Inventor · disambiguated record
Takatomo Yamaguchi
Also filed as: YAMAGUCHI TAKATOMO
31 granted patents·15 pending applications·679 citations·filing 2003–2025
96Inventor score
Files withHITACHI INT ELECTRIC INC24KOKUSAI ELECTRIC CORP16FUKUDA MASANAO1HARA DAISUKE1MUROBAYASHI MASAKI1
Top patents by PatentIndex Score
46 records- 0198US8882923B2Substrate processing apparatus and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2012·Granted Nov 11, 2014·466 cites·13 claims
- 0289US9028614B2Substrate processing apparatusHARA DAISUKE·Filed 2012·Granted May 12, 2015·19 cites·1 claims
- 0386USD739832SReaction tubeHITACHI INT ELECTRIC INC·Filed 2013·Granted Sep 29, 2015·34 cites·1 claims
- 0485USD826185SCeiling heater for substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2017·Granted Aug 21, 2018·24 cites·1 claims
- 0584USD803908SRotary tool for boat of semiconductor manufacturing apparatusHITACHI INT ELECTRIC INC·Filed 2016·Granted Nov 28, 2017·25 cites·1 claims
- 0683US11495477B2Substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2018·Granted Nov 8, 2022·2 cites·16 claims
- 0780US9502237B2Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumHITACHI INT ELECTRIC INC·Filed 2014·Granted Nov 22, 2016·5 cites·13 claims
- 0879USD822081SRotary tool for boat of semiconductor manufacturing apparatusHITACHI INT ELECTRIC INC·Filed 2016·Granted Jul 3, 2018·19 cites·1 claims
- 0977US6737613B2Heat treatment apparatus and method for processing substratesHITACHI INT ELECTRIC INC·Filed 2003·Granted May 18, 2004·21 cites·8 claims
- 1075US11222796B2Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2018·Granted Jan 11, 2022·1 cites·18 claims
- 1173USD918848SRetainer of ceiling heater for semiconductor fabrication apparatusKOKUSAI ELECTRIC CORP·Filed 2019·Granted May 11, 2021·12 cites·1 claims
- 1271US10615061B2Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2016·Granted Apr 7, 2020·1 cites·14 claims
- 1370US9982347B2Cleaning method, method of manufacturing semiconductor device and substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2017·Granted May 29, 2018·1 cites·7 claims
- 1470US7455734B2Substrate processing apparatus, substrate holder, and manufacturing method of semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2004·Granted Nov 25, 2008·13 cites·22 claims
- 1563US9222732B2Substrate processing apparatus and method of manufacturing semiconductor deviceSHIRAKO KENJI·Filed 2011·Granted Dec 29, 2015·2 cites·15 claims
- 1660US11990359B2Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2021·Granted May 21, 2024·0 cites·19 claims
- 1760US11359285B2Substrate processing apparatus, heater and method of manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2020·Granted Jun 14, 2022·0 cites·15 claims
- 1860US2024186156A1Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2024·Application pending·0 cites
- 1958USD1053156SFurnace for substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2022·Granted Dec 3, 2024·2 cites·1 claims
- 2058US2023407479A1Substrate holder, substrate processing apparatus, method of manufacturing semiconductor device and recording mediumKOKUSAI ELECTRIC CORP·Filed 2023·Application pending·0 cites
- 2155US2023230861A1Substrate processing apparatus, method of processing substrate, method of manufacturing semiconductor device and recording mediumKOKUSAI ELECTRIC CORP·Filed 2023·Application pending·0 cites
- 2254USD962184SRetainer plate of top heater for wafer processing furnaceKOKUSAI ELECTRIC CORP·Filed 2019·Granted Aug 30, 2022·5 cites·1 claims
- 2354USD962183SRetainer plate of top heater for wafer processing furnaceKOKUSAI ELECTRIC CORP·Filed 2019·Granted Aug 30, 2022·5 cites·1 claims
- 2454USD825501SAir flow controller for heater of substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2017·Granted Aug 14, 2018·6 cites·1 claims
- 2554US2025215568A1Substrate Processing Apparatus, Gas Supply Assembly, Substrate Processing Method, Method of Manufacturing Semiconductor Device and Non-transitory Computer-Readable Recording MediumKOKUSAI ELECTRIC CORP·Filed 2025·Application pending·0 cites
- 2654US2023012668A1Substrate processing apparatus, method of manufacturing semiconductor device, non-transitory computer-readable recording medium and inner tubeKOKUSAI ELECTRIC CORP·Filed 2022·Application pending·0 cites
- 2754US2023005760A1Substrate processing apparatus, inner tube and method of manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2022·Application pending·0 cites
- 2854US2022356580A1Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2022·Application pending·0 cites
- 2953US12053805B2Method of cleaning member in process container, method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2019·Granted Aug 6, 2024·0 cites·21 claims
- 3053US10597780B2Substrate processing apparatus, heater and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2017·Granted Mar 24, 2020·0 cites·14 claims
- 3153USD818960SInsulation unit of semiconductor manufacturing apparatusHITACHI INT ELECTRIC INC·Filed 2016·Granted May 29, 2018·6 cites·1 claims
- 3253USD818961SInsulation unit cover of semiconductor manufacturing apparatusHITACHI INT ELECTRIC INC·Filed 2016·Granted May 29, 2018·6 cites·1 claims
- 3351US9530677B2Substrate processing apparatus and semiconductor device manufacturing methodHITACHI INT ELECTRIC INC·Filed 2012·Granted Dec 27, 2016·0 cites·8 claims
- 3450US2009269933A1Substrate Processing Apparatus and Semiconductor Device Manufacturing MethodHITACHI INT ELECTRIC INC·Filed 2006·Application pending·0 cites
- 3549USD1070797SFurnace for substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2022·Granted Apr 15, 2025·1 cites·1 claims
- 3642US8771416B2Substrate processing apparatus with an insulator disposed in the reaction chamberSAIDO SHUHEI·Filed 2010·Granted Jul 8, 2014·0 cites·10 claims
- 3738USD825502SHeater for substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2017·Granted Aug 14, 2018·2 cites·1 claims
- 3838US2003231698A1Apparatus and method for fabricating a semiconductor device and a heat treatment apparatusFiled 2003·Application pending·0 cites
- 3937US2011204036A1Heat treatment apparatusHITACHI INT ELECTRIC INC·Filed 2011·Application pending·0 cites
- 4037US2012214317A1Substrate processing apparatus and method, and semiconductor device manufacturing methodMUROBAYASHI MASAKI·Filed 2012·Application pending·0 cites
- 4137US2010224128A1Semiconductor manufacturing apparatusHITACHI INT ELECTRIC INC·Filed 2010·Application pending·0 cites
- 4237US2011056434A1Heat treatment apparatusHITACHI INT ELECTRIC INC·Filed 2010·Application pending·0 cites
- 4336US2016376699A1Substrate processing apparatus, and storage mediumHITACHI INT ELECTRIC INC·Filed 2016·Application pending·0 cites
- 4434USD795209SHeater for semiconductor thermal processHITACHI INT ELECTRIC INC·Filed 2016·Granted Aug 22, 2017·1 cites·1 claims
- 4534US2012220107A1Substrate processing apparatus, wafer holder, and method of manufacturing semiconductor deviceFUKUDA MASANAO·Filed 2012·Application pending·0 cites
- 4630USD793974SHeater for semiconductor thermal processHITACHI INT ELECTRIC INC·Filed 2016·Granted Aug 8, 2017·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →