Inventor · disambiguated record
Ying-Tsung Chen
Also filed as: CHEN YING · CHEN YING-TSUNG
51 granted patents·12 pending applications·320 citations·filing 1998–2024
98Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD26TAIWAN SEMICONDUCTOR MFG11UNITED MICROELECTRONICS CORP8TSAI SHIH-HUNG4CHEN YING-TSUNG2
Top patents by PatentIndex Score
63 records- 0198US9349833B1Semiconductor device and method of forming the sameUNITED MICROELECTRONICS CORP·Filed 2015·Granted May 24, 2016·32 cites·11 claims
- 0296US8470714B1Method of forming fin structures in integrated circuitsTSAI SHIH-HUNG·Filed 2012·Granted Jun 25, 2013·44 cites·10 claims
- 0395US8664060B2Semiconductor structure and method of fabricating the sameLIU AN-CHI·Filed 2012·Granted Mar 4, 2014·22 cites·20 claims
- 0494US8669618B2Manufacturing method for semiconductor device having metal gateFU SSU-I·Filed 2011·Granted Mar 11, 2014·20 cites·7 claims
- 0593US11854821B2Hard mask removal methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 26, 2023·2 cites·20 claims
- 0693US9768024B1Multi-layer mask and method of forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Sep 19, 2017·7 cites·20 claims
- 0793US8278184B1Fabrication method of a non-planar transistorCHEN YING-TSUNG·Filed 2011·Granted Oct 2, 2012·24 cites·10 claims
- 0891US10971370B2Hard mask removal methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 6, 2021·4 cites·20 claims
- 0990US10510552B2Hard mask removal methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 17, 2019·4 cites·20 claims
- 1088US9054187B2Semiconductor structureUNITED MICROELECTRONICS CORP·Filed 2013·Granted Jun 9, 2015·8 cites·12 claims
- 1187US8722501B2Method for manufacturing multi-gate transistor deviceTSAI SHIH-HUNG·Filed 2011·Granted May 13, 2014·8 cites·12 claims
- 1286US9960050B2Hard mask removal methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted May 1, 2018·5 cites·20 claims
- 1384US9384962B2Oxygen treatment of replacement work-function metals in CMOS transistor gatesHWANG GUANG-YAW·Filed 2011·Granted Jul 5, 2016·7 cites·22 claims
- 1483US2024387187A1Methods for reducing scratch defects in chemical mechanical planarizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1582US11694889B2Chemical mechanical polishing cleaning system with temperature control for defect reductionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 4, 2023·2 cites·20 claims
- 1682US9871115B1Doped poly-silicon for polyCMP planarity improvementTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jan 16, 2018·3 cites·20 claims
- 1780US7217648B2Post-ESL porogen burn-out for copper ELK integrationTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted May 15, 2007·23 cites·19 claims
- 1879US2023377898A1Methods for reducing scratch defects in chemical mechanical planarizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 1978US8987096B2Semiconductor processCHEN YING-TSUNG·Filed 2012·Granted Mar 24, 2015·5 cites·15 claims
- 2077US2024387699A1Methods of forming semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2176US12237402B2Methods of forming semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Feb 25, 2025·0 cites·20 claims
- 2274US11515403B2Semiconductor device and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Nov 29, 2022·1 cites·20 claims
- 2374US8598028B2Gate height loss improvement for a transistorTU CHE-HAO·Filed 2011·Granted Dec 3, 2013·5 cites·15 claims
- 2474US7081413B2Method and structure for ultra narrow gateTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Jul 25, 2006·16 cites·16 claims
- 2574US2024412977A1System and method for removing impurities during chemical mechanical planarizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2673US8975179B2Planarization process for semiconductor device fabricationTU CHE-HAO·Filed 2011·Granted Mar 10, 2015·5 cites·16 claims
- 2773US8877623B2Method of forming semiconductor deviceTSAI SHIH-HUNG·Filed 2012·Granted Nov 4, 2014·3 cites·17 claims
- 2872US10522365B2Methods for reducing scratch defects in chemical mechanical planarizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 31, 2019·1 cites·20 claims
- 2972US7247571B2Method for planarizing semiconductor structuresTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Jul 24, 2007·4 cites·21 claims
- 3070US9006091B2Method of forming semiconductor device having metal gateUNITED MICROELECTRONICS CORP·Filed 2014·Granted Apr 14, 2015·2 cites·15 claims
- 3170US8872280B2Non-planar FET and manufacturing method thereofTSAI SHIH-HUNG·Filed 2012·Granted Oct 28, 2014·2 cites·7 claims
- 3269US7196423B2Interconnect structure with dielectric barrier and fabrication method thereofTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Mar 27, 2007·17 cites·24 claims
- 3367US6425335B1Miniature garbage incineratorFiled 2001·Granted Jul 30, 2002·14 cites·2 claims
- 3465US10541139B2Planarization control in semiconductor manufacturing processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jan 21, 2020·1 cites·20 claims
- 3564US9721831B2Method and apparatus for semiconductor planarizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 1, 2017·1 cites·20 claims
- 3664US7056826B2Method of forming copper interconnectsTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Jun 6, 2006·11 cites·23 claims
- 3763US12293917B2System and method for removing impurities during chemical mechanical planarizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted May 6, 2025·0 cites·21 claims
- 3863US9024393B2Manufacturing method for semiconductor device having metal gateUNITED MICROELECTRONICS CORP·Filed 2013·Granted May 5, 2015·1 cites·20 claims
- 3961US2020126803A1Methods for Reducing Scratch Defects in Chemical Mechanical PlanarizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Application pending·0 cites
- 4057US12237282B2Semiconductor device and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Feb 25, 2025·0 cites·20 claims
- 4157US10269567B2Multi-layer mask and method of forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 23, 2019·0 cites·20 claims
- 4256US9209040B2Amorphorus silicon insertion for STI-CMP planarity improvementTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Dec 8, 2015·1 cites·14 claims
- 4355US9312365B2Manufacturing method of non-planar FETUNITED MICROELECTRONICS CORP·Filed 2014·Granted Apr 12, 2016·0 cites·10 claims
- 4453US10068988B2Doped poly-silicon for PolyCMP planarity improvementTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 4, 2018·0 cites·20 claims
- 4550US2014339652A1Semiconductor device with oxygen-containing metal gatesUNITED MICROELECTRONICS CORP·Filed 2014·Application pending·0 cites
- 4650US2014199817A1Method for manufacturing multi-gate transistor deviceUNITED MICROELECTRONICS CORP·Filed 2014·Application pending·0 cites
- 4749US9278423B2CMP slurry particle breakupTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Mar 8, 2016·0 cites·20 claims
- 4847US7834405B2Semiconductor device including I/O oxide and nitrided core oxide on substrateTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Nov 16, 2010·0 cites·7 claims
- 4946US7473290B2Greasy soot purifying deviceYANG WEN-LUNG·Filed 2006·Granted Jan 6, 2009·0 cites·7 claims
- 5046US6037260APolishing compositionIND TECH RES INST·Filed 1998·Granted Mar 14, 2000·15 cites·21 claims
Showing the top 50 of 63 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →