Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units

Abstract

A sample processing method for processing a sample by introducing a gas into a vacuum vessel and generating plasma in the vacuum vessel. The sample processing method includes the steps of measuring an intensity of light emitted from a light-emitting diode in the vacuum vessel, at the outside of the vacuum vessel, and monitoring a status of the plasma in accordance with the measured intensity of the light.

1 . A sample processing method for processing a sample by introducing a gas into a vacuum vessel and generating plasma in the vacuum vessel, wherein the sample processing method comprises the steps of: 
 measuring an intensity of light emitted from a light-emitting diode combined with a sample in the vacuum vessel, at an outside of the vacuum vessel; and    monitoring a status of the plasma in accordance with the measured intensity of the light.    
     
     
         2 . A sample processing method according to  claim 1 , wherein the intensity of the light is measured outside of the vacuum vessel by utilizing a camera viewing a window of the vacuum vessel.  
     
     
         3 . A sample processing method for processing a sample by introducing a gas into a vacuum vessel and generating plasma in the vacuum vessel, wherein sample processing method comprising steps of: 
 measuring an intensity of light emitted from a light-emitting diode installed inside of the vacuum vessel, at an outside of the vacuum vessel; and    monitoring a state of the plasma in accordance with the measured intensity of the light.    
     
     
         4 . A sample processing method according to  claim 3 , wherein the intensity of the light is measured outside of the vacuum vessel by utilizing a camera viewing a window of the vacuum vessel.