Processing system

Abstract

A processing system has an upper electrode with gas discharge holes of a shape corresponding to the external we of insulating members. The insulating members are formed of a poly(ether etherketone) resin, a polyimide resin, a poly (ether imide) resin or the like. Each insulating member has a step at its outer surface and an internal longitudinal through hole tapered to expand toward the processing chamber. The insulating members are pressed in the gas discharge holes to bring the steps into contact with shoulders formed in the sidewalls of the gas discharge holes. A part of each insulating member, as fitted in the gas discharge hole, projects from a surface of the upper electrode that faces a susceptor.

1. A processing system comprising:
 a processing vessel defining an airtight processing chamber;  
 an upper electrode disposed in an upper region of the processing chamber;  
 a lower electrode disposed below and opposite to the upper electrode in the processing chamber, and  
 a radio frequency power source connected at least to either the upper or the lower electrode;  
 wherein the upper electrode includes a side facing into the processing chamber towards the lower electrode, the upper electrode side having a plurality of gas discharge holes to supply a predetermined process gas therethrough into the processing chamber,  
 resin insulating members, each provided with a through hole permitting the process gas to pass through, are fitted from the upper electrode side facing the processing chamber into the gas discharge holes, respectively,  
 each of the gas discharge holes is provided with a shoulder,  
 each of the insulating members is provided with a step, and  
 each of the insulating members are positioned in the gas discharge hole with its step in contact with the shoulder of the gas discharge hole.  
 
     
     
       2. The processing system according to  claim 1 , wherein the insulating members are fitted in the gas discharge holes of the upper electrode to project into the processing chamber. 
     
     
       3. The processing system according to  claim 1 , wherein each of the insulating members is provided with a flange capable of covering the rim of an end of the gas discharge hole on the side of the processing chamber. 
     
     
       4. The processing system according to  claim 1 , wherein at least part of the sidewall of each of the gas discharge holes between an open end thereof on the side of the processing chamber and the shoulder thereof is finished by a plasma-proofing process, and a part of the sidewall of each gas discharge hole between the shoulder and the open end opening into a gas supply passage is not finished by the plasma-proofing process. 
     
     
       5. The processing system according to  claim 4 , wherein the insulating members are formed of a resin. 
     
     
       6. The processing system according to  claim 1 , wherein each of the insulating members has a length and the length of the insulating members is shorter than that of the gas discharge holes. 
     
     
       7. The processing system according to  claim 1 , wherein at least part of the through hole of each insulating member is substantially tapered so as to expand toward the processing chamber. 
     
     
       8. A processing system comprising:
 a processing vessel defining an airtight processing chamber;  
 an upper electrode disposed in an upper region of the processing chamber;  
 a lower electrode disposed below and opposite to the upper electrode in the processing chamber; and  
 a radio frequency power source connected at least to either the upper or the lower electrode;  
 wherein the upper electrode has an upper electrode member and a cooling plate disposed on the upper electrode member,  
 the upper electrode member and the cooling plate are provided with a plurality of gas discharge holes through which a predetermined process gas is supplied into the processing chamber,  
 resin insulating members, each provided with a through hole permitting the process gas to flow through, are fitted into the gas discharge holes so as to cover the sidewalls of the gas discharge holes, each of the discharge holes being formed as a through hole passing through the upper electrode member and the cooling plate,  
 each of the gas discharge holes of the cooling plate is provided with a shoulder,  
 each of the insulating members is provided with a step, and  
 the insulating members are positioned in the gas discharge holes with the steps thereof resting on the shoulders of the corresponding gas discharge holes, each of the insulating members is fitted into the cooling plate from an opposite side of the upper electrode member.  
 
     
     
       9. The processing system according to  claim 8 , wherein at least an end part of the through hole of each insulating member on the side of the processing chamber is substantially tapered to expand toward the processing chamber. 
     
     
       10. An upper electrode unit for use in a processing vessel defining an airtight processing chamber, said electrode unit comprising:
   an upper electrode disposable in an upper region of the processing chamber, said upper electrode provided with a plurality of gas discharge holes to supply a predetermined process gas therethrough into the processing chamber, each of the gas discharge holes provided with a shoulder; and        resin insulating members, each provided with a through hole permitting a process gas to pass through, fitted in the gas discharge holes, each of the insulating members are fitted with a step,        wherein the insulating members are fitted in the gas discharge holes so that the insulating members are positioned in place in the gas discharge holes with steps thereof resting on the shoulders of the corresponding gas discharge holes.     
     
     
       11. The upper electrode unit according to  claim 10 , wherein the insulating members are fitted in the gas discharge holes of the upper electrode to project into the processing chamber. 
     
     
       12. The upper electrode unit according to  claim 10 , wherein each of the insulating members is provided with a flange capable of covering a rim of an end of the gas discharge hole in the processing chamber. 
     
     
       13. The upper electrode unit according to  claim 10 , wherein at least part of the sidewall of each of the gas discharge holes between an open end thereof in the processing chamber and the shoulder thereof is finished by a plasma- proofing process, and a part of the sidewall of each gas discharge hole between the shoulder and the open end opening into the gas supply passage is not finished by the plasma - proofing process.   
     
     
       14. The upper electrode unit according to  claim 10 , wherein each of the insulating members has a length and the length of the insulating members is shorter than that of the gas discharge holes. 
     
     
       15. The upper electrode unit according to  claim 10 , wherein at least part of the through hole of each insulating member is substantially tapered so as to expand toward the processing chamber. 
     
     
       16. The upper electrode unit according to  claim 10 , wherein said resin insulating members are fitted in the gas discharge holes, respectively, from inside the processing chamber. 
     
     
       17. An electrode unit for use in an airtight processing chamber having a susceptor therein, the electrode unit comprising:
   an electrode provided with a plurality of gas discharge holes to supply a predetermined process gas therethrough into the processing chamber, each of the gas discharge holes provided with a shoulder, and        resin insulating members, each provided with a step and with a through hole permitting the process gas to pass therethrough, each resin member being pressed into one of the gas discharge holes so that the step of the resin member contacts with the shoulder of said one gas discharge hole and the resin member opposes the susceptor.     
     
     
       18. An electrode unit according to  claim 17 , wherein the resin members project from the gas discharge holes. 
     
     
       19. An electrode unit according to  claim 18 , wherein
   each of the gas discharge holes has an end with a rim,        each of the resin members has a flange, and        the flanges of the resin members cover the rims of the gas discharge holes.     
     
     
       20. An electrode unit according to  claim 19 , wherein each of the gas discharge holes has different interior diameters. 
     
     
       21. An electrode unit according to  claim 20 , wherein an open end of the hole permitting the process gas to pass therethrough substantially is tapered. 
     
     
       22. An electrode unit according to  claim 18 , wherein each of the gas discharge holes has different interior diameters. 
     
     
       23. An electrode unit according to  claim 22 , wherein an open end of the hole permitting the process gas to pass therethrough substantially is tapered.