US2011318997A1PendingUtilityA1
Apparatus and methods for conditioning a polishing pad
Est. expiryMar 13, 2026(expired)· nominal 20-yr term from priority
B24B 53/017B24B 53/005B24B 53/12
54
PatentIndex Score
0
Cited by
0
References
0
Claims
Abstract
Apparatus and methods for conditioning a polishing pad include an arm adapted to support a conditioning disk; a drive mechanism coupled to the arm; and a flexible coupling between the drive mechanism and the conditioning disk adapted to allow the conditioning disk to tilt while transmitting rotary motion from the drive mechanism to the conditioning disk. Numerous other aspects are disclosed.
Claims
exact text as granted — not AI-modified1 . A method for conditioning a polishing pad comprising: providing a drive mechanism having a rotary motion; and transmitting the rotary motion to a conditioning disk via a flexible coupling that allows the conditioning disk to tilt while rotating the conditioning disk.
Cited by (0)
No later patents cite this yet.
References (0)
No backward citations on record.