Inventor · disambiguated record
Yezheng Tao
Also filed as: TAO YEZHENG
22 granted patents·5 pending applications·107 citations·filing 2007–2025
94Inventor score
Top patents by PatentIndex Score
27 records- 0196US8680495B1Extreme ultraviolet light sourceCYMER INC·Filed 2013·Granted Mar 25, 2014·17 cites·18 claims
- 0295US8791440B1Target for extreme ultraviolet light sourceCYMER INC·Filed 2013·Granted Jul 29, 2014·25 cites·29 claims
- 0394US8872143B2Target for laser produced plasma extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2013·Granted Oct 28, 2014·23 cites·26 claims
- 0492US9357625B2Extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2014·Granted May 31, 2016·11 cites·32 claims
- 0592US8927952B2Target for laser produced plasma extreme ultraviolet light sourceCymer LLC·Filed 2014·Granted Jan 6, 2015·6 cites·21 claims
- 0687US10064261B2Extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2017·Granted Aug 28, 2018·3 cites·24 claims
- 0786US9462668B2Target for extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2015·Granted Oct 4, 2016·3 cites·26 claims
- 0885US9232624B2Target for laser produced plasma extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2015·Granted Jan 5, 2016·2 cites·20 claims
- 0984US9380691B2Adaptive laser system for an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2014·Granted Jun 28, 2016·7 cites·20 claims
- 1084US8866110B2Extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2014·Granted Oct 21, 2014·5 cites·20 claims
- 1179US2025318038A1Laser system for source material conditioning in an euv light sourceASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 1277US12245350B2Optical isolation moduleASML NETHERLANDS BV·Filed 2022·Granted Mar 4, 2025·0 cites·16 claims
- 1373US11553582B2Optical isolation moduleASML NETHERLANDS BV·Filed 2020·Granted Jan 10, 2023·0 cites·20 claims
- 1472US9338870B2Extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2014·Granted May 10, 2016·3 cites·23 claims
- 1566US2025126698A1Euv collector for an euv projection exposure apparatusZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1661US10645789B2Optical isolation moduleASML NETHERLANDS BV·Filed 2017·Granted May 5, 2020·0 cites·26 claims
- 1758US12369244B2Laser system for source material conditioning in an EUV light sourceASML NETHERLANDS BV·Filed 2020·Granted Jul 22, 2025·0 cites·21 claims
- 1858US9155179B2Target for extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2014·Granted Oct 6, 2015·0 cites·31 claims
- 1957US9832855B2Optical isolation moduleASML NETHERLANDS BV·Filed 2015·Granted Nov 28, 2017·0 cites·24 claims
- 2056US9826616B2Extreme ultraviolet light source utilizing a target of finite extentASML NETHERLANDS BV·Filed 2016·Granted Nov 21, 2017·0 cites·25 claims
- 2156US9107279B2Target for laser produced plasma extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2014·Granted Aug 11, 2015·0 cites·23 claims
- 2255US8912514B2Target for extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2014·Granted Dec 16, 2014·0 cites·20 claims
- 2348US2025185147A1EUV Light Source Target MetrologyASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2441US10663866B2Wavelength-based optical filteringASML NETHERLANDS BV·Filed 2016·Granted May 26, 2020·0 cites·25 claims
- 2540US2016165709A1System and Method for Isolating Gain Elements in a Laser SystemASML NETHERLANDS BV·Filed 2014·Application pending·0 cites
- 2635US8536549B2Light source employing laser-produced plasmaTAO YEZHENG·Filed 2007·Granted Sep 17, 2013·2 cites·24 claims
- 2728US2011122387A1System and method for light source employing laser-produced plasmaUNIV CALIFORNIA·Filed 2009·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →