Inventor · disambiguated record
Nobuyuki Okayama
Also filed as: OKAYAMA NOBUYUKI
12 granted patents·5 pending applications·779 citations·filing 1994–2018
93Inventor score
Top patents by PatentIndex Score
17 records- 0197US6733620B1Process apparatusTOKYO ELECTRON LTD·Filed 2000·Granted May 11, 2004·134 cites·16 claims
- 0295US9263298B2Plasma etching apparatus and plasma etching methodMATSUMOTO NAOKI·Filed 2009·Granted Feb 16, 2016·446 cites·7 claims
- 0389US9466468B2Shower head, plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2014·Granted Oct 11, 2016·8 cites·7 claims
- 0489US6334983B1Processing systemTOKYO ELECTRON LTD·Filed 1998·Granted Jan 1, 2002·52 cites·9 claims
- 0586US5772833APlasma etching apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Jun 30, 1998·57 cites·14 claims
- 0685US7658816B2Focus ring and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Feb 9, 2010·36 cites·8 claims
- 0777US7067178B2Substrate table, production method therefor and plasma treating deviceTOKYO ELECTRON LTD·Filed 2002·Granted Jun 27, 2006·20 cites·10 claims
- 0876US10896842B2Manufacturing method of sample tableTOKYO ELECTRON LTD·Filed 2018·Granted Jan 19, 2021·2 cites·9 claims
- 0965US7544393B2Substrate table, production method therefor and plasma treating deviceTOKYO ELECTRON LTD·Filed 2006·Granted Jun 9, 2009·2 cites·20 claims
- 1053US2011240598A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1146USRE40046EProcessing systemTOKYO ELECTRON LTD·Filed 1998·Granted Feb 12, 2008·8 cites·29 claims
- 1246US2008087382A1Substrate stage and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1344US2007283891A1Table for supporting substrate, and vacuum-processing equipmentOKAYAMA NOBUYUKI·Filed 2007·Application pending·0 cites
- 1443USRE39969EProcessing systemTOKYO ELECTRON LTD·Filed 1998·Granted Jan 1, 2008·7 cites·23 claims
- 1543USRE39939EProcessing systemTOKYO ELECTRON LTD·Filed 1998·Granted Dec 18, 2007·7 cites·17 claims
- 1636US2004200804A1Method of processing quartz member for plasma processing device, quartz member for plasma processing device, and plasma processing device having quartz member for plasma processing device mounted thereonFiled 2002·Application pending·0 cites
- 1733US2012211165A1Sample table and microwave plasma processing apparatusYOSHIKAWA WATARU·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →