Lithography apparatus comprising a plurality of individually controllable write heads

Abstract

The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.

What is claimed is: 
     
         1 . An apparatus, comprising:
 a light generating device comprising at least one light source configured to generate light;   a writing device comprising a plurality of individually controllable write heads configured to project the light from the at least one light source onto different regions of a substrate wafer;   a light transferring device comprising a plurality of optical waveguides configured to transfer the light from the light generating device to the writing device;   a transport device configured to provide relative movement between the writing device and the substrate wafer in a transport direction; and   a control device configured to control writing on the substrate wafer,   wherein the apparatus is a lithography apparatus.   
     
     
         2 . The apparatus of  claim 1 , wherein each write head comprises:
 a light input coupling device configured to couple the light from the plurality of optical waveguides into the write head;   an optical device configured to generate a light spot comprised of the light beams from the individual optical waveguides on the substrate wafer; and   a scanning device configured to move the light spot in a scanning manner on the substrate wafer in a scanning direction which is transverse to the transport direction.   
     
     
         3 . The apparatus of  claim 2 , wherein:
 for at least one of the write heads, the scanning device comprises an oscillating scanning mirror configured to generate a sinusoidal movement trajectory of the light spot on the substrate wafer moving in the transport direction; and   the control device is configured to vary a light intensity of at least one of the light beams forming the light spot on the substrate wafer depending on a current speed of the light spot on the substrate wafer during a scanning period.   
     
     
         4 . The apparatus of  claim 1 , wherein:
 each write head is configured to a strip-shaped region of the substrate wafer; and   the strip-shaped regions exposed by different write heads are offset relative to each other in the transport direction so that the strip-shaped regions form a continuous area.   
     
     
         5 . The apparatus of  claim 1 , further comprising a detection device comprising a plurality of measuring devices, wherein each measuring device:
 is individually assigned to the individual write heads to monitor a width and/or an orientation of the strip-shaped regions; and   comprises at least two photodiodes arranged one behind the other in a scanning direction of the light beam in a scanning region of the respective write head, the scanning direction being transverse to the transport direction.   
     
     
         6 . The apparatus of  claim 5 , wherein the measuring device is configured to individually detect each light beam of the light spot comprised of the light beams from the individual optical waveguides. 
     
     
         7 . The apparatus of  claim 1 , further comprising:
 a detection device comprising a plurality of measuring devices; and   a light detector,   wherein:   each measuring device is assigned to the individual write heads to monitor a width and an orientation of the strip-shaped regions;   each measuring device comprises two reflective structures on the substrate wafer along a scanning direction which is transverse to the transport direction;   each measuring device is configured to capture by the light spot of the respective write head and a light detector; and   the light detector is in the respective write head and configured to detect light reflected back from the reflective structures.   
     
     
         8 . The apparatus of  claim 7 , wherein the measuring device is configured to individually detect each light beam of the light spot comprised of the light beams from the individual optical waveguides. 
     
     
         9 . The apparatus of  claim 1 , wherein a light source is in each case assigned to a single write head, and each light source is individually drivable. 
     
     
         10 . The apparatus of  claim 1 , wherein:
 a light source is assigned to a plurality of the write heads; and   each write head is assigned an individual electro-optical modulator configured to modulate a light intensity of the light provided by the light source assigned to the write head.   
     
     
         11 . The apparatus of  claim 1 , wherein each optical waveguides assigned to a write head is respectively assigned a separately drivable electro-optical modulator. 
     
     
         12 . A write head, comprising:
 a light input coupling device;   an optical device; and   a scanning device,   wherein:
 the write head is configured to be used with the apparatus of  claim 1  such that during use with the apparatus of  claim 1 : 
 the light input coupling device couples the light from a plurality of optical waveguides; and 
 the optical device generates a light spot comprised of the light beams from the individual optical waveguides on the substrate wafer; and 
 the scanning device moves the light spot in a scanning manner on the substrate wafer in a scanning direction which is transverse to the transport direction. 
   
     
     
         13 . The write head of  claim 12 , wherein:
 the light input coupling device comprises a plurality of waveguide structures in a transparent substrate;   on an input side, the waveguide structures are at least at a distance from each other that corresponds to a diameter of the individual optical waveguides; and   on an output side, the waveguide structures converge to form a spatially narrowly delimited waveguide bundle.   
     
     
         14 . The write head of  claim 13 , wherein:
 the input coupling device comprises a plurality of microlenses and a telescope optical unit optically downstream of the microlenses;   for each microlens, the microlens is configured to image, in a magnified fashion, the output of an optical waveguide assigned to the microlens; and   the telescope optical unit is configured to the image so that the light spot comprised of the light beams of the individual optical waveguides arises on the substrate wafer.   
     
     
         15 . The write head of  claim 12 , wherein:
 the scanning device comprises a scanning mirror that is movable about a scanning axis and that is configured to guide the light spot imaged on the substrate wafer in a periodic scanning movement over the substrate wafer; and   the periodic scanning movement is transverse to the transport direction.   
     
     
         16 . The write head of  claim 15 , wherein the scanning device is configured to perform a periodic line compensation movement of the light spot on the substrate wafer. 
     
     
         17 . The write head of  claim 12 , wherein:
 the optical device comprises a collimator optically upstream of the scanning device to generate parallel light beams; and   a telecentric imaging optical unit and/or f-theta lens optically downstream of the scanning device to focus the parallel light beams on the substrate wafer.   
     
     
         18 . A method, comprising:
 providing the apparatus of  claim 1 ;   moving the substrate wafer in the transport direction;   projecting a plurality of light beams onto the substrate wafer to generate on the substrate wafer a light spot formed from a plurality of individual light spots;   oscillating the light spot transverse to the transport direction to generate a sinusoidal movement trajectory of the light spot on the substrate wafer; and   varying a light intensity of at least one of the light beams during a scanning period depending on a current speed of the light spot on the substrate wafer.   
     
     
         19 . An apparatus, comprising:
 at least one light source configured to generate light;   a plurality of individually controllable write heads configured to project the light from the at least one light source onto different regions of a substrate wafer;   a plurality of optical waveguides configured to transfer the light from the at least one light source to the write heads;   a device configured to provide relative movement between the writing device and the substrate wafer in a transport direction; and   a control device configured to control writing on the substrate wafer,   wherein the apparatus is a lithography apparatus.   
     
     
         20 . An apparatus, comprising:
 at least one light source configured to generate light;   a plurality of individually controllable write heads configured to project the light from the at least one light source onto different regions of a substrate wafer;   a plurality of optical waveguides configured to transfer the light from the at least one light source to the write heads; and   a device configured to provide relative movement between the writing device and the substrate wafer in a transport direction,   wherein the apparatus is a lithography apparatus.