Method for separating a solid-state layer from a solid-state material
Abstract
A method for separating a solid-state layer from a solid-state material includes: moving the solid-state material relative to a laser processing system; successively emitting a plurality of laser beams from the laser processing system to the solid-state material to create modifications within the solid-state material; adjusting the laser processing system for defined focusing of the plurality of laser beams and/or for continuous adjustment of energy of the plurality of laser beams as a function of at least one parameter; and detaching the solid-state layer from the solid-state material in a region of the modifications.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A method for separating a solid-state layer from a solid-state material, the method comprising:
moving the solid-state material relative to a laser processing system; successively emitting a plurality of laser beams from the laser processing system to the solid-state material to create modifications within the solid-state material; adjusting the laser processing system for defined focusing of the plurality of laser beams and/or for continuous adjustment of energy of the plurality of laser beams as a function of at least one parameter; and detaching the solid-state layer from the solid-state material in a region of the modifications.
2 . The method of claim 1 , wherein detaching the solid-state layer from the solid-state material in the region of the modifications comprises:
providing a receiving layer on the solid-state material, the receiving layer comprising a polymer material; applying a thermal treatment to the receiving layer such that the polymer material undergoes a glass transition which imparts mechanical stresses in the solid-state material, the mechanical stresses causing a crack to propagate in the solid-state material along a crack guidance region defined by the modifications; and detaching the solid-state layer from the solid-state material along the crack guidance region.
3 . The method of claim 2 , wherein the polymer material is polydimethylsiloxane (PDMS) or an elastomer or an epoxy resin or a combination thereof.
4 . The method of claim 2 , wherein the receiving layer comprises a polymer-hybrid material which forms a polymer matrix, and wherein a filler is in the polymer matrix.
5 . The method of claim 4 , wherein the polymer matrix is a polydimethylsiloxane matrix, and wherein an amount by weight of the polymer matrix in the polymer-hybrid material is between 80% to 99%.
6 . The method of claim 1 , wherein the adjusting of the laser processing system is implemented based on differentiating tilting of the solid-state material due to placement errors.
7 . The method of claim 6 , wherein the tilting is differentiated with response to machine holders that hold the solid-state material.
8 . The method of claim 1 , wherein the solid-state material is a semiconductor ingot, and wherein the adjusting of the laser processing system is implemented based on planarity errors in the semiconductor ingot.
9 . The method of claim 1 , wherein the laser processing system is adjusted by a refractive index determination sensor and a topography determination sensor.Join the waitlist — get patent alerts
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