Inventor · disambiguated record
Youichi Ohsawa
Also filed as: OHSAWA YOUICHI
89 granted patents·5 pending applications·1,584 citations·filing 1994–2014
99Inventor score
Top patents by PatentIndex Score
94 records- 0198US7569326B2Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 4, 2009·129 cites·11 claims
- 0298US7511169B2Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Mar 31, 2009·45 cites·4 claims
- 0398US6440634B1Onium salts, photoacid generators for resist compositions, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Aug 27, 2002·76 cites·33 claims
- 0497US8173354B2Sulfonium salt, resist composition, and patterning processOHSAWA YOUICHI·Filed 2010·Granted May 8, 2012·23 cites·8 claims
- 0597US8057985B2Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning processOHASHI MASAKI·Filed 2009·Granted Nov 15, 2011·52 cites·11 claims
- 0696US8795942B2Positive resist composition and patterning processKOBAYASHI TOMOHIRO·Filed 2007·Granted Aug 5, 2014·38 cites·20 claims
- 0796US8785105B2Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making methodOHSAWA YOUICHI·Filed 2011·Granted Jul 22, 2014·17 cites·16 claims
- 0896US8361693B2Chemically amplified positive photoresist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2010·Granted Jan 29, 2013·32 cites·10 claims
- 0996US8283104B2Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the sameOHASHI MASAKI·Filed 2010·Granted Oct 9, 2012·14 cites·20 claims
- 1096US8114571B2Photoacid generator, resist composition, and patterning processOHASHI MASAKI·Filed 2009·Granted Feb 14, 2012·29 cites·17 claims
- 1196US8105748B2Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning processOHASHI MASAKI·Filed 2009·Granted Jan 31, 2012·81 cites·11 claims
- 1296US8048610B2Sulfonium salt-containing polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2009·Granted Nov 1, 2011·32 cites·11 claims
- 1396US7919226B2Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Apr 5, 2011·19 cites·10 claims
- 1496US7514202B2Thermal acid generator, resist undercoat material and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Apr 7, 2009·37 cites·9 claims
- 1595US7670751B2Photoacid generator, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Mar 2, 2010·26 cites·18 claims
- 1695US7459261B2Resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2005·Granted Dec 2, 2008·28 cites·12 claims
- 1795US6916591B2Photoacid generators, chemically amplified resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Jul 12, 2005·79 cites·21 claims
- 1895US6416928B1Onium salts, photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Jul 9, 2002·41 cites·18 claims
- 1994US8703384B2Positive resist composition and patterning processKOBAYASHI TOMOHIRO·Filed 2011·Granted Apr 22, 2014·11 cites·6 claims
- 2094US8114570B2Photoacid generator, resist composition, and patterning processOHSAWA YOUICHI·Filed 2009·Granted Feb 14, 2012·15 cites·16 claims
- 2194US7531290B2Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted May 12, 2009·17 cites·16 claims
- 2293US8597869B2Sulfonium salt, resist composition, and patterning processSAGEHASHI MASAYOSHI·Filed 2011·Granted Dec 3, 2013·10 cites·7 claims
- 2393US8426115B2Patterning process and resist compositionHATAKEYAMA JUN·Filed 2010·Granted Apr 23, 2013·9 cites·13 claims
- 2493US8394570B2Sulfonium salt, acid generator, resist composition, photomask blank, and patterning processOHASHI MASAKI·Filed 2009·Granted Mar 12, 2013·12 cites·12 claims
- 2593US7629108B2Nitrogen-containing organic compound, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Dec 8, 2009·16 cites·10 claims
- 2693US6673511B1Resist compositionSHINETSU CHEMICAL CO·Filed 2000·Granted Jan 6, 2004·48 cites·9 claims
- 2792US8349533B2Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning processSHINETSU CHEMICAL CO·Filed 2009·Granted Jan 8, 2013·14 cites·8 claims
- 2892US7977027B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Jul 12, 2011·15 cites·3 claims
- 2991US8632939B2Polymer, chemically amplified positive resist composition and pattern forming processMASUNAGA KEIICHI·Filed 2011·Granted Jan 21, 2014·8 cites·12 claims
- 3091US8507175B2Patterning process and resist compositionHATAKEYAMA JUN·Filed 2010·Granted Aug 13, 2013·13 cites·21 claims
- 3191US7527912B2Photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted May 5, 2009·38 cites·15 claims
- 3291US6916593B2Resist compositionSHINETSU CHEMICAL CO·Filed 2003·Granted Jul 12, 2005·33 cites·11 claims
- 3390US8039198B2Sulfonium salt-containing polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2009·Granted Oct 18, 2011·12 cites·13 claims
- 3489US9233919B2Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making methodSHINETSU CHEMICAL CO·Filed 2014·Granted Jan 12, 2016·4 cites·2 claims
- 3589US8900793B2Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist compositionSAGEHASHI MASAYOSHI·Filed 2012·Granted Dec 2, 2014·7 cites·8 claims
- 3689US8609889B2Photoacid generator, resist composition, and patterning processOHASHI MASAKI·Filed 2010·Granted Dec 17, 2013·6 cites·15 claims
- 3789US8062828B2Positive resist composition and patterning processOHSAWA YOUICHI·Filed 2009·Granted Nov 22, 2011·11 cites·7 claims
- 3889US6689530B2Sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Feb 10, 2004·21 cites·15 claims
- 3989US6338931B1Resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Jan 15, 2002·35 cites·14 claims
- 4089US5847218ASulfonium salts and chemically amplified positive resist compositionsSHINETSU CHEMICAL CO·Filed 1997·Granted Dec 8, 1998·39 cites·19 claims
- 4188US7556909B2Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Jul 7, 2009·9 cites·16 claims
- 4287US8691490B2Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning processOHASHI MASAKI·Filed 2011·Granted Apr 8, 2014·4 cites·2 claims
- 4387US8535869B2Sulfonium salt, resist composition, and patterning processOHSAWA YOUICHI·Filed 2011·Granted Sep 17, 2013·7 cites·6 claims
- 4486US5569784ASulfonium salt and resist compositionSHINETSU CHEMICAL CO·Filed 1995·Granted Oct 29, 1996·29 cites·24 claims
- 4585US6551758B2Onium salts, photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Apr 22, 2003·25 cites·12 claims
- 4684US7629106B2Resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2006·Granted Dec 8, 2009·7 cites·25 claims
- 4784US6395446B1Resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted May 28, 2002·24 cites·19 claims
- 4883US8815492B2Chemically amplified positive resist composition for ArF immersion lithography and pattern forming processOHSAWA YOUICHI·Filed 2012·Granted Aug 26, 2014·4 cites·6 claims
- 4983US8338078B2Photoresist undercoat-forming material and patterning processHATAKEYAMA JUN·Filed 2009·Granted Dec 25, 2012·6 cites·12 claims
- 5082US7569324B2Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 4, 2009·18 cites·16 claims
Showing the top 50 of 94 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →