US6953720B2ExpiredUtilityPatentIndex 93
Methods for forming chalcogenide glass-based memory elements
Est. expiryAug 29, 2022(expired)· nominal 20-yr term from priority
H10N 70/245H10N 70/066H10N 70/046H10N 70/8825H10N 70/826
93
PatentIndex Score
27
Cited by
283
References
45
Claims
Abstract
The present invention provides a design for a PCRAM element which incorporates multiple metal-containing germanium-selenide glass layers of diverse stoichiometries. The present invention also provides a method of fabricating the disclosed PCRAM structure.
Claims
exact text as granted — not AI-modified1. A method of fabricating a memory element comprising the acts of:
forming a first chalcogenide glass layer, said first chalcogenide glass layer having a first stoichiometry;
introducing a metal into said first chalcogenide glass layer to form a first metal-containing chalcogenide glass layer;
forming a second chalcogenide glass layer, said second chalcogenide glass layer having a second stoichiometry different from said first stoichiometry; and
introducing a metal into said second chalcogenide glass layer to form a second metal-containing chalcogenide glass layer.
2. A method of claim 1 wherein said first chalcogenide glass layer comprises a first germanium-selenide glass layer and said second chalcogenide glass layer comprises a second germanium-selenide glass layer.
3. A method of claim 2 wherein said first and said second germanium-selenide glass layers have a stoichiometric composition of about Ge x Se 100−x .
4. A method of claim 3 wherein the value of x for said first germanium-selenide glass layer is greater than the value of x for said second germanium-selenide glass layer.
5. A method of claim 4 wherein the value of x for said first germanium-selenide glass layer is about 38 to about 43 and the value of x for said second germanium-selenide glass layer is about 18 to about 33.
6. A method of claim 5 wherein the value of x for said first germanium-selenide glass layer is about 40 and the value of x for said second germanium-selenide glass layer is about 25.
7. A method of claim 3 wherein the value of x for said first germanium-selenide glass layer is less than the value of x for said second germanium-selenide glass layer.
8. A method of claim 3 wherein silver is introduced into said first and said second germanium-selenide glass layers.
9. A method of claim 8 wherein the step of introducing silver into any of the said first or said second germanium-selenide glass layers having a value of x between about 18 and about 33 comprises the steps of:
depositing a silver-containing layer over said any of the said first or said second germanium-selenide glass layers having a value of x between about 18 and about 33;
irradiating said any of the said first or said second germanium-selenide glass layers having a value of x between 18 and about 33 with electromagnetic radiation of wavelength of about 200 nm to about 600 nm for approximately 5 to about 30 minutes at from about 1 mW/cm 2 to about 10 mW/cm 2 .
10. A method of claim 9 further comprising removing residual silver-containing layer from over irradiated said any of the said first or said second germanium-selenide glass layers having a value of x between 18 and about 33.
11. A method of claim 9 further comprising thermally heating said silver containing layer and said first or said second germanium-selenide glass layer at a temperature of about 50° C. to about 350° C. for about 5 to about 15 minutes.
12. A method of claim 11 comprising the step of thermally heating said silver containing layer and said first or said second germanium-selenide glass layer at a temperature of about 110° C.
13. A method of claim 9 wherein said silver-containing layer comprises silver-selenide.
14. A method of claim 8 wherein the step of introducing silver into any of said first of said second germanium-selenide glass layers having a value of x between about 38 and about 43 comprises the steps of:
depositing a silver-containing layer over said any of said first or said second germanium-selenide glass layers having a value of x between about 38 and about 43;
allowing silver from said silver-containing layer to migrate into said any of said first or said second germanium-selenide glass layers having a value of x of about 38 to about 43.
15. A method of claim 14 further comprising the step of removing residual silver-containing layer from over said first or said second germanium-selenide glass layer.
16. A method of claim 14 wherein said silver-containing layer comprises silver-selenide.
17. A method of claim 1 further comprising the act of forming a first electrode coupled to said first metal-containing chalcogenide glass layer.
18. The method of claim 17 wherein said first electrode comprises tungsten.
19. The method of claim 1 further comprising the act of forming a second electrode coupled to said second metal-containing chalcogenide glass layer.
20. The method of claim 19 wherein said second electrode comprises silver.
21. A method of fabricating a memory element comprising the steps of:
forming a first chalcogenide glass layer, said first chalcogenide glass layer having a first glass matrix structure;
introducing metal into said first chalcogenide glass layer to form a first metal-containing chalcogenide glass layer;
forming a second chalcogenide glass layer, said second chalcogenide glass layer having a second glass matrix structure diverse from said first glass matrix structure;
introducing metal into said second chalcogenide glass layer to form a second metal-containing chalcogenide glass layer;
forming at least one additional chalcogenide glass layer, said at least one additional chalcogenide glass layer having a glass matrix structure different from the glass matrix structure of any metal-containing chalcogenide glass layer adjacent to said at least one additional metal-containing chalcogenide glass layer; and
introducing metal into said at least one additional chalcogenide glass layer to form at least one additional metal-containing chalcogenide glass layer.
22. A method of claim 21 wherein said first chalcogenide glass layer comprises a first germanium-selenide glass layer, said second chalcogenide glass layer comprises a second germanium-selenide glass layer, and said at least one additional chalcogenide glass layer comprises at least one additional germanium-selenide glass layer.
23. A method of claim 22 wherein said first, said second, and said at least one additional germanium-selenide glass layers have a stoichiometric composition of about Ge x Se 100−x .
24. A method according to claim 23 wherein the value of x for said at least one additional germanium-selenide glass layer equals the value of x of any other germanium-selenide glass layer, wherein said any other germanium-selenide glass layer is not positioned consecutively to said at least one additional germanium-selenide glass layer.
25. A method of claim 24 wherein said at least one additional germanium-selenide glass layer comprises a third germanium-selenide glass layer.
26. A method of claim 25 wherein the value of x for said first and said third germanium-selenide glass layers is equal.
27. A method of claim 26 wherein the value of x for said first and said third germanium-selenide glass layers is greater than the value of x for said second germanium-selenide glass layer.
28. A method of claim 27 wherein the value of x for said first and said third germanium-selenide glass layers is from about 38 to about 43 and the value of x for said second germanium-selenide glass layer is from about 18 to about 33.
29. A method of claim 28 wherein the value of x for said first and said third germanium-selenide glass layers is about 40 and the value of x for said second germanium-selenide glass layer is about 25.
30. A method of claim 23 wherein the value of x for said at least one additional germanium-selenide glass layer is diverse from the value of x for other silver-containing germanium-selenide glass layers.
31. A method of claim 30 wherein the values of x for each of said first, said second, and said at least one additional germanium-selenide glass layer ascend from said first electrode to said second electrode.
32. A method of claim 30 wherein the values of x for each of said first, said second, and said at least one additional germanium-selenide glass layer descend from said first electrode to said second electrode.
33. A method of claim 23 wherein said metal comprises silver.
34. A method of claim 33 wherein the step of introducing silver into any of the said first, said second, or said at least one additional germanium-selenide glass layers having a value of x between about 18 and about 33 comprises the steps of:
depositing a silver-containing layer over said any of the said first, said second, or said at least one additional germanium-selenide glass layers having a value of x between about 18 and about 33;
irradiating said any of the said first, said second, or said at least one additional germanium-selenide glass layers having a value of x between about 18 and about 33 with electromagnetic radiation of wavelength of about 200 nm to about 600 nm for approximately 5 to about 30 minutes at from about 1 mW/cm 2 to about 10 mW/cm 2 .
35. A method of claim 34 further comprising removing residual silver-containing layer from over irradiated said any of the said first, said second, or said at least one additional germanium-selenide glass layers having a value of x between about 18 and about 33.
36. A method of claim 34 further comprising thermally heating said silver containing layer and said any of the said first, said second, or said at least one additional germanium-selenide glass layers having a value of x between about 18 and about 33 at a temperature of about 50° C. to about 350° C. for about 5 to about 15 minutes.
37. A method of claim 36 comprising the step of thermally heating said silver containing layer and said any of said first, said second, or said at least one additional germanium-selenide glass layer having a value of x between about 18 and about 33 at a temperature of about 110° C.
38. A method of claim 34 wherein said silver-containing layer comprises silver-selenide.
39. A method of claim 33 wherein the step of introducing silver into any of the said first, said second, or said at least one additional germanium-selenide glass layers having a value of x between about 38 and about 43 comprises the steps of:
depositing a silver-containing layer over said any of the said first, said second, or said at least one additional germanium-selenide glass layer having a value of x between about 38 and about 43;
allowing silver from said silver-containing layer to migrate into said any of said first, said second, or said at least one additional germanium-selenide glass layer having a value of x between about 38 and about 43.
40. A method of claim 39 further comprising the step of removing residual silver-containing layer from over said any of said first, said second, or said at least one additional germanium-selenide glass layer having a value of x between about 38 and about 43.
41. A method of claim 39 wherein said silver-containing layer comprises silver-selenide.
42. A method of claim 21 further comprising the step of forming a first electrode coupled to said first metal-containing chalcogenide glass layer.
43. A method of claim 42 wherein said first electrode comprises tungsten.
44. A method of claim 21 further comprising the step of forming a second electrode coupled to the last formed said at least one additional metal-containing chalcogenide glass layer.
45. A method of claim 44 wherein said second electrode comprises silver.Cited by (0)
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