Inventor · disambiguated record
Zihui Li
Also filed as: LI ZIHUI · LI ZIHUI (JASON)
33 granted patents·9 pending applications·2,519 citations·filing 2013–2025
98Inventor score
Files withAPPLIED MATERIALS INC37HANGZHOU HAOCHA TONG TECH CO LTD1IBM1SAMSUNG ELECTRONICS CO LTD1UNIV DALIAN TECH1
Top patents by PatentIndex Score
42 records- 0198US9991134B2Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2014·Granted Jun 5, 2018·100 cites·17 claims
- 0298US9881805B2Silicon selective removalAPPLIED MATERIALS INC·Filed 2016·Granted Jan 30, 2018·110 cites·16 claims
- 0398US9831097B2Methods for selective etching of a silicon material using HF gas without nitrogen etchantsAPPLIED MATERIALS INC·Filed 2016·Granted Nov 28, 2017·100 cites·18 claims
- 0498US9704723B2Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2015·Granted Jul 11, 2017·114 cites·17 claims
- 0598US9659792B2Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2015·Granted May 23, 2017·125 cites·13 claims
- 0698US9502258B2Anisotropic gap etchAPPLIED MATERIALS INC·Filed 2014·Granted Nov 22, 2016·129 cites·14 claims
- 0798US9449850B2Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2015·Granted Sep 20, 2016·135 cites·18 claims
- 0898US9412608B2Dry-etch for selective tungsten removalAPPLIED MATERIALS INC·Filed 2015·Granted Aug 9, 2016·134 cites·17 claims
- 0998US9406523B2Highly selective doped oxide removal methodAPPLIED MATERIALS INC·Filed 2014·Granted Aug 2, 2016·135 cites·15 claims
- 1098US9209012B2Selective etch of silicon nitrideAPPLIED MATERIALS INC·Filed 2014·Granted Dec 8, 2015·173 cites·15 claims
- 1198US9184055B2Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2014·Granted Nov 10, 2015·181 cites·20 claims
- 1298US9153442B2Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2014·Granted Oct 6, 2015·220 cites·13 claims
- 1398US9093371B2Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2014·Granted Jul 28, 2015·184 cites·17 claims
- 1498US9023732B2Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2014·Granted May 5, 2015·187 cites·14 claims
- 1598US8980763B2Dry-etch for selective tungsten removalAPPLIED MATERIALS INC·Filed 2013·Granted Mar 17, 2015·206 cites·14 claims
- 1698US8956980B1Selective etch of silicon nitrideAPPLIED MATERIALS INC·Filed 2013·Granted Feb 17, 2015·226 cites·15 claims
- 1797US10319600B1Thermal silicon etchAPPLIED MATERIALS INC·Filed 2018·Granted Jun 11, 2019·34 cites·20 claims
- 1894US11875131B2Zero-shot cross-lingual transfer learningIBM·Filed 2020·Granted Jan 16, 2024·5 cites·6 claims
- 1986US10170336B1Methods for anisotropic control of selective silicon removalAPPLIED MATERIALS INC·Filed 2017·Granted Jan 1, 2019·4 cites·20 claims
- 2086US9612975B2Page cache device and method for efficient mappingSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Apr 4, 2017·5 cites·13 claims
- 2184US9653310B1Methods for selective etching of a silicon materialAPPLIED MATERIALS INC·Filed 2015·Granted May 16, 2017·3 cites·5 claims
- 2282US11637002B2Methods and systems to enhance process uniformityAPPLIED MATERIALS INC·Filed 2014·Granted Apr 25, 2023·4 cites·20 claims
- 2381US10204796B2Methods for selective etching of a silicon material using HF gas without nitrogen etchantsAPPLIED MATERIALS INC·Filed 2017·Granted Feb 12, 2019·2 cites·16 claims
- 2480US10249507B2Methods for selective etching of a silicon materialAPPLIED MATERIALS INC·Filed 2017·Granted Apr 2, 2019·2 cites·15 claims
- 2573US12431360B2Selective etching between silicon-and-germanium-containing materials with varying germanium concentrationsAPPLIED MATERIALS INC·Filed 2023·Granted Sep 30, 2025·0 cites·20 claims
- 2673US10573527B2Gas-phase selective etching systems and methodsAPPLIED MATERIALS INC·Filed 2019·Granted Feb 25, 2020·1 cites·20 claims
- 2764US12394631B2Selective etching of silicon-and-germanium-containing materials with increased surface puritiesAPPLIED MATERIALS INC·Filed 2023·Granted Aug 19, 2025·0 cites·20 claims
- 2862US2014271097A1Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 2961US11004689B2Thermal silicon etchAPPLIED MATERIALS INC·Filed 2019·Granted May 11, 2021·0 cites·18 claims
- 3061US2025331267A1Self-limited etching of low-k materialsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3160US2016027673A1Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 3259US11764058B2Three-color 3D DRAM stack and methods of makingAPPLIED MATERIALS INC·Filed 2021·Granted Sep 19, 2023·0 cites·20 claims
- 3356US12334358B2Integration processes utilizing boron-doped silicon materialsAPPLIED MATERIALS INC·Filed 2021·Granted Jun 17, 2025·0 cites·20 claims
- 3456US2024282585A1Treatments to improve etched silicon-and-germanium-containing material surface roughnessAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3556US2024290623A1Processing methods to improve etched silicon-and-germanium-containing material surface roughnessAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3655US2025120533A1Induction chamber door opening and closing deviceHANGZHOU HAOCHA TONG TECH CO LTD·Filed 2023·Application pending·0 cites
- 3754US11239061B2Methods and systems to enhance process uniformityAPPLIED MATERIALS INC·Filed 2017·Granted Feb 1, 2022·0 cites·20 claims
- 3852US2025259850A1Selective etching of silicon-and-germanium-containing materials with reduced under layer lossAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 3951US12111322B2Mass spectrometry-based method for simultaneous qualitative and quantitative protein citrullination analysis of complex biological samplesWISCONSIN ALUMNI RES FOUND·Filed 2020·Granted Oct 8, 2024·0 cites·14 claims
- 4051US2021162479A1Line-shape spot laser bending method for metal sheetsUNIV DALIAN TECH·Filed 2020·Application pending·0 cites
- 4147US10497573B2Selective atomic layer etching of semiconductor materialsAPPLIED MATERIALS INC·Filed 2018·Granted Dec 3, 2019·0 cites·20 claims
- 4244US2015371861A1Protective silicon oxide patterningAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →