Inventor · disambiguated record
Youping Zhang
Also filed as: ZHANG YOUPING
58 granted patents·8 pending applications·2,223 citations·filing 2000–2025
99Inventor score
Files withASML NETHERLANDS BV29NUMERICAL TECH INC11SYNOPSYS INC11TAKUMI TECHNOLOGY CORP5ZHANG YOUPING4
Top patents by PatentIndex Score
66 records- 0199US6918104B2Dissection of printed edges from a fabrication layout for correcting proximity effectsSYNOPSYS INC·Filed 2003·Granted Jul 12, 2005·215 cites·33 claims
- 0299US6777138B2Mask product made by selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabricat layoutNUMERICAL TECH INC·Filed 2002·Granted Aug 17, 2004·209 cites·4 claims
- 0399US6687895B2Method and apparatus for reducing optical proximity correction output file sizeNUMERICAL TECH INC·Filed 2002·Granted Feb 3, 2004·296 cites·32 claims
- 0499US6453457B1Selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabrication layoutNUMERICAL TECH INC·Filed 2000·Granted Sep 17, 2002·277 cites·76 claims
- 0598US10585357B2Alternative target design for metrology using modulation techniquesASML NETHERLANDS BV·Filed 2016·Granted Mar 10, 2020·12 cites·20 claims
- 0698US7934184B2Integrated circuit design using modified cellsTAKUMI TECHNOLOGY CORP·Filed 2005·Granted Apr 26, 2011·106 cites·10 claims
- 0798US6665856B1Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effectsNUMERICAL TECH INC·Filed 2000·Granted Dec 16, 2003·115 cites·60 claims
- 0897US7523429B2System for designing integrated circuits with enhanced manufacturabilityTAKUMI TECHNOLOGY CORP·Filed 2005·Granted Apr 21, 2009·273 cites·76 claims
- 0997US6792590B1Dissection of edges with projection points in a fabrication layout for correcting proximity effectsNUMERICAL TECH INC·Filed 2000·Granted Sep 14, 2004·78 cites·36 claims
- 1097US6625801B1Dissection of printed edges from a fabrication layout for correcting proximity effectsNUMERICAL TECH INC·Filed 2000·Granted Sep 23, 2003·91 cites·16 claims
- 1196US8918742B2Methods and systems for pattern design with tailored response to wavefront aberrationFENG HANYING·Filed 2012·Granted Dec 23, 2014·23 cites·21 claims
- 1296US7627837B2Model-based pattern characterization to generate rules for rule-model-based hybrid optical proximity correctionTAKUMI TECHNOLOGY CORP·Filed 2005·Granted Dec 1, 2009·27 cites·40 claims
- 1396US6753115B2Facilitating minimum spacing and/or width control optical proximity correctionNUMERICAL TECH INC·Filed 2001·Granted Jun 22, 2004·76 cites·32 claims
- 1496US6539521B1Dissection of corners in a fabrication layout for correcting proximity effectsNUMERICAL TECH INC·Filed 2000·Granted Mar 25, 2003·84 cites·40 claims
- 1594US8739082B2Method of pattern selection for source and mask optimizationLIU HUA-YU·Filed 2010·Granted May 27, 2014·11 cites·7 claims
- 1692US6763514B2Method and apparatus for controlling rippling during optical proximity correctionNUMERICAL TECH INC·Filed 2001·Granted Jul 13, 2004·39 cites·30 claims
- 1792US6653026B2Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting maskNUMERICAL TECH INC·Filed 2000·Granted Nov 25, 2003·37 cites·56 claims
- 1891US12038694B2Determining pattern ranking based on measurement feedback from printed substrateASML NETHERLANDS BV·Filed 2023·Granted Jul 16, 2024·1 cites·20 claims
- 1991US11079684B2Measurement apparatus and a method for determining a substrate gridASML NETHERLANDS BV·Filed 2018·Granted Aug 3, 2021·3 cites·20 claims
- 2090US11947266B2Method for controlling a manufacturing process and associated apparatusesASML NETHERLANDS BV·Filed 2019·Granted Apr 2, 2024·5 cites·20 claims
- 2190US10802409B2Metrology method and apparatus, substrate, lithographic method and associated computer productASML NETHERLANDS BV·Filed 2018·Granted Oct 13, 2020·4 cites·22 claims
- 2290US7562319B2Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effectsSYNOPSYS INC·Filed 2006·Granted Jul 14, 2009·8 cites·5 claims
- 2390US7003757B2Dissection of edges with projection points in a fabrication layout for correcting proximity effectsSYNOPSYS INC·Filed 2004·Granted Feb 21, 2006·29 cites·8 claims
- 2489US7382912B2Method and apparatus for performing target-image-based optical proximity correctionSYNOPSYS INC·Filed 2006·Granted Jun 3, 2008·8 cites·8 claims
- 2588US11966166B2Measurement apparatus and a method for determining a substrate gridASML NETHERLANDS BV·Filed 2021·Granted Apr 23, 2024·1 cites·20 claims
- 2687US12044980B2Method of manufacturing devicesASML NETHERLANDS BV·Filed 2019·Granted Jul 23, 2024·3 cites·20 claims
- 2787US10061212B2Metrology target, method and apparatus, target design method, computer program and lithographic systemASML NETHERLANDS BV·Filed 2017·Granted Aug 28, 2018·4 cites·15 claims
- 2887US7487490B2System for simplifying layout processingZHANG YOUPING·Filed 2005·Granted Feb 3, 2009·21 cites·24 claims
- 2987US7000208B2Repetition recognition using segmentsSYNOPSYS INC·Filed 2002·Granted Feb 14, 2006·28 cites·32 claims
- 3086US11392044B2Method of determining a position of a featureASML NETHERLANDS BV·Filed 2020·Granted Jul 19, 2022·2 cites·26 claims
- 3186US7926004B2Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effectsSYNOPSYS INC·Filed 2009·Granted Apr 12, 2011·5 cites·53 claims
- 3286US7908572B2Creating and applying variable bias rules in rule-based optical proximity correction for reduced complexityTAKUMI TECHNOLOGY CORP·Filed 2005·Granted Mar 15, 2011·17 cites·44 claims
- 3385US7131101B2Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effectsSYNOPSYS INC·Filed 2003·Granted Oct 31, 2006·17 cites·8 claims
- 3484US8281264B2Model-based pattern characterization to generate rules for rule-model-based hybrid optical proximity correctionZHANG YOUPING·Filed 2009·Granted Oct 2, 2012·6 cites·38 claims
- 3583US10481503B2Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the methodASML NETHERLANDS BV·Filed 2016·Granted Nov 19, 2019·2 cites·16 claims
- 3682US11803127B2Method for determining root cause affecting yield in a semiconductor manufacturing processASML NETHERLANDS BV·Filed 2019·Granted Oct 31, 2023·3 cites·20 claims
- 3782US11187995B2Metrology using a plurality of metrology target measurement recipesASML NETHERLANDS BV·Filed 2017·Granted Nov 30, 2021·2 cites·20 claims
- 3882US10578980B2Method of determining a position of a featureASML NETHERLANDS BV·Filed 2017·Granted Mar 3, 2020·2 cites·20 claims
- 3980US11281113B2Method for determining stack configuration of substrateASML NETHERLANDS BV·Filed 2019·Granted Mar 22, 2022·3 cites·20 claims
- 4080US10073357B2Measuring a process parameter for a manufacturing process involving lithographyASML NETHERLANDS BV·Filed 2015·Granted Sep 11, 2018·2 cites·13 claims
- 4180US6522991B2Suppressing oscillations in processes such as gas turbine combustionUNITED TECHNOLOGIES CORP·Filed 2001·Granted Feb 18, 2003·34 cites·11 claims
- 4279US11568123B2Method for determining an etch profile of a layer of a wafer for a simulation systemASML NETHERLANDS BV·Filed 2021·Granted Jan 31, 2023·1 cites·20 claims
- 4379US10423075B2Methods and systems for pattern design with tailored response to wavefront aberrationASML NETHERLANDS BV·Filed 2014·Granted Sep 24, 2019·2 cites·26 claims
- 4478US7005218B2Method and apparatus for performing target-image-based optical proximity correctionSYNOPSYS INC·Filed 2003·Granted Feb 28, 2006·12 cites·16 claims
- 4575US7533363B2System for integrated circuit layout partition and extraction for independent layout processingTAKUMI TECHNOLOGY CORP·Filed 2005·Granted May 12, 2009·8 cites·34 claims
- 4675US7003756B2Method and apparatus for controlling rippling during optical proximity correctionSYNOPSYS INC·Filed 2004·Granted Feb 21, 2006·11 cites·24 claims
- 4774US12055904B2Method to predict yield of a device manufacturing processASML NETHERLANDS BV·Filed 2019·Granted Aug 6, 2024·2 cites·20 claims
- 4874US10296681B2Process based metrology target designASML NETHERLANDS BV·Filed 2018·Granted May 21, 2019·1 cites·23 claims
- 4973US10007744B2Process based metrology target designASML NETHERLANDS BV·Filed 2015·Granted Jun 26, 2018·2 cites·20 claims
- 5073US7585600B2Method and apparatus for performing target-image-based optical proximity correctionSYNOPSYS INC·Filed 2008·Granted Sep 8, 2009·2 cites·20 claims
Showing the top 50 of 66 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Youping Zhang files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →