD·Filed 1989·Granted Feb 19, 1991·12 cites·35 claims
- 4257US8259414B2Magnetic recording disk having aligning pattern and method for aligning thereofHIROSE TAKENORI·Filed 2008·Granted Sep 4, 2012·0 cites·13 claims
- 4356US8982332B2Distance measuring device and distance measuring methodTACHIZAKI TAKEHIRO·Filed 2011·Granted Mar 17, 2015·2 cites·8 claims
- 4456US8659761B2Method and apparatus for measuring displacement of a sample using a wire grid polarizer to generate interference lightNAKATA TOSHIHIKO·Filed 2011·Granted Feb 25, 2014·0 cites·9 claims
- 4554US8736830B2Pattern inspection device of substrate surface and pattern inspection method of the sameWATANABE MASAHIRO·Filed 2009·Granted May 27, 2014·0 cites·13 claims
- 4654US8553214B2Method and equipment for detecting pattern defectSHISHIDO HIROAKI·Filed 2010·Granted Oct 8, 2013·0 cites·7 claims
- 4754US8416292B2Defect inspection apparatus and methodSHIBATA YUKIHIRO·Filed 2009·Granted Apr 9, 2013·0 cites·14 claims
- 4852US8279431B2Spectral detection method and device, and defect inspection method and apparatus using the sameHIROSE TAKENORI·Filed 2009·Granted Oct 2, 2012·1 cites·12 claims
- 4952US8121398B2Method and apparatus for inspecting defectsYOSHITAKE YASUHIRO·Filed 2009·Granted Feb 21, 2012·2 cites·22 claims
- 5052US6720117B2Exposure mask with appended mask error dataFiled 2003·Granted Apr 13, 2004·2 cites·17 claims
Showing the top 50 of 66 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →