Inventor · disambiguated record
Eric James Shero
Also filed as: SHERO ERIC · SHERO ERIC J · SHERO ERIC JAMES
128 granted patents·55 pending applications·13,295 citations·filing 1991–2025
99Inventor score
Top patents by PatentIndex Score
183 records- 0199US7122085B2Sublimation bed employing carrier gas guidance structuresASM INC·Filed 2003·Granted Oct 17, 2006·600 cites·7 claims
- 0298US11501956B2Semiconductor reaction chamber showerheadASM IP HOLDING BV·Filed 2020·Granted Nov 15, 2022·5 cites·8 claims
- 0398US11377732B2Reactant vaporizer and related systems and methodsASM IP HOLDING BV·Filed 2020·Granted Jul 5, 2022·6 cites·7 claims
- 0498US10087522B2Deposition of metal boridesASM IP HOLDING BV·Filed 2016·Granted Oct 2, 2018·464 cites·21 claims
- 0598US9574268B1Pulsed valve manifold for atomic layer depositionDUNN TODD·Filed 2011·Granted Feb 21, 2017·510 cites·40 claims
- 0698US9202727B2Susceptor heater shimDUNN TODD·Filed 2012·Granted Dec 1, 2015·524 cites·22 claims
- 0798US9005539B2Chamber sealing memberASM IP HOLDING BV·Filed 2012·Granted Apr 14, 2015·547 cites·23 claims
- 0898US8883270B2Systems and methods for thin-film deposition of metal oxides using excited nitrogen—oxygen speciesSHERO ERIC·Filed 2010·Granted Nov 11, 2014·544 cites·22 claims
- 0998US8841182B1Silane and borane treatments for titanium carbide filmsASM IP HOLDING BV·Filed 2013·Granted Sep 23, 2014·529 cites·22 claims
- 1098US7914847B2Reactor surface passivation through chemical deactivationASM INC·Filed 2006·Granted Mar 29, 2011·106 cites·19 claims
- 1198US7851019B2Method for controlling the sublimation of reactantsASM INT·Filed 2008·Granted Dec 14, 2010·551 cites·19 claims
- 1298US7799135B2Reactor surface passivation through chemical deactivationASM INC·Filed 2006·Granted Sep 21, 2010·94 cites·21 claims
- 1398US7795160B2ALD of metal silicate filmsASM INC·Filed 2006·Granted Sep 14, 2010·412 cites·31 claims
- 1498USD614153SReactant source vesselASM INC·Filed 2009·Granted Apr 20, 2010·557 cites·1 claims
- 1598US7601225B2System for controlling the sublimation of reactantsASM INT·Filed 2003·Granted Oct 13, 2009·564 cites·25 claims
- 1698US6613695B2Surface preparation prior to depositionASM INC·Filed 2001·Granted Sep 2, 2003·314 cites·19 claims
- 1797US11521851B2Method of forming structures including a vanadium or indium layerASM IP HOLDING BV·Filed 2021·Granted Dec 6, 2022·5 cites·15 claims
- 1897US10370761B2Pulsed valve manifold for atomic layer depositionASM INC·Filed 2017·Granted Aug 6, 2019·9 cites·20 claims
- 1997US10276355B2Multi-zone reactor, system including the reactor, and method of using the sameASM IP HOLDING BV·Filed 2015·Granted Apr 30, 2019·412 cites·27 claims
- 2097US9892908B2Process feed management for semiconductor substrate processingASM INC·Filed 2015·Granted Feb 13, 2018·479 cites·17 claims
- 2197US9394608B2Semiconductor processing reactor and components thereofSHERO ERIC·Filed 2010·Granted Jul 19, 2016·506 cites·15 claims
- 2297US9340874B2Chamber sealing memberASM IP HOLDING BV·Filed 2015·Granted May 17, 2016·19 cites·23 claims
- 2397US9228259B2Method for treatment of deposition reactorASM IP HOLDING BV·Filed 2014·Granted Jan 5, 2016·515 cites·14 claims
- 2497US8986456B2Precursor delivery systemFONDURULIA KYLE·Filed 2010·Granted Mar 24, 2015·555 cites·25 claims
- 2597US8877655B2Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen speciesSHERO ERIC J·Filed 2011·Granted Nov 4, 2014·551 cites·25 claims
- 2697US8287648B2Method and apparatus for minimizing contamination in semiconductor processing chamberREED JOSEPH C·Filed 2009·Granted Oct 16, 2012·552 cites·19 claims
- 2797US8137462B2Precursor delivery systemFONDURULIA KYLE·Filed 2007·Granted Mar 20, 2012·577 cites·19 claims
- 2897US7118779B2Reactor surface passivation through chemical deactivationASM INC·Filed 2004·Granted Oct 10, 2006·144 cites·20 claims
- 2996US12354877B2Vapor deposition of films comprising molybdenumASM IP HOLDING BV·Filed 2021·Granted Jul 8, 2025·4 cites·24 claims
- 3096US11976361B2Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatusASM IP HOLDING BV·Filed 2022·Granted May 7, 2024·2 cites·14 claims
- 3196US11624113B2Heating zone separation for reactant evaporation systemASM IP HOLDING BV·Filed 2020·Granted Apr 11, 2023·3 cites·11 claims
- 3296US10876205B2Reactant vaporizer and related systems and methodsASM IP HOLDING BV·Filed 2016·Granted Dec 29, 2020·11 cites·19 claims
- 3396US8846550B1Silane or borane treatment of metal thin filmsASM IP HOLDING BV·Filed 2013·Granted Sep 30, 2014·25 cites·26 claims
- 3496US8309173B2System for controlling the sublimation of reactantsTUOMINEN MARKO·Filed 2010·Granted Nov 13, 2012·556 cites·19 claims
- 3595US12237171B1Method of forming vanadium nitride layer and structure including the vanadium nitride layerASM IP HOLDING BV·Filed 2023·Granted Feb 25, 2025·2 cites·10 claims
- 3695US11901175B2Method for selective deposition of silicon nitride layer and structure including selectively-deposited silicon nitride layerASM IP HOLDING BV·Filed 2022·Granted Feb 13, 2024·2 cites·18 claims
- 3795US11404302B2Substrate susceptor using edge purgingASM IP HOLDING BV·Filed 2020·Granted Aug 2, 2022·4 cites·17 claims
- 3895US11306395B2Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatusASM IP HOLDING BV·Filed 2017·Granted Apr 19, 2022·7 cites·14 claims
- 3995US10714315B2Semiconductor reaction chamber showerheadASM IP HOLDING BV·Filed 2012·Granted Jul 14, 2020·12 cites·19 claims
- 4095US9593416B2Precursor delivery systemFONDURULIA KYLE·Filed 2012·Granted Mar 14, 2017·14 cites·20 claims
- 4195US9388492B2Vapor flow control apparatus for atomic layer depositionWHITE CARL L·Filed 2011·Granted Jul 12, 2016·14 cites·17 claims
- 4295US9017481B1Process feed management for semiconductor substrate processingPETTINGER FRED·Filed 2011·Granted Apr 28, 2015·761 cites·6 claims
- 4395US8293658B2Reactive site deactivation against vapor depositionSHERO ERIC·Filed 2010·Granted Oct 23, 2012·106 cites·40 claims
- 4495US8216380B2Gap maintenance for opening to process chamberWHITE CARL L·Filed 2009·Granted Jul 10, 2012·559 cites·25 claims
- 4594US10844486B2Semiconductor processing reactor and components thereofASM IP HOLDING BV·Filed 2019·Granted Nov 24, 2020·8 cites·15 claims
- 4694US10468291B2Reaction system for growing a thin filmASM INC·Filed 2016·Granted Nov 5, 2019·11 cites·8 claims
- 4794US10118828B2Tritertbutyl aluminum reactants for vapor depositionASM IP HOLDING BV·Filed 2016·Granted Nov 6, 2018·4 cites·21 claims
- 4894US6960537B2Incorporation of nitrogen into high k dielectric filmASM INC·Filed 2002·Granted Nov 1, 2005·61 cites·16 claims
- 4993US12473641B2Apparatus for providing a gas mixture to a reaction chamber and method of using sameASM IP HOLDING BV·Filed 2022·Granted Nov 18, 2025·1 cites·14 claims
- 5093US11873557B2Method of depositing vanadium metalASM IP HOLDING BV·Filed 2021·Granted Jan 16, 2024·2 cites·16 claims
Showing the top 50 of 183 patent records by PatentIndex Score.
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