USD825502SActiveUtility

Heater for substrate processing apparatus

Assignee: HITACHI INT ELECTRIC INCPriority: Oct 14, 2016Filed: Mar 13, 2017Granted: Aug 14, 2018
Est. expiryOct 14, 2036(~10.2 yrs left)· nominal 20-yr term from priority
38
PatentIndex Score
2
Cited by
11
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       We claim the ornamental design for a heater for substrate processing apparatus, as shown and described.

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