Method and apparatus for cleaning a substrate using non-newtonian fluids

Abstract

A method for cleaning a substrate is provided. In this method, a flow of non-Newtonian fluid is provided where at least a portion of the flow exhibits plug flow. To remove particles from a surface of the substrate, the surface of the substrate is placed in contact with the portion of the flow that exhibits plug flow such that the portion of the flow exhibiting plug flow moves over the surface of the substrate. Additional methods and apparatuses for cleaning a substrate also are described.

What is claimed is: 
     
         1 . An apparatus for cleaning a substrate, comprising:
 a chamber having a cavity in a form of a conduit, the conduit being capable of conveying a flow of a non-Newtonian fluid such that a portion of the flow exhibits plug flow, the chamber being configured to contain the substrate such that the plug flow moves over a surface of the substrate to enable removal of particles from the surface.   
     
     
         2 . The apparatus of  claim 1 , wherein a gap between a wall of the chamber and the surface of the substrate has a height in a range from about 50 microns to about 10 millimeters. 
     
     
         3 . The apparatus of  claim 1 , further comprising:
 an input port in a wall of the chamber, the input port being configured to port the non-Newtonian fluid into the chamber.   
     
     
         4 . The apparatus of  claim 1 , wherein the chamber has an input end and an output end, the input end defining a first opening capable of receiving the substrate, the output end defining a second opening capable of outputting the substrate. 
     
     
         5 . The apparatus of  claim 4 , further comprising:
 a holding pin within the chamber that is proximate to the second opening, the holding pin being configured to receive an edge of the substrate to prevent movement of the substrate while the plug flow moves over the surface of the substrate.   
     
     
         6 . The apparatus of  claim 4 , further comprising:
 a panel proximate to the first opening configured to seal off the first opening.   
     
     
         7 . An apparatus for cleaning a substrate, comprising:
 a chamber having walls that define a cavity in a form of a conduit, the chamber having an input end defined by a first opening for receiving a substrate and an output end defined by a second opening for outputting the substrate;   at least one input port defined in a wall of the chamber for porting a non-Newtonian fluid into the chamber;   at least one holding pin disposed within the chamber, the at least one holding pin receiving an edge of the substrate to prevent movement of the substrate as the non-Newtonian fluid flows through the chamber; and   a panel proximate to the input end defined by the first opening, the panel being capable of closing off the input end defined by the first opening.   
     
     
         8 . The apparatus of  claim 7 , wherein the walls of the chamber define a cavity having a rectangular shape. 
     
     
         9 . The apparatus of  claim 7 , wherein the chamber includes at least two input ports defined in the walls of the chamber, the input ports being disposed proximate to the input end of the chamber. 
     
     
         10 . The apparatus of  claim 9 , wherein one of the at least two input ports is located at a top of the chamber and an other of the at least two input ports is located at a bottom of the chamber.