Inventor · disambiguated record
Shou-Sung Chang
Also filed as: CHANG SHOU-SUNG
68 granted patents·46 pending applications·647 citations·filing 1997–2025
99Inventor score
Top patents by PatentIndex Score
114 records- 0198US6776693B2Method and apparatus for face-up substrate polishingAPPLIED MATERIALS INC·Filed 2002·Granted Aug 17, 2004·101 cites·46 claims
- 0297US11446711B2Steam treatment stations for chemical mechanical polishing systemAPPLIED MATERIALS INC·Filed 2020·Granted Sep 20, 2022·8 cites·11 claims
- 0396US11577358B2Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2020·Granted Feb 14, 2023·4 cites·21 claims
- 0495US11633833B2Use of steam for pre-heating of CMP componentsAPPLIED MATERIALS INC·Filed 2020·Granted Apr 25, 2023·3 cites·20 claims
- 0595US9138860B2Closed-loop control for improved polishing pad profilesDHANDAPANI SIVAKUMAR·Filed 2011·Granted Sep 22, 2015·23 cites·20 claims
- 0695US8221193B2Closed loop control of pad profile based on metrology feedbackCHANG SHOU-SUNG·Filed 2008·Granted Jul 17, 2012·29 cites·20 claims
- 0794US10562147B2Polishing system with annular platen or polishing pad for substrate monitoringAPPLIED MATERIALS INC·Filed 2017·Granted Feb 18, 2020·4 cites·11 claims
- 0893US7285036B2Pad assembly for electrochemical mechanical polishingAPPLIED MATERIALS INC·Filed 2006·Granted Oct 23, 2007·18 cites·20 claims
- 0990US7137868B2Pad assembly for electrochemical mechanical processingAPPLIED MATERIALS INC·Filed 2006·Granted Nov 21, 2006·12 cites·32 claims
- 1090US6000997ATemperature regulation in a CMP processAPLEX INC·Filed 1998·Granted Dec 14, 1999·101 cites·32 claims
- 1189US7963826B2Apparatus and methods for conditioning a polishing padAPPLIED MATERIALS INC·Filed 2009·Granted Jun 21, 2011·9 cites·15 claims
- 1288US12318882B2Apparatus and method for CMP temperature controlAPPLIED MATERIALS INC·Filed 2023·Granted Jun 3, 2025·0 cites·9 claims
- 1387US7029365B2Pad assembly for electrochemical mechanical processingAPPLIED MATERIALS INC·Filed 2003·Granted Apr 18, 2006·29 cites·31 claims
- 1486US7597608B2Pad conditioning device with flexible media mountAPPLIED MATERIALS INC·Filed 2007·Granted Oct 6, 2009·11 cites·8 claims
- 1586US5980368APolishing tool having a sealed fluid chamber for support of polishing padAPLEX GROUP·Filed 1997·Granted Nov 9, 1999·71 cites·22 claims
- 1685US12459011B2Steam treatment stations for chemical mechanical polishing systemAPPLIED MATERIALS INC·Filed 2024·Granted Nov 4, 2025·0 cites·14 claims
- 1785US9687960B2Polishing pad cleaning systems employing fluid outlets oriented to direct fluid under spray bodies and towards inlet ports, and related methodsAPPLIED MATERIALS INC·Filed 2014·Granted Jun 27, 2017·5 cites·20 claims
- 1885US9061394B2Systems and methods for substrate polishing end point detection using improved friction measurementCHANG SHOU-SUNG·Filed 2012·Granted Jun 23, 2015·5 cites·11 claims
- 1984US9358658B2Polishing system with front side pressure controlAPPLIED MATERIALS INC·Filed 2014·Granted Jun 7, 2016·4 cites·17 claims
- 2084US8096852B2In-situ performance prediction of pad conditioning disk by closed loop torque monitoringDESHPANDE SAMEER·Filed 2008·Granted Jan 17, 2012·14 cites·28 claims
- 2184US2024157504A1Apparatus and method for cmp temperature controlAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2284US2024025006A1Temperature and slurry flow rate control in cmpAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2383US12296427B2Apparatus and method for CMP temperature controlAPPLIED MATERIALS INC·Filed 2020·Granted May 13, 2025·1 cites·12 claims
- 2483US11728185B2Steam-assisted single substrate cleaning process and apparatusAPPLIED MATERIALS INC·Filed 2021·Granted Aug 15, 2023·1 cites·20 claims
- 2583US11077536B2Slurry distribution device for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2017·Granted Aug 3, 2021·2 cites·8 claims
- 2683US8066552B2Multi-layer polishing pad for low-pressure polishingDUBOUST ALAIN·Filed 2005·Granted Nov 29, 2011·10 cites·31 claims
- 2783US2025269486A1Apparatus and method for cmp temperature controlAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2882US11897079B2Low-temperature metal CMP for minimizing dishing and corrosion, and improving pad asperityAPPLIED MATERIALS INC·Filed 2020·Granted Feb 13, 2024·1 cites·18 claims
- 2982US10967483B2Slurry distribution device for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2017·Granted Apr 6, 2021·2 cites·17 claims
- 3082US2025326086A1In-situ conditioner disk cleaning during cmpAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 3181US12459078B2In-situ conditioner disk cleaning during CMPAPPLIED MATERIALS INC·Filed 2022·Granted Nov 4, 2025·0 cites·20 claims
- 3281US11597052B2Temperature control of chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2019·Granted Mar 7, 2023·2 cites·17 claims
- 3381US2023415297A1Control of steam generation for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3480US11986926B2Slurry distribution device for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2022·Granted May 21, 2024·0 cites·18 claims
- 3580US8142260B2Methods and apparatus for removal of films and flakes from the edge of both sides of a substrate using backing padsKOLLATA EASHWER·Filed 2008·Granted Mar 27, 2012·10 cites·20 claims
- 3679US12434347B2Method for CMP temperature controlAPPLIED MATERIALS INC·Filed 2023·Granted Oct 7, 2025·0 cites·13 claims
- 3779US11780046B2Polishing system with annular platen or polishing padAPPLIED MATERIALS INC·Filed 2022·Granted Oct 10, 2023·0 cites·16 claims
- 3879US10076817B2Orbital polishing with small padAPPLIED MATERIALS INC·Filed 2014·Granted Sep 18, 2018·3 cites·17 claims
- 3979US7344431B2Pad assembly for electrochemical mechanical processingAPPLIED MATERIALS INC·Filed 2006·Granted Mar 18, 2008·5 cites·21 claims
- 4079US2023029290A1Temperature control of chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4178US12030093B2Steam treatment stations for chemical mechanical polishing systemAPPLIED MATERIALS INC·Filed 2022·Granted Jul 9, 2024·0 cites·15 claims
- 4278US9452506B2Vacuum cleaning systems for polishing pads, and related methodsAPPLIED MATERIALS INC·Filed 2014·Granted Sep 27, 2016·3 cites·20 claims
- 4378US7077721B2Pad assembly for electrochemical mechanical processingAPPLIED MATERIALS INC·Filed 2003·Granted Jul 18, 2006·17 cites·31 claims
- 4477US12106976B2Steam-assisted single substrate cleaning process and apparatusAPPLIED MATERIALS INC·Filed 2023·Granted Oct 1, 2024·0 cites·19 claims
- 4577US11919123B2Apparatus and method for CMP temperature controlAPPLIED MATERIALS INC·Filed 2021·Granted Mar 5, 2024·0 cites·19 claims
- 4677US9308623B2Multi-disk chemical mechanical polishing pad conditioners and methodsAPPLIED MATERIALS INC·Filed 2014·Granted Apr 12, 2016·3 cites·15 claims
- 4776US11511388B2Polishing system with support post and annular platen or polishing padAPPLIED MATERIALS INC·Filed 2019·Granted Nov 29, 2022·0 cites·13 claims
- 4876US2025205847A1Method for cmp temperature controlAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 4975US12290896B2Apparatus and method for CMP temperature controlAPPLIED MATERIALS INC·Filed 2020·Granted May 6, 2025·0 cites·12 claims
- 5075US11826872B2Temperature and slurry flow rate control in CMPAPPLIED MATERIALS INC·Filed 2021·Granted Nov 28, 2023·0 cites·23 claims
Showing the top 50 of 114 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →