Lithographic apparatus and device manufacturing method

Abstract

A lithographic apparatus uses the control signal from a computer to drive two spatial light modulators to pattern two separate projection beams for projection onto two substrates.

1 . A lithographic projection apparatus comprising: 
 (a) a radiation source for generating a radiation beam;    (b) a beam splitter for splitting said radiation beam into a plurality of radiation beams;    (c) a plurality of programmable patterning devices, each of said programmable patterning device being constructed and arranged to receive and pattern one of said plurality of radiation beams;    (d) a plurality of projection systems each arranged and constructed to receive one of the patterned radiation beams.    
   
   
       2 . The apparatus of  claim 1 , wherein said programmable patterning device is selected from the group consisting of spatial light modulators, grating light valves, and programmable LCD arrays.  
   
   
       3 . The apparatus of  claim 1 , wherein each of said plurality of projection systems comprises a microlens array.  
   
   
       4 . The apparatus of  claim 1 , wherein said radiation beam has a wavelength of 365 nm.  
   
   
       5 . The apparatus of  claim 1 , wherein said radiation beam has a wavelength of 248 nm.  
   
   
       6 . The apparatus of  claim 1 , wherein said radiation beam has a wavelength of 193 nm.  
   
   
       7 . The apparatus of  claim 1 , wherein said plurality of optical systems project the patterned radiation beams onto separate substrates.  
   
   
       8 . A process comprising illuminating a substrate with the apparatus of  claim 1 .  
   
   
       9 . An article obtained with the process of  claim 8 .  
   
   
       10 . The article of  claim 9 , wherein said article is a liquid crystal display panel.  
   
   
       11 . The article of  claim 9 , wherein said article is an integrated circuit.  
   
   
       12 . A lithographic process comprising: 
 (a) splitting a projection beam of radiation into a plurality of projection beams of radiation;    (b) illuminating a plurality of programmable patterning devices with said plurality of projection beams to generate a number of patterned light beams equal to said plurality of programmable patterning devices;    (c) providing a number of projection systems equal to said number of patterned light beams and passing each patterned light beam through a corresponding projection system.    
   
   
       13 . The process of  claim 12 , wherein said programmable patterning device is selected from the group consisting of spatial light modulators, grating light valves, and programmable LCD arrays.  
   
   
       14 . The process of  claim 12 , wherein each of said plurality of projection systems comprises a microlens array.  
   
   
       15 . The process of  claim 12 , wherein said radiation beam has a wavelength of 365 nm.  
   
   
       16 . The process of  claim 12 , wherein said radiation beam has a wavelength of 248 nm.  
   
   
       17 . The process of  claim 12 , wherein said radiation beam has a wavelength of 193 nm.  
   
   
       18 . A lithographic projection apparatus comprising: 
 (a) a radiation source for generating a radiation beam having a wavelength of 365 nm, 248 nm, 193 nm, 157 nm, or 126 nm;    (b) a beam splitter for splitting said radiation beam into a plurality of radiation beams;    (c) a plurality of programmable patterning devices, each of said programmable patterning device being constructed and arranged to receive and pattern one of said plurality of radiation beams, said programmable patterning means being selected from the group consisting of spatial light modulators, grating light valves, and programmable LCD arrays;    (d) a plurality of projection systems each arranged and constructed to receive one of the patterned radiation beams, each of said plurality of projection systems comprising a microlens array.    
   
   
       19 . A liquid crystal display panel manufactured in part with the apparatus of  claim 18 .  
   
   
       20 . An integrated circuit manufactured in part with the apparatus of  claim 18.