Exposure apparatus and method for producing device

Abstract

A liquid immersion exposure apparatus includes a stage having a holder that holds a substrate, and is movable below a projection system, supply ports via which immersion liquid is supplied, the supply ports facing an upper surface of the substrate held on the holder, recovery ports via which the immersion liquid is collected and arranged such that (i) the upper surface of the substrate held on the holder faces the recovery ports and (ii) the recovery ports encircle a path of exposure light. The recovery ports collect the immersion liquid from the upper surface of the substrate such that only a portion of the upper surface of the substrate is covered with the immersion liquid. The stage is movable below a gas supply opening that supplies a gas. The stage is movable to a position where the supplied gas is supplied to a surface of the stage.

What is claimed is: 
     
         1 . A liquid immersion exposure apparatus comprising:
 a projection system having an optical element via which exposure light is projected;   a stage having a holder configured to hold a substrate, the stage being movable below the projection system;   a plurality of supply ports via which immersion liquid is supplied, the supply ports being arranged such that an upper surface of the substrate held on the holder faces the supply ports;   a plurality of recovery ports via which the immersion liquid is collected, the recovery ports being arranged such that (i) the upper surface of the substrate held on the holder faces the recovery ports and (ii) the recovery ports encircle a path of the exposure light, the recovery ports collecting the immersion liquid from the upper surface of the substrate such that only a portion of the upper surface of the substrate is covered with the immersion liquid; and   a gas supply opening via which a gas is supplied, the stage being movable below the gas supply opening, wherein   the substrate held on the holder is exposed through the immersion liquid covering the portion of the upper surface of the substrate, and   the stage is movable to a position where the gas from the gas supply opening is supplied to a surface of the stage.   
     
     
         2 . The apparatus according to  claim 1 , wherein the surface of the stage includes a surface of a component. 
     
     
         3 . The apparatus according to  claim 2 , wherein the stage is movable to a position where the immersion liquid is supplied to the surface of the component. 
     
     
         4 . The apparatus according to  claim 3 , wherein the component includes a reference member having a reference mark. 
     
     
         5 . The apparatus according to  claim 4 , wherein the reference mark is detected not through the immersion liquid. 
     
     
         6 . The apparatus according to  claim 4 , wherein the reference mark is used for obtaining projection position information. 
     
     
         7 . The apparatus according to  claim 1 , wherein the stage has a flow path via which a portion of the immersion liquid that has been supplied from the supply ports is discharged. 
     
     
         8 . A device manufacturing method comprising:
 exposing a substrate using the apparatus defined in  claim 1 ; and   processing the exposed substrate.