Liquid jet and recovery system for immersion lithography

Abstract

A liquid immersion lithography apparatus includes a stage on which a wafer is held. A projection system projects a pattern image to an exposure region through an immersion liquid to expose the wafer on the stage. A plurality of supply openings are arranged to surround the exposure region, via which the liquid is supplied from above the exposure region. A plurality of recovery openings are arranged to surround the exposure region, via which the liquid is collected from above the exposure region. A part of the supply openings are selected so as to supply the liquid ahead of the exposure region in a direction in which the stage moves.

1 . A liquid immersion lithography apparatus comprising:
 a stage on which a wafer is held;   a projection system by which a pattern image is projected to an exposure region through an immersion liquid to expose the wafer on the stage;   a plurality of supply openings arranged to surround the exposure region, via which the liquid is supplied from above the exposure region; and   a plurality of recovery openings arranged to surround the exposure region, via which the liquid is collected from above the exposure region,   wherein a part of the supply openings are selected so as to supply the liquid ahead of the exposure region in a direction in which the stage moves.   
     
     
         2 . The apparatus according to  claim 1 , wherein a part of the recovery openings are selected so as to collect the supplied liquid.