Assignee
HERAEUS INC
US·18 granted patents·41 pending applications·296 citations·filing 1994–2009
Top patents by PatentIndex Score
59 records- 0189US7175802B2Refurbishing spent sputtering targetsHERAEUS INC·Filed 2002·Granted Feb 13, 2007·53 cites·6 claims
- 0285US6521062B1Wrought processing of brittle target alloy for sputtering applicationsHERAEUS INC·Filed 2000·Granted Feb 18, 2003·21 cites·20 claims
- 0384US7494617B2Enhanced formulation of cobalt alloy matrix compositionsHERAEUS INC·Filed 2005·Granted Feb 24, 2009·5 cites·6 claims
- 0479US6797137B2Mechanically alloyed precious metal magnetic sputtering targets fabricated using rapidly solidfied alloy powders and elemental Pt metalHERAEUS INC·Filed 2001·Granted Sep 28, 2004·21 cites·11 claims
- 0579US6759005B2Fabrication of B/C/N/O/Si doped sputtering targetsHERAEUS INC·Filed 2002·Granted Jul 6, 2004·14 cites·23 claims
- 0678US6514358B1Stretching of magnetic materials to increase pass-through-flux (PTF)HERAEUS INC·Filed 2001·Granted Feb 4, 2003·18 cites·22 claims
- 0775US6743534B2Self-constrained low temperature glass-ceramic unfired tape for microelectronics and methods for making and using the sameHERAEUS INC·Filed 2002·Granted Jun 1, 2004·24 cites·25 claims
- 0870US7311874B2Sputter target and method for fabricating sputter target including a plurality of materialsHERAEUS INC·Filed 2003·Granted Dec 25, 2007·8 cites·20 claims
- 0970US5658499AAqueous silver compositionsHERAEUS INC·Filed 1995·Granted Aug 19, 1997·43 cites·14 claims
- 1069US5492653AAqueous silver compositionHERAEUS INC·Filed 1994·Granted Feb 20, 1996·42 cites·23 claims
- 1165US7229588B2Mechanically alloyed precious metal magnetic sputtering targets fabricated using rapidly solidified alloy powders and elemental Pt metalHERAEUS INC·Filed 2004·Granted Jun 12, 2007·8 cites·24 claims
- 1264USRE40100EFabrication of B/C/N/O/Si doped sputtering targetsHERAEUS INC·Filed 2004·Granted Feb 26, 2008·5 cites·45 claims
- 1364US6123783AMagnetic data-storage targets and methods for preparationHERAEUS INC·Filed 1997·Granted Sep 26, 2000·17 cites·9 claims
- 1461US2007269330A1Enhanced sputter target manufacturing methodHERAEUS INC·Filed 2007·Application pending·0 cites
- 1561US2008050263A1Enhanced sputter target manufacturing methodHERAEUS INC·Filed 2007·Application pending·0 cites
- 1661US2008014109A1Enhanced sputter target manufacturing methodHERAEUS INC·Filed 2007·Application pending·0 cites
- 1760US2009120237A1Enhanced formulation of cobalt alloy matrix compositionsHERAEUS INC·Filed 2009·Application pending·0 cites
- 1858US2007017803A1Enhanced sputter target manufacturing methodHERAEUS INC·Filed 2005·Application pending·0 cites
- 1957US2007134124A1Sputter target and method for fabricating sputter target including a plurality of materialsHERAEUS INC·Filed 2007·Application pending·0 cites
- 2056US2009134015A1Enhanced oxygen non-stoichiometry compensation for thin filmsHERAEUS INC·Filed 2009·Application pending·0 cites
- 2154US2008173543A1Low oxygen content, crack-free heusler and heusler-like alloys & deposition sources & methods of making sameHERAEUS INC·Filed 2008·Application pending·0 cites
- 2252US7397013B2Plasma lineation electrodeHERAEUS INC·Filed 2005·Granted Jul 8, 2008·2 cites·22 claims
- 2351US2008166255A1High density, low oxygen re and re-based consolidated powder materials for use as deposition sources & methods of making sameHERAEUS INC·Filed 2008·Application pending·0 cites
- 2449US2008145692A1Magnetic pulse-assisted casting of metal alloys & metal alloys produced therebyHERAEUS INC·Filed 2007·Application pending·0 cites
- 2548US2007189916A1Sputtering targets and methods for fabricating sputtering targets having multiple materialsHERAEUS INC·Filed 2007·Application pending·0 cites
- 2648US2008166596A1Re-based alloys usable as deposition targets for forming interlayers in granular perpendicular magnetic recording media & media utilizing said alloysHERAEUS INC·Filed 2007·Application pending·0 cites
- 2748US2005274221A1Enhanced sputter target alloy compositionsHERAEUS INC·Filed 2005·Application pending·0 cites
- 2848US2009028744A1Ultra-high purity NiPt alloys and sputtering targets comprising sameHERAEUS INC·Filed 2007·Application pending·0 cites
- 2948US2008210555A1High density ceramic and cermet sputtering targets by microwave sinteringHERAEUS INC·Filed 2007·Application pending·0 cites
- 3047US2006289294A1Enhanced oxygen non-stoichiometry compensation for thin filmsHERAEUS INC·Filed 2005·Application pending·0 cites
- 3146US6949156B2Methods for making and using self-constrained low temperature glass-ceramic unfired tape for microelectronicsHERAEUS INC·Filed 2004·Granted Sep 27, 2005·3 cites·10 claims
- 3246US6432223B1Magnetic data-storage targets and method for preparationHERAEUS INC·Filed 2000·Granted Aug 13, 2002·2 cites·21 claims
- 3346US2008131735A1Ni-X, Ni-Y, and Ni-X-Y alloys with or without oxides as sputter targets for perpendicular magnetic recordingHERAEUS INC·Filed 2006·Application pending·0 cites
- 3445US2006078457A1Low oxygen content alloy compositionsHERAEUS INC·Filed 2004·Application pending·0 cites
- 3545US2008268292A1Hexagonal close-packed ceramic seedlayers for perpendicular magnetic recording mediaHERAEUS INC·Filed 2007·Application pending·0 cites
- 3644US2006286414A1Enhanced oxide-containing sputter target alloy compositionsHERAEUS INC·Filed 2005·Application pending·0 cites
- 3744US2009053089A1HOMOGENEOUS GRANULATED METAL BASED and METAL-CERAMIC BASED POWDERSHERAEUS INC·Filed 2007·Application pending·0 cites
- 3843US2006234091A1Enhanced multi-component oxide-containing sputter target alloy compositionsHERAEUS INC·Filed 2005·Application pending·0 cites
- 3943US2008026255A1Alloy and architecture design for heat-assisted magnetic recordingHERAEUS INC·Filed 2006·Application pending·0 cites
- 4042US2007190364A1Ruthenium alloy magnetic media and sputter targetsHERAEUS INC·Filed 2006·Application pending·0 cites
- 4142US2005072668A1Sputter target having modified surface textureHERAEUS INC·Filed 2004·Application pending·0 cites
- 4241US2008170959A1Full density Co-W magnetic sputter targetsHERAEUS INC·Filed 2007·Application pending·0 cites
- 4341US2007169853A1Magnetic sputter targets manufactured using directional solidificationHERAEUS INC·Filed 2006·Application pending·0 cites
- 4441US2008057350A1Magnetic media and sputter targets with compositions of high anisotropy alloys and oxide compoundsHERAEUS INC·Filed 2006·Application pending·0 cites
- 4541US2007007130A1Enhanced magnetron sputtering targetHERAEUS INC·Filed 2005·Application pending·0 cites
- 4640US2007253103A1Soft magnetic underlayer in magnetic media and soft magnetic alloy based sputter targetHERAEUS INC·Filed 2006·Application pending·0 cites
- 4740US2005277002A1Enhanced sputter target alloy compositionsHERAEUS INC·Filed 2004·Application pending·0 cites
- 4840US2008202916A1Controlling magnetic leakage flux in sputtering targets containing magnetic and non-magnetic elementsHERAEUS INC·Filed 2007·Application pending·0 cites
- 4939US2009010792A1Brittle metal alloy sputtering targets and method of fabricating sameHERAEUS INC·Filed 2007·Application pending·0 cites
- 5039US2006042938A1Sputter target material for improved magnetic layerHERAEUS INC·Filed 2004·Application pending·0 cites
Showing the top 50 of 59 patent records by PatentIndex Score.
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