Semiconductor device and method of forming openings through insulating layer over encapsulant for enhanced adhesion of interconnect structure

Abstract

A semiconductor device has a semiconductor die mounted to a carrier. An encapsulant is deposited over the semiconductor die and carrier. The carrier is removed. A first insulating layer is formed over a portion of the encapsulant within an interconnect site outside a footprint of the semiconductor die. An opening is formed through the first insulating layer within the interconnect site to expose the encapsulant. The opening can be ring-shaped or vias around the interconnect site and within a central region of the interconnect site to expose the encapsulant. A first conductive layer is formed over the first insulating layer to follow a contour of the first insulating layer. A second conductive layer is formed over the first conductive layer and exposed encapsulant. A second insulating layer is formed over the second conductive layer. A bump is formed over the second conductive layer in the interconnect site.

What is claimed: 
     
       1. A method of making a semiconductor device, comprising:
 providing a semiconductor die including a first conductive layer formed on a surface of the semiconductor die; 
 forming a first insulating layer over the surface of the semiconductor die; 
 depositing an encapsulant over the semiconductor die with a surface of the encapsulant coplanar with the surface of the semiconductor die; 
 forming a second insulating layer over the surface of the encapsulant and over the first insulating layer and extending to contact the first conductive layer; 
 forming an interconnect site outside a footprint of the semiconductor die by removing a portion of the second insulating layer within the interconnect site over the encapsulant to form an opening extending to the surface of the encapsulant while leaving a portion of the second insulating layer in an interior region of the interconnect site; and 
 forming a second conductive layer over the interconnect site to contact the portion of the second insulating layer and extending into the opening to contact the surface of the encapsulant. 
 
     
     
       2. The method of  claim 1 , further including forming a bump over the second conductive layer. 
     
     
       3. The method of  claim 1 , wherein the opening includes a ring shape around the portion of the second insulating layer in the interior region of the interconnect site. 
     
     
       4. The method of  claim 1 , wherein the opening includes a plurality of vias disposed around a perimeter of the interconnect site. 
     
     
       5. The method of  claim 1 , further including forming a third conductive layer over the interconnect site. 
     
     
       6. The method of  claim 1 , further including forming a third insulating layer over the second insulating layer. 
     
     
       7. A method of making a semiconductor device, comprising:
 providing a semiconductor die; 
 depositing an encapsulant over the semiconductor die with a surface of the encapsulant coplanar with a surface of the semiconductor die; 
 forming a first insulating layer over the surface of the encapsulant; 
 forming an interconnect site outside a footprint of the semiconductor die by removing a portion of the first insulating layer within the interconnect site over the encapsulant to form an opening extending to the surface of the encapsulant while leaving a portion of the first insulating layer in an interior region of the interconnect site; and 
 forming a first conductive layer over the interconnect site to contact the portion of the first insulating layer and extending into the opening to contact the surface of the encapsulant. 
 
     
     
       8. The method of  claim 7 , further including forming an interconnect structure over the first conductive layer. 
     
     
       9. The method of  claim 8 , wherein the interconnect structure includes a bump. 
     
     
       10. The method of  claim 7 , wherein the opening includes a ring shape around the portion of the second insulating layer in the interior region of the interconnect site. 
     
     
       11. The method of  claim 7 , wherein the opening includes a plurality of vias disposed around a perimeter of the interconnect site. 
     
     
       12. The method of  claim 7 , further including forming a second insulating layer over the surface of the semiconductor die, wherein the first insulating layer extends over the second insulating layer to contact a second conductive layer on the semiconductor die. 
     
     
       13. The method of  claim 7 , further including forming a second insulating layer over the interconnect site. 
     
     
       14. A method of making a semiconductor device, comprising:
 providing a semiconductor die; 
 depositing an encapsulant over the semiconductor die; 
 forming a first insulating layer over a surface of the encapsulant; 
 forming an interconnect site outside a footprint of the semiconductor die by removing a portion of the first insulating layer within the interconnect site over the encapsulant to form an opening extending to the surface of the encapsulant while leaving a portion of the first insulating layer in an interior region of the interconnect site; and 
 forming a first conductive layer over the interconnect site to contact the portion of the first insulating layer and extending into the opening to contact the surface of the encapsulant. 
 
     
     
       15. The method of  claim 14 , further including forming an interconnect structure over the first conductive layer. 
     
     
       16. The method of  claim 14 , wherein the opening includes a ring shape around the portion of the second insulating layer in the interior region of the interconnect site. 
     
     
       17. The method of  claim 14 , wherein the opening includes a plurality of vias disposed around a perimeter of the interconnect site. 
     
     
       18. The method of  claim 14 , further including forming a second conductive layer over the interconnect site. 
     
     
       19. The method of  claim 14 , further including forming a second insulating layer over the semiconductor die, wherein the first insulating layer extends over the second insulating layer to contact a second conductive layer on the semiconductor die. 
     
     
       20. A semiconductor device, comprising:
 a semiconductor die; 
 an encapsulant deposited over the semiconductor die; 
 a first insulating layer formed over a surface of the encapsulant; 
 an interconnect site located outside a footprint of the semiconductor die, wherein the interconnect structures includes an opening in the first insulating layer and a portion of the first insulating layer in an interior region of the interconnect site; 
 a first conductive layer formed over the interconnect site to contact the portion of the first insulating layer and extending into the opening to contact the surface of the encapsulant; and 
 forming a second insulating layer over the surface of the semiconductor die, wherein the first insulating layer extends over the second insulating layer to contact a second conductive layer on the semiconductor die. 
 
     
     
       21. The semiconductor device of  claim 20 , further including forming an interconnect structure over the first conductive layer. 
     
     
       22. The semiconductor device of  claim 20 , wherein the opening includes a ring shape around the portion of the second insulating layer in the interior region of the interconnect site. 
     
     
       23. The semiconductor device of  claim 20 , wherein the opening includes a plurality of vias disposed around a perimeter of the interconnect site. 
     
     
       24. The semiconductor device of  claim 20 , further including a second conductive layer formed over the interconnect site.