Inventor · disambiguated record
Yoram Uziel
Also filed as: UZIEL YORAM
48 granted patents·8 pending applications·734 citations·filing 1988–2025
98Inventor score
Files withKLA CORP24APPLIED MATERIALS ISRAEL LTD20APPLIED MATERIALS INC4KLA INSTR CORP2ORAMIR SEMICONDUCTOR LTD2
Top patents by PatentIndex Score
56 records- 0196US5438413AProcess for measuring overlay misregistration during semiconductor wafer fabricationKLA INSTR CORP·Filed 1993·Granted Aug 1, 1995·180 cites·12 claims
- 0295US9666412B1Method for charging and imaging an objectAPPLIED MATERIALS ISRAEL LTD·Filed 2016·Granted May 30, 2017·18 cites·12 claims
- 0393US11899375B2Massive overlay metrology sampling with multiple measurement columnsKLA CORP·Filed 2021·Granted Feb 13, 2024·2 cites·56 claims
- 0493US11378394B1On-the-fly scatterometry overlay metrology targetKLA CORP·Filed 2020·Granted Jul 5, 2022·7 cites·24 claims
- 0592US12001148B2Enhancing performance of overlay metrologyKLA CORP·Filed 2023·Granted Jun 4, 2024·2 cites·26 claims
- 0691US6172349B1Autofocusing apparatus and method for high resolution microscope systemKLA TENCOR CORP·Filed 1997·Granted Jan 9, 2001·150 cites·30 claims
- 0788US6764386B2Air bearing-sealed micro-processing chamberAPPLIED MATERIALS INC·Filed 2002·Granted Jul 20, 2004·40 cites·29 claims
- 0887US11409205B2Non-orthogonal target and method for using the same in measuring misregistration of semiconductor devicesKLA CORP·Filed 2020·Granted Aug 9, 2022·2 cites·22 claims
- 0987US10049904B1Method and system for moving a substrateAPPLIED MATERIALS ISRAEL LTD·Filed 2017·Granted Aug 14, 2018·6 cites·15 claims
- 1087US9046475B2High electron energy based overlay error measurement methods and systemsLANGER MOSHE·Filed 2011·Granted Jun 2, 2015·17 cites·19 claims
- 1187US5030008AMethod and apparatus for the automated analysis of three-dimensional objectsKLA INSTR CORP·Filed 1988·Granted Jul 9, 1991·97 cites·31 claims
- 1284US6908567B2Contaminant removal by laser-accelerated fluidAPPLIED MATERIALS ISRAEL LTD·Filed 2002·Granted Jun 21, 2005·30 cites·13 claims
- 1384US6900135B2Buffer station for wafer backside cleaning and inspectionAPPLIED MATERIALS INC·Filed 2002·Granted May 31, 2005·37 cites·25 claims
- 1483US11592755B2Enhancing performance of overlay metrologyKLA CORP·Filed 2021·Granted Feb 28, 2023·1 cites·30 claims
- 1583US6949147B2In situ module for particle removal from solid-state surfacesORAMIR SEMICONDUCTOR LTD·Filed 2004·Granted Sep 27, 2005·29 cites·10 claims
- 1683US6827816B1In situ module for particle removal from solid-state surfacesAPPLIED MATERIALS INC·Filed 2000·Granted Dec 7, 2004·30 cites·20 claims
- 1780US12379669B2Massive overlay metrology sampling with multiple measurement columnsKLA CORP·Filed 2023·Granted Aug 5, 2025·0 cites·33 claims
- 1880US7428850B2Integrated in situ scanning electronic microscope review station in semiconductor wafers and photomasks optical inspection systemAPPLIED MATERIALS ISRAEL LTD·Filed 2006·Granted Sep 30, 2008·8 cites·20 claims
- 1974US9829809B2System and method for attaching a mask to a mask holderAPPLIED MATERIALS ISRAEL LTD·Filed 2016·Granted Nov 28, 2017·2 cites·17 claims
- 2071US6566169B1Method and apparatus for local vectorial particle cleaningORAMIR SEMICONDUCTOR LTD·Filed 1999·Granted May 20, 2003·48 cites·37 claims
- 2170US12370581B2In-situ process chamber chuck cleaning by cleaning substrateKLA CORP·Filed 2023·Granted Jul 29, 2025·0 cites·21 claims
- 2268US11644419B2Measurement of properties of patterned photoresistKLA CORP·Filed 2021·Granted May 9, 2023·0 cites·18 claims
- 2368US6864458B2Iced film substrate cleaningAPPLIED MATERIALS INC·Filed 2003·Granted Mar 8, 2005·11 cites·18 claims
- 2467US11189451B2Charged particle beam source and a method for assembling a charged particle beam sourceAPPLIED MATERIALS ISRAEL LTD·Filed 2020·Granted Nov 30, 2021·0 cites·20 claims
- 2565US2025172881A1Calibrated measurement of overlay error using small targetsKLA CORP·Filed 2025·Application pending·0 cites
- 2664US10886092B2Charged particle beam source and a method for assembling a charged particle beam sourceAPPLIED MATERIALS ISRAEL LTD·Filed 2020·Granted Jan 5, 2021·0 cites·20 claims
- 2764US9302358B2Chamber elements and a method for placing a chamber at a load positionAPPLIED MATERIALS ISRAEL LTD·Filed 2013·Granted Apr 5, 2016·2 cites·21 claims
- 2863US10056274B2System and method for forming a sealed chamberAPPLIED MATERIALS ISRAEL LTD·Filed 2016·Granted Aug 21, 2018·1 cites·13 claims
- 2963US2024295827A1Calibrated measurement of overlay error using small targetsKLA CORP·Filed 2022·Application pending·0 cites
- 3062US10177048B2System for inspecting and reviewing a sampleAPPLIED MATERIALS ISRAEL LTD·Filed 2015·Granted Jan 8, 2019·1 cites·19 claims
- 3162US2025138435A1Massive measurement sampling using multiple chucks and optical columnsKLA CORP·Filed 2023·Application pending·0 cites
- 3262US2025369754A1System and method for multi-merit adaptive sampling in overlay metrologyKLA CORP·Filed 2024·Application pending·0 cites
- 3361US12327741B2Oscillating secondary stage for frame-mode overlay metrologyKLA CORP·Filed 2023·Granted Jun 10, 2025·0 cites·20 claims
- 3461US9997328B2System and method for forming a sealed chamberAPPLIED MATERIALS ISRAEL LTD·Filed 2016·Granted Jun 12, 2018·1 cites·17 claims
- 3558US12487190B2System and method for isolation of specific fourier pupil frequency in overlay metrologyKLA CORP·Filed 2022·Granted Dec 2, 2025·0 cites·26 claims
- 3658US11967535B2On-product overlay targetsKLA CORP·Filed 2021·Granted Apr 23, 2024·0 cites·26 claims
- 3758US9587749B2Slit valve with a pressurized gas bearingAPPLIED MATERIALS ISRAEL LTD·Filed 2014·Granted Mar 7, 2017·1 cites·16 claims
- 3856US11638938B2In situ process chamber chuck cleaning by cleaning substrateKLA CORP·Filed 2019·Granted May 2, 2023·0 cites·18 claims
- 3956US2023324809A1Extra tall target metrologyKLA CORP·Filed 2022·Application pending·0 cites
- 4053US12131959B2Systems and methods for improved metrology for semiconductor device wafersKLA CORP·Filed 2021·Granted Oct 29, 2024·0 cites·24 claims
- 4152US11713959B2Overlay metrology using spectroscopic phaseKLA CORP·Filed 2021·Granted Aug 1, 2023·0 cites·37 claims
- 4252US2025014950A1Mini environment instrumented waferKLA CORP·Filed 2024·Application pending·0 cites
- 4349US11637030B2Multi-stage, multi-zone substrate positioning systemsKLA CORP·Filed 2020·Granted Apr 25, 2023·0 cites·28 claims
- 4449US10060736B1Near-field sensor height controlAPPLIED MATERIALS ISRAEL LTD·Filed 2016·Granted Aug 28, 2018·0 cites·15 claims
- 4547US11607716B1Systems and methods for chuck cleaningKLA CORP·Filed 2020·Granted Mar 21, 2023·0 cites·39 claims
- 4647US10068748B2Scanning an object using multiple mechanical stagesAPPLIED MATERIALS ISRAEL LTD·Filed 2016·Granted Sep 4, 2018·0 cites·20 claims
- 4747US9297692B2System and method for inspecting a sample using landing lensAPPLIED MATERIALS ISRAEL LTD·Filed 2013·Granted Mar 29, 2016·0 cites·20 claims
- 4846US11177048B2Method and system for evaluating objectsAPPLIED MATERIALS ISRAEL LTD·Filed 2019·Granted Nov 16, 2021·0 cites·11 claims
- 4946US6571893B2Light vehicle for sporting and off-road bikingYOZMOT GFANOT INITIATIVE CT·Filed 2001·Granted Jun 3, 2003·11 cites·21 claims
- 5046US2023068016A1Systems and methods for rotational calibration of metrology toolsKLA CORP·Filed 2021·Application pending·0 cites
Showing the top 50 of 56 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →