Assignee
ANDO TAKASHI
JP·35 granted patents·5 pending applications·641 citations·filing 2006–2020
Top patents by PatentIndex Score
40 records- 0199US8637384B2FinFET parasitic capacitance reduction using air gapANDO TAKASHI·Filed 2012·Granted Jan 28, 2014·374 cites·13 claims
- 0299US8637930B2FinFET parasitic capacitance reduction using air gapANDO TAKASHI·Filed 2011·Granted Jan 28, 2014·99 cites·14 claims
- 0396US8647972B1Multi-layer work function metal replacement gateANDO TAKASHI·Filed 2012·Granted Feb 11, 2014·40 cites·19 claims
- 0494US8941184B2Low threshold voltage CMOS deviceANDO TAKASHI·Filed 2011·Granted Jan 27, 2015·14 cites·9 claims
- 0594US8592264B2Source-drain extension formation in replacement metal gate transistor deviceANDO TAKASHI·Filed 2011·Granted Nov 26, 2013·17 cites·11 claims
- 0694US8420473B2Replacement gate devices with barrier metal for simultaneous processingANDO TAKASHI·Filed 2010·Granted Apr 16, 2013·18 cites·21 claims
- 0790US8581351B2Replacement gate with reduced gate leakage currentANDO TAKASHI·Filed 2011·Granted Nov 12, 2013·10 cites·20 claims
- 0886US8836037B2Structure and method to form input/output devicesANDO TAKASHI·Filed 2012·Granted Sep 16, 2014·7 cites·20 claims
- 0985US8786030B2Gate-last fabrication of quarter-gap MGHK FETANDO TAKASHI·Filed 2012·Granted Jul 22, 2014·6 cites·5 claims
- 1084US8404530B2Replacement metal gate with a conductive metal oxynitride layerANDO TAKASHI·Filed 2011·Granted Mar 26, 2013·7 cites·10 claims
- 1184US8109751B2Imprint device and microstructure transfer methodANDO TAKASHI·Filed 2007·Granted Feb 7, 2012·6 cites·24 claims
- 1283US8659077B1Multi-layer work function metal replacement gateANDO TAKASHI·Filed 2012·Granted Feb 25, 2014·6 cites·18 claims
- 1380US8092209B2Imprinting deviceANDO TAKASHI·Filed 2009·Granted Jan 10, 2012·4 cites·12 claims
- 1479US8735996B2Scavenging metal stack for a high-K gate dielectricANDO TAKASHI·Filed 2012·Granted May 27, 2014·4 cites·7 claims
- 1577US8716118B2Replacement gate structure for transistor with a high-K gate stackANDO TAKASHI·Filed 2012·Granted May 6, 2014·4 cites·9 claims
- 1676US8525552B2Semiconductor integrated circuit device having a plurality of standard cells for leakage current suppressionANDO TAKASHI·Filed 2012·Granted Sep 3, 2013·4 cites·16 claims
- 1776US8491291B2Pattern transfer method and imprint deviceANDO TAKASHI·Filed 2012·Granted Jul 23, 2013·2 cites·6 claims
- 1876US8133418B2Pattern transfer method and imprint deviceANDO TAKASHI·Filed 2007·Granted Mar 13, 2012·3 cites·12 claims
- 1973US8796784B2Devices and methods to optimize materials and properties for replacement metal gate structuresANDO TAKASHI·Filed 2012·Granted Aug 5, 2014·2 cites·17 claims
- 2073US8097500B2Method and apparatus for fabricating a high-performance band-edge complementary metal-oxide-semiconductor deviceANDO TAKASHI·Filed 2008·Granted Jan 17, 2012·6 cites·13 claims
- 2169US9252229B2Inversion thickness reduction in high-k gate stacks formed by replacement gate processesANDO TAKASHI·Filed 2012·Granted Feb 2, 2016·2 cites·5 claims
- 2269US8865551B2Reducing the inversion oxide thickness of a high-k stack fabricated on high mobility semiconductor materialANDO TAKASHI·Filed 2012·Granted Oct 21, 2014·2 cites·9 claims
- 2368US8592296B2Gate-last fabrication of quarter-gap MGHK FETANDO TAKASHI·Filed 2010·Granted Nov 26, 2013·2 cites·15 claims
- 2466US8785322B2Devices and methods to optimize materials and properties for replacement metal gate structuresANDO TAKASHI·Filed 2011·Granted Jul 22, 2014·1 cites·18 claims
- 2563US8853751B2Reducing the inversion oxide thickness of a high-K stack fabricated on high mobility semiconductor materialANDO TAKASHI·Filed 2012·Granted Oct 7, 2014·1 cites·16 claims
- 2655US8716813B2Scaled equivalent oxide thickness for field effect transistor devicesANDO TAKASHI·Filed 2012·Granted May 6, 2014·0 cites·12 claims
- 2753US8564066B2Interface-free metal gate stackANDO TAKASHI·Filed 2010·Granted Oct 22, 2013·0 cites·10 claims
- 2852US8507383B2Fabrication of replacement metal gate devicesANDO TAKASHI·Filed 2011·Granted Aug 13, 2013·0 cites·24 claims
- 2952US2012074615A1Imprint device and microstructure transfer methodANDO TAKASHI·Filed 2011·Application pending·0 cites
- 3049US11064120B2Imaging-element inclination adjustment mechanism, method for adjusting inclination of imaging element, and imaging apparatusANDO TAKASHI·Filed 2020·Granted Jul 13, 2021·0 cites·12 claims
- 3149US8716088B2Scavenging metal stack for a high-K gate dielectricANDO TAKASHI·Filed 2012·Granted May 6, 2014·0 cites·7 claims
- 3245US8975747B2Wiring material and semiconductor module using the sameANDO TAKASHI·Filed 2012·Granted Mar 10, 2015·0 cites·15 claims
- 3345US8583018B2Fusing device and image forming apparatus using the sameANDO TAKASHI·Filed 2011·Granted Nov 12, 2013·0 cites·10 claims
- 3445US2008223237A1Imprint device, stamper and pattern transfer methodANDO TAKASHI·Filed 2008·Application pending·0 cites
- 3545US2012280288A1Inversion thickness reduction in high-k gate stacks formed by replacement gate processesANDO TAKASHI·Filed 2011·Application pending·0 cites
- 3644US8481779B2Method for producing N-substituted-2-amino-4-(hydroxymethylphosphinyl)-2-butenoic acidANDO TAKASHI·Filed 2011·Granted Jul 9, 2013·0 cites·7 claims
- 3744US2006286193A1Imprint device and microstructure transfer methodANDO TAKASHI·Filed 2006·Application pending·0 cites
- 3843US8662009B2Adhesive application apparatusANDO TAKASHI·Filed 2010·Granted Mar 4, 2014·0 cites·8 claims
- 3942US8893646B2Liquid application apparatusANDO TAKASHI·Filed 2010·Granted Nov 25, 2014·0 cites·16 claims
- 4040US2006199384A1Method of forming thin film, and method of manufacturing semiconductor deviceANDO TAKASHI·Filed 2006·Application pending·0 cites
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →