US2013146342A1PendingUtilityA1
Pattern-forming composition and pattern-forming method using the same
Est. expiryDec 13, 2031(~5.4 yrs left)· nominal 20-yr term from priority
C25D 5/02G03F 7/032H01B 1/22H05K 2203/0425H05K 2201/0302H05K 1/095H05K 3/102H05K 3/188H05K 1/09H05K 3/1216H05K 2201/0245H05K 3/246H01B 1/02
58
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Claims
Abstract
The present invention relates to a pattern-forming composition used to form a conductive circuit pattern. The pattern-forming composition comprises Cu powders, a solder for electrically coupling the Cu powders, a polymer resin, a curing agent and a reductant. According to the present invention, a circuit pattern having superior conductivity can be formed at low cost.
Claims
exact text as granted — not AI-modified1 . A pattern-forming composition comprising:
Cu powders; a solder for electrically coupling the Cu powders; a polymer resin; a curing agent; and a reductant.
2 . The pattern-forming composition as claimed in claim 1 , wherein the diameter of the Cu powder is 2-10 μm.
3 . The pattern-forming composition as claimed in claim 1 , wherein the solder is at least two selected from the group consisting of Sn, Bi, In, Ag, Pb and Cu.
4 . The pattern-forming composition as claimed in claim 1 , wherein the solder is selected from the group consisting of a mixture of Sn and Bi, a mixture of In and Sn, a mixture of In and Ag, a mixture of Bi, Sn and Ag, a mixture of Bi and Sn, a mixture of Bi, Pb and Sn, and a mixture of Sn, Ag and Cu.
5 . The pattern-forming composition as claimed in claim 1 , wherein the polymer resin is selected from the group consisting of diglycidyl ether of bisphenol A, tetraglycidyl 4,4′-diaminodiphenyl methane, tri diaminodiphenyl methane, isocyanate; and bismaleimide.
6 . The pattern-forming composition as claimed in claim 1 , comprising 30-50 wt % of the Cu powder, 30-50 wt % of the solder, 1-20 wt % of the polymer resin, 1-15 wt % of the curing agent and 0.1-5 wt % of the reductant based on 100 wt % of the pattern-forming composition.
7 . The pattern-forming composition as claimed in claim 1 , further comprising Ag powders.
8 . A pattern-forming method comprising the steps of:
preparing a pattern-forming composition comprising Cu powders, a solder for electrically coupling the Cu powders, a polymer resin, a curing agent and a reductant; and forming a circuit pattern by printing the pattern-forming composition on the substrate.
9 . The pattern-forming method as claimed in claim 8 , further comprising the step of electrolytic-plating the formed circuit pattern.
10 . The pattern-forming method as claimed in claim 8 , wherein the diameter of the Cu powder is 2-10 μm.
11 . The pattern-forming method as claimed in claim 8 , wherein the solder is at least two selected from the group consisting of Sn, Bi, In, Ag, Pb and Cu.
12 . The pattern-forming method as claimed in claim 8 , wherein the solder is selected from the group consisting of a mixture of Sn and Bi, a mixture of In and Sn, a mixture of In and Ag, a mixture of Bi, Sn and Ag, a mixture of Bi and Sn, a mixture of Bi, Pb and Sn, and a mixture of Sn, Ag and Cu.
13 . The pattern-forming method as claimed in claim 8 , wherein the pattern-forming composition further comprises Ag powders.
14 . A conductive circuit pattern formed by the method defined in claim 8 .
15 . The conductive circuit pattern as claimed in claim 14 , wherein the method further comprising the step of electrolytic-plating the formed circuit pattern.
16 . The conductive circuit pattern as claimed in claim 14 , wherein the diameter of the Cu powder is 2-10 μm.
17 . The conductive circuit pattern as claimed in claim 14 , wherein the solder is at least two selected from the group consisting of Sn, Bi, In, Ag, Pb and Cu.
18 . The conductive circuit pattern as claimed in claim 14 , wherein the solder is selected from the group consisting of a mixture of Sn and Bi, a mixture of In and Sn, a mixture of In and Ag, a mixture of Bi, Sn and Ag, a mixture of Bi and Sn, a mixture of Bi, Pb and Sn, and a mixture of Sn, Ag and Cu.
19 . The conductive circuit pattern as claimed in claim 14 , wherein the pattern-forming composition further comprises Ag powders.Cited by (0)
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