Inventor · disambiguated record
Yunsang Kim
Also filed as: KIM YUNSANG · KIM YUNSANG S
61 granted patents·22 pending applications·2,626 citations·filing 1999–2024
99Inventor score
Top patents by PatentIndex Score
83 records- 0199US7858898B2Bevel etcher with gap controlLAM RES CORP·Filed 2007·Granted Dec 28, 2010·349 cites·19 claims
- 0298US6340435B1Integrated low K dielectrics and etch stopsAPPLIED MATERIALS INC·Filed 1999·Granted Jan 22, 2002·536 cites·14 claims
- 0397US9881788B2Back side deposition apparatus and applicationsLAM RES CORP·Filed 2014·Granted Jan 30, 2018·372 cites·9 claims
- 0497US7316761B2Apparatus for uniformly etching a dielectric layerAPPLIED MATERIALS INC·Filed 2003·Granted Jan 8, 2008·178 cites·20 claims
- 0597US6858153B2Integrated low K dielectrics and etch stopsAPPLIED MATERIALS INC·Filed 2001·Granted Feb 22, 2005·256 cites·21 claims
- 0697US6403491B1Etch method using a dielectric etch chamber with expanded process windowAPPLIED MATERIALS INC·Filed 2000·Granted Jun 11, 2002·396 cites·24 claims
- 0794US7943007B2Configurable bevel etcherLAM RES CORP·Filed 2007·Granted May 17, 2011·24 cites·11 claims
- 0894US7651585B2Apparatus for the removal of an edge polymer from a substrate and methods thereforLAM RES CORP·Filed 2005·Granted Jan 26, 2010·27 cites·13 claims
- 0993US6669858B2Integrated low k dielectrics and etch stopsAPPLIED MATERIALS INC·Filed 2001·Granted Dec 30, 2003·47 cites·14 claims
- 1091US8562750B2Method and apparatus for processing bevel edgeCHEN JACK·Filed 2009·Granted Oct 22, 2013·17 cites·12 claims
- 1191US6326307B1Plasma pretreatment of photoresist in an oxide etch processAPPLLIED MATERIALS INC·Filed 1999·Granted Dec 4, 2001·201 cites·28 claims
- 1289US7227244B2Integrated low k dielectrics and etch stopsAPPLIED MATERIALS INC·Filed 2004·Granted Jun 5, 2007·27 cites·8 claims
- 1388US7909960B2Apparatus and methods to remove films on bevel edge and backside of waferLAM RES CORP·Filed 2006·Granted Mar 22, 2011·11 cites·9 claims
- 1486US7718542B2Low-k damage avoidance during bevel etch processingLAM RES CORP·Filed 2006·Granted May 18, 2010·8 cites·31 claims
- 1586US7435685B2Method of forming a low-K dual damascene interconnect structureAPPLIED MATERIALS INC·Filed 2006·Granted Oct 14, 2008·13 cites·18 claims
- 1685US9053925B2Configurable bevel etcherBAILEY III ANDREW D·Filed 2011·Granted Jun 9, 2015·6 cites·13 claims
- 1784US8430970B2Methods for preventing corrosion of plasma-exposed yttria-coated constituentsSWAMI GANAPATHY·Filed 2010·Granted Apr 30, 2013·8 cites·15 claims
- 1884US8398778B2Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameterFANG TONG·Filed 2008·Granted Mar 19, 2013·7 cites·11 claims
- 1982US8349202B2Methods for controlling bevel edge etching in a plasma chamberLAM RES CORP·Filed 2011·Granted Jan 8, 2013·5 cites·12 claims
- 2081US8414790B2Bevel plasma treatment to enhance wet edge cleanBAILEY III ANDREW D·Filed 2010·Granted Apr 9, 2013·5 cites·14 claims
- 2180US7132369B2Method of forming a low-K dual damascene interconnect structureAPPLIED MATERIALS INC·Filed 2003·Granted Nov 7, 2006·27 cites·34 claims
- 2279US8308896B2Methods to remove films on bevel edge and backside of wafer and apparatus thereofKIM YUNSANG·Filed 2011·Granted Nov 13, 2012·4 cites·15 claims
- 2378US11984330B2Atomic layer etch and deposition processing systems including a lens circuit with a tele-centric lens, an optical beam folding assembly, or a polygon scannerLAM RES CORP·Filed 2019·Granted May 14, 2024·2 cites·26 claims
- 2478US9564308B2Methods for processing bevel edge etchingLAM RES CORP·Filed 2015·Granted Feb 7, 2017·2 cites·15 claims
- 2578US8083890B2Gas modulation to control edge exclusion in a bevel edge etching plasma chamberFANG TONG·Filed 2008·Granted Dec 27, 2011·6 cites·17 claims
- 2677US8137501B2Bevel clean deviceKIM YUNSANG·Filed 2007·Granted Mar 20, 2012·6 cites·16 claims
- 2776US8500951B2Low-K damage avoidance during bevel etch processingKIM YUNSANG·Filed 2010·Granted Aug 6, 2013·3 cites·9 claims
- 2876US8298433B2Methods for removing an edge polymer from a substrateYOON HYUNGSUK ALEXANDER·Filed 2009·Granted Oct 30, 2012·4 cites·18 claims
- 2976US6686293B2Method of etching a trench in a silicon-containing dielectric materialAPPLIED MATERIALS INC·Filed 2002·Granted Feb 3, 2004·18 cites·46 claims
- 3075US10714345B2Plasma assisted doping on germaniumLAM RES CORP·Filed 2019·Granted Jul 14, 2020·1 cites·12 claims
- 3174US9184043B2Edge electrodes with dielectric coversSEXTON GREGORY S·Filed 2007·Granted Nov 10, 2015·4 cites·11 claims
- 3273US10431462B2Plasma assisted doping on germaniumLAM RES CORP·Filed 2018·Granted Oct 1, 2019·1 cites·12 claims
- 3373US8501283B2Methods for depositing bevel protective filmSHIN NEUNGHO·Filed 2010·Granted Aug 6, 2013·4 cites·19 claims
- 3472US7256134B2Selective etching of carbon-doped low-k dielectricsAPPLIED MATERIALS INC·Filed 2003·Granted Aug 14, 2007·16 cites·18 claims
- 3569US8323523B2High pressure bevel etch processFANG TONG·Filed 2011·Granted Dec 4, 2012·2 cites·18 claims
- 3668US10629458B2Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameterLAM RES CORP·Filed 2013·Granted Apr 21, 2020·1 cites·1 claims
- 3768US10217610B2Arrangements for manipulating plasma confinement within a plasma processing system and methods thereofLAM RES CORP·Filed 2016·Granted Feb 26, 2019·1 cites·11 claims
- 3867US11977252B2Display device including a light guide plate with protrusionsLG DISPLAY CO LTD·Filed 2023·Granted May 7, 2024·0 cites·15 claims
- 3967US8262923B2High pressure bevel etch processFANG TONG·Filed 2009·Granted Sep 11, 2012·2 cites·14 claims
- 4066US8257503B2Method and apparatus for detecting plasma unconfinementKIM KEECHAN·Filed 2008·Granted Sep 4, 2012·2 cites·18 claims
- 4166US7140374B2System, method and apparatus for self-cleaning dry etchLAM RES CORP·Filed 2004·Granted Nov 28, 2006·8 cites·17 claims
- 4266US7129167B1Methods and systems for a stress-free cleaning a surface of a substrateLAM RES CORP·Filed 2004·Granted Oct 31, 2006·10 cites·16 claims
- 4364US2025048809A1Display apparatus for controlling viewing angleLG DISPLAY CO LTD·Filed 2024·Application pending·0 cites
- 4463US8852384B2Method and apparatus for detecting plasma unconfinementKIM KEECHAN·Filed 2012·Granted Oct 7, 2014·1 cites·19 claims
- 4563US8211238B2System, method and apparatus for self-cleaning dry etchBAILEY III ANDREW D·Filed 2006·Granted Jul 3, 2012·1 cites·16 claims
- 4662US2007048447A1System and method for forming patterned copper lines through electroless copper platingLEE ALAN·Filed 2006·Application pending·0 cites
- 4761US11640025B2Display device having a private mode and a sharing modeLG DISPLAY CO LTD·Filed 2021·Granted May 2, 2023·0 cites·15 claims
- 4861US9543150B2Systems and methods for forming ultra-shallow junctionsLAM RES CORP·Filed 2015·Granted Jan 10, 2017·1 cites·27 claims
- 4960US10832923B2Lower plasma-exclusion-zone rings for a bevel etcherLAM RES CORP·Filed 2017·Granted Nov 10, 2020·0 cites·27 claims
- 5060US10811282B2Upper plasma-exclusion-zone rings for a bevel etcherLAM RES CORP·Filed 2017·Granted Oct 20, 2020·0 cites·26 claims
Showing the top 50 of 83 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →