US2010327451A1PendingUtilityA1

Alignment mark

41
Assignee: CHOU LING-CHUNPriority: Sep 25, 2008Filed: Sep 8, 2010Published: Dec 30, 2010
Est. expirySep 25, 2028(~2.2 yrs left)· nominal 20-yr term from priority
H10P 74/203H10W 46/503H10W 46/301H10W 46/101H10W 46/00G03F 9/7076G03F 7/70658G03F 7/7065G03F 7/70633
41
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Claims

Abstract

An alignment mark for defect inspection is disclosed. The alignment mark includes: a semiconductor substrate; a first type well disposed in the semiconductor substrate; a second type doping region disposed in the first type well; a dielectric layer disposed on the semiconductor substrate to cover the first type well and the second type doping region; and a plurality of conductive plugs formed in the dielectric layer for connecting to the second type doping region.

Claims

exact text as granted — not AI-modified
1 . An alignment mark for defect inspection, comprising:
 a semiconductor substrate;   a first type well disposed in the semiconductor substrate;   a second type doping region disposed in the first type well;   a dielectric layer disposed on the semiconductor substrate to cover the first type well and the second type doping region; and   a plurality of conductive plugs formed in the dielectric layer for connecting to the second type doping region.   
     
     
         2 . The alignment mark for defect inspection of  claim 1 , wherein the first type well is a n− well. 
     
     
         3 . The alignment mark for defect inspection of  claim 1 , wherein the second type doping region is a p+ doping region. 
     
     
         4 . The alignment mark for defect inspection of  claim 1 , wherein the dielectric layer comprises oxides, carbides, nitrides, low-k dielectric material, or combination thereof. 
     
     
         5 . The alignment mark for defect inspection of  claim 1 , wherein the conductive plugs comprise titanium, titanium nitride, tungsten, tantalum, tantalum nitride, aluminum, copper, or combination thereof. 
     
     
         6 . The alignment mark for defect inspection of  claim 1 , wherein the alignment mark comprises at least one right angle. 
     
     
         7 . The alignment mark for defect inspection of  claim 1 , wherein the alignment mark is a T-shaped alignment mark. 
     
     
         8 . The alignment mark for defect inspection of  claim 1 , wherein the alignment mark is a L-shaped alignment mark. 
     
     
         9 . The alignment mark for defect inspection of  claim 1 , wherein the alignment mark is a cross-shaped alignment mark.

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