US9929136B1ActiveUtilityPatentIndex 63

Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-Enabled fill cells, with the first DOE including tip-to-side short configured fill cells, and the second DOE including chamfer short configured fill cells

Assignee: PDF SOLUTIONS INCPriority: Apr 4, 2016Filed: Mar 31, 2017Granted: Mar 27, 2018

Est. expiryApr 4, 2036(~9.8 yrs left)· nominal 20-yr term from priority

Inventors:LAM STEPHEN CIPLICKAS DENNIS BROZEK TOMASZ CHENG JEREMY COMENSOLI SIMONE DE INDRANIL DOONG KELVIN EISENMANN HANS FISCUS TIMOTHY HAIGH JONATHAN HESS CHRISTOPHER KIBARIAN JOHN LEE SHERRY Liao Marci LIN SHENG-CHE MATSUHASHI HIDEKI MICHAELS KIMON O'SULLIVAN CONOR RAUSCHER MARKUS Rovner Vyacheslav STROJWAS ANDRZEJ Strojwas Marcin TAYLOR CARL VALLISHAYEE RAKESH WEILAND LARG YOKOYAMA NOBUHARU

G06F 30/30G06F 30/39G06F 2111/04G06F 30/392H10P 74/277H10P 74/273H10P 74/238H10P 74/23H10W 20/43H10W 20/42G01R 31/303G06F 11/079H01L 27/0207H01L 21/823437H01L 22/32G06F 17/5045H01L 23/5226H01L 27/088G06F 17/5081H01L 22/20G06F 17/5072H01L 23/528H01L 21/823475H01L 29/45H10D 84/988H10D 84/975H10D 84/966H10D 62/124H10D 84/907H10D 84/903H10D 84/0149H10D 84/0135H10D 84/83H10D 84/038H10D 64/251H10D 64/62H10D 62/151H10D 62/115H10D 1/00H10D 89/10G06F 30/398

PatentIndex Score

Cited by

297

References

Claims

Abstract

A process for making and using a semiconductor wafer includes instantiating first and second designs of experiments (DOES), each comprised of at least two fill cells. The fill cells contain structures configured to obtain in-line data via non-contact electrical measurements (“NCEM”). The first DOE contains fill cells configured to enable non-contact (NC) detection of tip-to-side shorts, and the second DOE contains fill cells configured to enable NC detection of chamfer shorts. The process may further include obtaining NC measurements from the first and/or second DOE(s) and using such measurements, at least in part, to selectively perform additional processing, metrology or inspection steps on the wafer, and/or on other wafer(s) currently being manufactured.

Claims

exact text as granted — not AI-modified

What we claim in this application is: 
     
       1. A process for making a semiconductor wafer that includes at least a source/drain (AA) layer, a source/drain contact (AACNT) layer, a source/drain silicide (TS) layer, a gate (GATE) layer, and a gate contact (GATECNT) layer, the process comprising at least:
 (i) creating a first design of experiments (DOE) by instantiating, on the wafer, at least first and second non-contact electrical measurement (NCEM)-enabled fill cells in a standard cell form, with first and second supply rails that extend horizontally across the cells and uniformly spaced GATE stripes that extend vertically across the cells, said creating further including instantiating, on the wafer, test gap patterning that comprises first and second features, arranged in a tip-to-side short configuration, with the first feature electrically connected to an NCEM pad and the second feature electrically connected to a permanent or virtual ground, thereby enabling detection of an unintended short or leakage between the first and second features using a non-contact (NC) measurement at the NCEM pad, said creating further including providing at least one patterning difference between the first and second NCEM-enabled fill cells that results in a different probability of detecting shorts or leakages between the first and second features of the first NCEM-enabled fill cell and the first and second features of the second NCEM-enabled fill cell; and, 
 (ii) creating a second DOE by instantiating, on the wafer, at least first and second NCEM-enabled fill cells in a standard cell form, with first and second supply rails that extend horizontally across the cells and uniformly spaced GATE stripes that extend vertically across the cells, said creating further including instantiating, on the wafer, test gap patterning that comprises first and second features, arranged in a chamfer short configuration, with the first feature electrically connected to an NCEM pad and the second feature electrically connected to a permanent or virtual ground, thereby enabling detection of an unintended short or leakage between the first and second features using a NC measurement at the NCEM pad, said creating further including providing at least one patterning difference between the first and second NCEM-enabled fill cells that results in a different probability of detecting shorts or leakages between the first and second features of the first NCEM-enabled fill cell and the first and second features of the second NCEM-enabled fill cell; 
 wherein creating the first and second DOEs further comprises instantiating all of the NCEM-enabled fill cells in the first and second DOEs in a compatible standard cell form, with identical spacing between the first and second supply rails and identical spacing between adjacent GATE stripes. 
 
     
     
       2. A process, as defined in  claim 1 , further comprising obtaining first NC measurements from the first DOE. 
     
     
       3. A process, as defined in  claim 2 , further comprising using, at least in part, the first NC measurements to selectively perform additional processing, metrology or inspection steps on the wafer, and/or on other wafer(s) currently being manufactured. 
     
     
       4. A process, as defined in  claim 3 , further comprising obtaining second NC measurements from the second DOE. 
     
     
       5. A process, as defined in  claim 4 , further comprising using, at least in part, the second NC measurements to selectively perform additional processing, metrology or inspection steps on the wafer, and/or on other wafer(s) currently being manufactured. 
     
     
       6. A process, as defined in  claim 1 , further comprising obtaining first NC measurements from the first DOE and obtaining second NC measurements from the second DOE. 
     
     
       7. A process, as defined in  claim 6 , further comprising using, at least in part, the first NC measurements and the second NC measurements to selectively perform additional processing, metrology or inspection steps on the wafer, and/or on other wafer(s) currently being manufactured. 
     
     
       8. A process, as defined in  claim 1 , for making a semiconductor wafer that additionally includes at least a via to interconnect stack (V0) layer, a first wiring (M1) layer, a second wiring (M2) layer, an M1-to-M2 via (V1) layer, a third wiring (M3) layer, an M2-to-M3 via (V2) layer, a fourth wiring (M4) layer, an M3-to-M4 via (V3) layer, a fifth wiring (M5) layer, and an M4-to-M5 via (V4) layer, the process further including instantiating, on the wafer, at least one additional NCEM-enabled fill cell selected from the list consisting of:
 AA-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 AACNT-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 AACNT-AA-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 TS-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 GATE-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 GATECNT-GATE-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 GATECNT-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 GATECNT-AACNT-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 M1-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 V0-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 M1-V0-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 V1-M1-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 V1-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 M2-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 M2-V1-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 V2-M2-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 M3-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 V2-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 M3-V2-tip-to-tip-short-configured, NCEM-enabled fill cells; 
 AA-tip-to-side-short-configured, NCEM-enabled fill cells; 
 AACNT-tip-to-side-short-configured, NCEM-enabled fill cells; 
 AACNT-AA-tip-to-side-short-configured, NCEM-enabled fill cells; 
 GATE-AA-tip-to-side-short-configured, NCEM-enabled fill cells; 
 GATECNT-GATE-tip-to-side-short-configured, NCEM-enabled fill cells; 
 GATECNT-tip-to-side-short-configured, NCEM-enabled fill cells; 
 TS-GATECNT-tip-to-side-short-configured, NCEM-enabled fill cells; 
 GATECNT-AACNT-tip-to-side-short-configured, NCEM-enabled fill cells; 
 M1-tip-to-side-short-configured, NCEM-enabled fill cells; 
 V0-tip-to-side-short-configured, NCEM-enabled fill cells; 
 M1-V0-tip-to-side-short-configured, NCEM-enabled fill cells; 
 V1-M1-tip-to-side-short-configured, NCEM-enabled fill cells; 
 V1-tip-to-side-short-configured, NCEM-enabled fill cells; 
 M2-tip-to-side-short-configured, NCEM-enabled fill cells; 
 M2-V1-tip-to-side-short-configured, NCEM-enabled fill cells; 
 V2-M2-tip-to-side-short-configured, NCEM-enabled fill cells; 
 M3-tip-to-side-short-configured, NCEM-enabled fill cells; 
 V2-tip-to-side-short-configured, NCEM-enabled fill cells; 
 M3-V2-tip-to-side-short-configured, NCEM-enabled fill cells; 
 AA-side-to-side-short-configured, NCEM-enabled fill cells; 
 AACNT-side-to-side-short-configured, NCEM-enabled fill cells; 
 AACNT-AA-side-to-side-short-configured, NCEM-enabled fill cells; 
 AACNT-GATE-side-to-side-short-configured, NCEM-enabled fill cells; 
 GATE-side-to-side-short-configured, NCEM-enabled fill cells; 
 GATECNT-GATE-side-to-side-short-configured, NCEM-enabled fill cells; 
 TS-GATE-side-to-side-short-configured, NCEM-enabled fill cells; 
 GATECNT-side-to-side-short-configured, NCEM-enabled fill cells; 
 GATECNT-AACNT-side-to-side-short-configured, NCEM-enabled fill cells; 
 M1-side-to-side-short-configured, NCEM-enabled fill cells; 
 V0-side-to-side-short-configured, NCEM-enabled fill cells; 
 M1-V0-side-to-side-short-configured, NCEM-enabled fill cells; 
 V1-M1-side-to-side-short-configured, NCEM-enabled fill cells; 
 V1-side-to-side-short-configured, NCEM-enabled fill cells; 
 M2-side-to-side-short-configured, NCEM-enabled fill cells; 
 M2-V1-side-to-side-short-configured, NCEM-enabled fill cells; 
 V2-M2-side-to-side-short-configured, NCEM-enabled fill cells; 
 M3-side-to-side-short-configured, NCEM-enabled fill cells; 
 V2-side-to-side-short-configured, NCEM-enabled fill cells; 
 M3-V2-side-to-side-short-configured, NCEM-enabled fill cells; 
 AA-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 AACNT-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 AACNT-AA-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 GATE-AA-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 GATE-TS-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 GATECNT-GATE-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 GATECNT-AA-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 GATECNT-TS-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 GATECNT-AACNT-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 V0-AA-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 V0-TS-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 V0-AACNT-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 V0-GATE-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 V0-GATECNT-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 M1-AACNT-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 M1-GATECNT-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 M1-V0-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 V1-M1-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 V1-V0-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 M2-M1-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 M2-V1-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 V2-V1-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 V2-M2-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 M3-M2-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 M3-V2-L-shape-interlayer-short-configured, NCEM-enabled fill cells; 
 AA-diagonal-short-configured, NCEM-enabled fill cells; 
 TS-diagonal-short-configured, NCEM-enabled fill cells; 
 AACNT-diagonal-short-configured, NCEM-enabled fill cells; 
 AACNT-AA-diagonal-short-configured, NCEM-enabled fill cells; 
 GATE-diagonal-short-configured, NCEM-enabled fill cells; 
 GATE-AACNT-diagonal-short-configured, NCEM-enabled fill cells; 
 GATECNT-GATE-diagonal-short-configured, NCEM-enabled fill cells; 
 GATECNT-diagonal-short-configured, NCEM-enabled fill cells; 
 GATECNT-AACNT-diagonal-short-configured, NCEM-enabled fill cells; 
 M1-diagonal-short-configured, NCEM-enabled fill cells; 
 V0-diagonal-short-configured, NCEM-enabled fill cells; 
 M1-V0-diagonal-short-configured, NCEM-enabled fill cells; 
 V1-M1-diagonal-short-configured, NCEM-enabled fill cells; 
 V1-diagonal-short-configured, NCEM-enabled fill cells; 
 M2-diagonal-short-configured, NCEM-enabled fill cells; 
 M2-V1-diagonal-short-configured, NCEM-enabled fill cells; 
 M3-diagonal-short-configured, NCEM-enabled fill cells; 
 V2-M2-diagonal-short-configured, NCEM-enabled fill cells; 
 V2-diagonal-short-configured, NCEM-enabled fill cells; 
 M3-V2-diagonal-short-configured, NCEM-enabled fill cells; 
 AA-corner-short-configured, NCEM-enabled fill cells; 
 AACNT-corner-short-configured, NCEM-enabled fill cells; 
 AACNT-AA-corner-short-configured, NCEM-enabled fill cells; 
 GATE-corner-short-configured, NCEM-enabled fill cells; 
 GATECNT-GATE-corner-short-configured, NCEM-enabled fill cells; 
 GATECNT-TS-corner-short-configured, NCEM-enabled fill cells; 
 GATECNT-corner-short-configured, NCEM-enabled fill cells; 
 GATECNT-AACNT-corner-short-configured, NCEM-enabled fill cells; 
 M1-corner-short-configured, NCEM-enabled fill cells; 
 V0-corner-short-configured, NCEM-enabled fill cells; 
 M1-V0-corner-short-configured, NCEM-enabled fill cells; 
 V1-M1-corner-short-configured, NCEM-enabled fill cells; 
 V1-corner-short-configured, NCEM-enabled fill cells; 
 M2-corner-short-configured, NCEM-enabled fill cells; 
 M2-V1-corner-short-configured, NCEM-enabled fill cells; 
 M3-corner-short-configured, NCEM-enabled fill cells; 
 V2-M2-corner-short-configured, NCEM-enabled fill cells; 
 V2-corner-short-configured, NCEM-enabled fill cells; 
 M3-V2-corner-short-configured, NCEM-enabled fill cells; 
 GATE-AA-interlayer-overlap-short-configured, NCEM-enabled fill cells; 
 GATE-AACNT-interlayer-overlap-short-configured, NCEM-enabled fill cells; 
 GATE-TS-interlayer-overlap-short-configured, NCEM-enabled fill cells; 
 GATECNT-TS-interlayer-overlap-short-configured, NCEM-enabled fill cells; 
 GATECNT-AA-interlayer-overlap-short-configured, NCEM-enabled fill cells; 
 V0-AA-interlayer-overlap-short-configured, NCEM-enabled fill cells; 
 V0-AACNT-interlayer-overlap-short-configured, NCEM-enabled fill cells; 
 V0-TS-interlayer-overlap-short-configured, NCEM-enabled fill cells; 
 V0-GATE-interlayer-overlap-short-configured, NCEM-enabled fill cells; 
 M1-GATECNT-interlayer-overlap-short-configured, NCEM-enabled fill cells; 
 M1-AACNT-interlayer-overlap-short-configured, NCEM-enabled fill cells; 
 V1-V0-interlayer-overlap-short-configured, NCEM-enabled fill cells; 
 M2-M1-interlayer-overlap-short-configured, NCEM-enabled fill cells; 
 V2-V1-interlayer-overlap-short-configured, NCEM-enabled fill cells; 
 M3-M2-interlayer-overlap-short-configured, NCEM-enabled fill cells; 
 V0-GATECNT-via-chamfer-short-configured, NCEM-enabled fill cells; 
 V0-AACNT-via-chamfer-short-configured, NCEM-enabled fill cells; 
 V1-M1-via-chamfer-short-configured, NCEM-enabled fill cells; 
 V2-M2-via-chamfer-short-configured, NCEM-enabled fill cells; 
 V0-merged-via-short-configured, NCEM-enabled fill cells; 
 V1-merged-via-short-configured, NCEM-enabled fill cells; 
 V2-merged-via-short-configured, NCEM-enabled fill cells; 
 AA-snake-open-configured, NCEM-enabled fill cells; 
 TS-snake-open-configured, NCEM-enabled fill cells; 
 AACNT-snake-open-configured, NCEM-enabled fill cells; 
 GATE-snake-open-configured, NCEM-enabled fill cells; 
 GATECNT-snake-open-configured, NCEM-enabled fill cells; 
 V0-snake-open-configured, NCEM-enabled fill cells; 
 M1-snake-open-configured, NCEM-enabled fill cells; 
 V1-snake-open-configured, NCEM-enabled fill cells; 
 M2-snake-open-configured, NCEM-enabled fill cells; 
 V2-snake-open-configured, NCEM-enabled fill cells; 
 M3-snake-open-configured, NCEM-enabled fill cells; 
 AA-stitch-open-configured, NCEM-enabled fill cells; 
 TS-stitch-open-configured, NCEM-enabled fill cells; 
 AACNT-stitch-open-configured, NCEM-enabled fill cells; 
 GATECNT-stitch-open-configured, NCEM-enabled fill cells; 
 V0-stitch-open-configured, NCEM-enabled fill cells; 
 M1-stitch-open-configured, NCEM-enabled fill cells; 
 V1-stitch-open-configured, NCEM-enabled fill cells; 
 M2-stitch-open-configured, NCEM-enabled fill cells; 
 V2-stitch-open-configured, NCEM-enabled fill cells; 
 M3-stitch-open-configured, NCEM-enabled fill cells; 
 AACNT-TS-via-open-configured, NCEM-enabled fill cells; 
 AACNT-AA-via-open-configured, NCEM-enabled fill cells; 
 TS-AA-via-open-configured, NCEM-enabled fill cells; 
 GATECNT-GATE-via-open, NCEM-enabled fill cells; 
 V0-GATECNT-via-open-configured, NCEM-enabled fill cells; 
 V0-AA-via-open-configured, NCEM-enabled fill cells; 
 V0-TS-via-open-configured, NCEM-enabled fill cells; 
 V0-AACNT-via-open-configured, NCEM-enabled fill cells; 
 V0-GATE-via-open-configured, NCEM-enabled fill cells; 
 V0-via-open-configured, NCEM-enabled fill cells; 
 M1-V0-via-open-configured, NCEM-enabled fill cells; 
 V1-M1-via-open-configured, NCEM-enabled fill cells; 
 V1-M2-via-open-configured, NCEM-enabled fill cells; 
 M1-GATECNT-via-open-configured, NCEM-enabled fill cells; 
 M1-AANCT-via-open-configured, NCEM-enabled fill cells; 
 V2-M2-via-open-configured, NCEM-enabled fill cells; 
 V2-M3-via-open-configured, NCEM-enabled fill cells; 
 M1-metal-island-open-configured, NCEM-enabled fill cells; 
 M2-metal-island-open-configured, NCEM-enabled fill cells; 
 M3-metal-island-open-configured, NCEM-enabled fill cells; 
 V0-merged-via-open-configured, NCEM-enabled fill cells; 
 V0-AACNT-merged-via-open-configured, NCEM-enabled fill cells; 
 V0-GATECNT-merged-via-open-configured, NCEM-enabled fill cells; 
 V1-merged-via-open-configured, NCEM-enabled fill cells; 
 V2-merged-via-open-configured, NCEM-enabled fill cells; 
 V1-M1-merged-via-open-configured, NCEM-enabled fill cells; and, 
 V2-M2-merged-via-open-configured, NCEM-enabled fill cells. 
 
     
     
       9. A process, as defined in  claim 1 , wherein each of the first and second DOEs includes at least three different NCEM-enabled fill cells. 
     
     
       10. A process, as defined in  claim 1 , wherein each of the first and second DOEs includes at least five different NCEM-enabled fill cells. 
     
     
       11. A process, as defined in  claim 1 , wherein at least one of the first and/or second DOE(s) includes at least ten different NCEM-enabled fill cells. 
     
     
       12. A process, as defined in  claim 1 , wherein at least one of the first and/or second DOE(s) includes at least twenty different NCEM-enabled fill cells. 
     
     
       13. A process, as defined in  claim 1 , wherein the tip-to-side-short-configured, NCEM-enabled fill cells of the second DOE comprise GATECNT-AACNT-tip-to-side-short-configured, NCEM-enabled fill cells. 
     
     
       14. A process, as defined in  claim 1 , wherein the tip-to-side-short-configured, NCEM-enabled fill cells of the second DOE comprise GATECNT-GATE-tip-to-side-short-configured, NCEM-enabled fill cells. 
     
     
       15. A process, as defined in  claim 1 , wherein the tip-to-side-short-configured, NCEM-enabled fill cells of the second DOE comprise GATE-AA-tip-to-side-short-configured, NCEM-enabled fill cells. 
     
     
       16. A process, as defined in  claim 1 , wherein the tip-to-side-short-configured, NCEM-enabled fill cells of the second DOE comprise M1-tip-to-side-short-configured, NCEM-enabled fill cells. 
     
     
       17. A process, as defined in  claim 1 , wherein the tip-to-side-short-configured, NCEM-enabled fill cells of the second DOE comprise GATECNT-tip-to-side-short-configured, NCEM-enabled fill cells. 
     
     
       18. A process, as defined in  claim 1 , wherein the tip-to-side-short-configured, NCEM-enabled fill cells of the second DOE comprise GATECNT-TS-tip-to-side-short-configured, NCEM-enabled fill cells. 
     
     
       19. A process, as defined in  claim 1 , wherein the tip-to-side-short-configured, NCEM-enabled fill cells of the second DOE comprise GATECNT-AACNT-TS-tip-to-side-short-configured, NCEM-enabled fill cells. 
     
     
       20. A process, as defined in  claim 1 , wherein the chamfer-short-configured, NCEM-enabled fill cells of the second DOE comprise V0-AACNT-chamfer-short-configured, NCEM-enabled fill cells. 
     
     
       21. A process, as defined in  claim 1 , wherein the chamfer-short-configured, NCEM-enabled fill cells of the second DOE comprise V3-M3-chamfer-short-configured, NCEM-enabled fill cells.

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