Inventor · disambiguated record
Zuoming Zhu
Also filed as: ZHU ZUOMING
21 granted patents·32 pending applications·38 citations·filing 2010–2025
92Inventor score
Top patents by PatentIndex Score
53 records- 0195US12163229B2Multi zone spot heating in EPIAPPLIED MATERIALS INC·Filed 2023·Granted Dec 10, 2024·1 cites·20 claims
- 0295US11821088B2Multi zone spot heating in EPIAPPLIED MATERIALS INC·Filed 2021·Granted Nov 21, 2023·2 cites·19 claims
- 0393US11261538B1In-situ temperature mapping for epi chamberAPPLIED MATERIALS INC·Filed 2020·Granted Mar 1, 2022·3 cites·19 claims
- 0493US10062598B2Thermal processing susceptorAPPLIED MATERIALS INC·Filed 2015·Granted Aug 28, 2018·7 cites·12 claims
- 0593US2025364306A1Thermal processing susceptorAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0691US11021795B2Multi zone spot heating in epiAPPLIED MATERIALS INC·Filed 2018·Granted Jun 1, 2021·4 cites·19 claims
- 0790US11177144B2Wafer spot heating with beam width modulationAPPLIED MATERIALS INC·Filed 2019·Granted Nov 16, 2021·5 cites·20 claims
- 0890US10930543B2Thermal processing susceptorAPPLIED MATERIALS INC·Filed 2018·Granted Feb 23, 2021·4 cites·17 claims
- 0986US12400904B2Thermal processing susceptorAPPLIED MATERIALS INC·Filed 2023·Granted Aug 26, 2025·0 cites·20 claims
- 1085US2025066918A1Multi zone spot heating in epiAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1184US11733081B2Methods, systems, and apparatus for conducting a calibration operation for a plurality of mass flow controllers (MFCs) of a substrate processing systemAPPLIED MATERIALS INC·Filed 2021·Granted Aug 22, 2023·1 cites·20 claims
- 1282US9768043B2Quartz upper and lower domesAPPLIED MATERIALS INC·Filed 2013·Granted Sep 19, 2017·4 cites·19 claims
- 1381US11860973B2Method and system for foreline deposition diagnostics and controlAPPLIED MATERIALS INC·Filed 2020·Granted Jan 2, 2024·1 cites·20 claims
- 1476US2023366715A1Methods, systems, and apparatus for conducting a calibration operation for a plurality of mass flow controllers (mfcs) of a substrate processing systemAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1575US11848226B2Thermal processing susceptorAPPLIED MATERIALS INC·Filed 2021·Granted Dec 19, 2023·0 cites·7 claims
- 1674US9842753B2Absorbing lamphead faceAPPLIED MATERIALS INC·Filed 2014·Granted Dec 12, 2017·2 cites·20 claims
- 1774US2025293027A1Chamber body feedthrough for in chamber resistive heating elementAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1873US10770319B2EPI thickness tuning by pulse or profile spot heatingAPPLIED MATERIALS INC·Filed 2019·Granted Sep 8, 2020·1 cites·20 claims
- 1973US2025096045A1Substrate processing monitoringAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2070US9127360B2Epitaxial chamber with cross flowRAMACHANDRAN BALASUBRAMANIAN·Filed 2010·Granted Sep 8, 2015·3 cites·18 claims
- 2168US12334341B2Chamber body feedthrough for in chamber resistive heating elementAPPLIED MATERIALS INC·Filed 2022·Granted Jun 17, 2025·0 cites·20 claims
- 2267US2024018688A1Batch processing apparatus, systems, and related methods and structures for epitaxial deposition operationsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2366US2025210319A1Electrode configurations and magnet configurations for processing chambers, and related methods and apparatus, for semiconductor manufacturingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2465US12467144B2Methods of correlating zones of processing chambers, and related systems and methodsAPPLIED MATERIALS INC·Filed 2022·Granted Nov 11, 2025·0 cites·13 claims
- 2565US2025018415A1Process chamber gas flow improvementAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2663US2024021444A1Batch processing apparatus, systems, and related methods and structures for epitaxial deposition operationsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2763US2025231066A1Temperature profile measurement and synchronized control on substrate and susceptor in an epitaxy chamberAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2862US12428731B2Flow guide structures and heat shield structures, and related methods, for deposition uniformity and process adjustabilityAPPLIED MATERIALS INC·Filed 2022·Granted Sep 30, 2025·0 cites·22 claims
- 2961US12449309B2Methods for detection using optical emission spectroscopyAPPLIED MATERIALS INC·Filed 2020·Granted Oct 21, 2025·0 cites·20 claims
- 3061US12165934B2Substrate processing monitoringAPPLIED MATERIALS INC·Filed 2020·Granted Dec 10, 2024·0 cites·18 claims
- 3161US2024395553A1High aspect ratio junction formation through gas phase dopingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3260US2025210314A1Plasma injection configurations for processing chambers, and related apparatus, chamber kits, and methodsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3359US2025149349A1Multi-flow methods, and related apparatus, for semiconductor manufacturingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3459US2025149350A1Multi-flow chamber kits, processing chambers, and related apparatus and methods for semiconductor manufacturingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3558US12196617B2Temperature profile measurement and synchronized control on substrate and susceptor in an epitaxy chamberAPPLIED MATERIALS INC·Filed 2020·Granted Jan 14, 2025·0 cites·20 claims
- 3658US2025201594A1Modular processing chambers and related heating configurations, methods, apparatus, and modules for semiconductor manufacturingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3758US2024363448A1Measuring systems, processing systems, and related apparatus and methods, including band gap materialsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3857US2024247405A1Method for controlling layer-to-layer thickness in multi-tier epitaxial processAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3957US2025038040A1Lift frames for central heating, and related processing chambers and methodsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4056US2025132154A1Methods and apparatus for anisotropic film growth, and related devicesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4154US2017362702A9Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature cvd systemsAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 4254US2025118576A1Chamber kits, processing chambers, and methods for gas activation in semiconductor manufacturingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4352US2025379096A1Edge ring configurations for processing chambers and related chamber kits and methodsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4452US2024339352A1Susceptor for process chamberAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4552US2023029344A1Methods of formation of a sige/si superlatticeAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4651US2025358906A1Reflector configurations for energy focusing in processing chambers, and related chamber kits and methodsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4750US2018005856A1Quartz upper and lower domesAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 4850US2015329969A1Uniformity and selectivity of low gas flow velocity processes in a cross flow epitaxy chamber with the use of alternative highly reactive precursors though an alternative pathAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 4948US2016336205A1Absorbing lamphead faceAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 5047US2023167581A1Wafer edge temperature correction in batch thermal process chamberAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
Showing the top 50 of 53 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →